Patent application number | Description | Published |
20140080056 | ONIUM COMPOUNDS AND METHODS OF SYNTHESIS THEREOF - New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition. | 03-20-2014 |
20140080058 | ACID GENERATORS AND PHOTORESISTS COMPRISING SAME - Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group. | 03-20-2014 |
20140080059 | ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME - Acid generator compounds are provided that are particularly useful as a photoresist composition component. Acid generator compounds of the invention comprise 1) a cyclic sulfonium salt and 2) a covalently linked photoacid-labile group. In one aspect, thioxanthone acid generator compounds are particularly preferred, including acid generator compounds that comprise (i) a thioxanthone moiety; and (ii) one or more covalently linked acid labile-groups. | 03-20-2014 |
20140080060 | ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME - Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and photoresist compositions that comprise such compounds are provided. In another preferred aspect, acid generator compounds are provided that comprise one or more covalently linked acid-labile moieties, particularly ester-containing acid-labile moieties. | 03-20-2014 |
20140080062 | PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS - The present invention relates to new photoresist compositions that comprise (a) a polymer comprising an acid generator bonded thereto; and (b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups. | 03-20-2014 |
20140186767 | ACID GENERATORS AND PHOTORESISTS COMPRISING SAME - Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5. | 07-03-2014 |