Patent application number | Description | Published |
20080211040 | NANOSENSORS - Electrical devices comprised of nanowires are described, along with methods of their manufacture and use. The nanowires can be nanotubes and nanowires. The surface of the nanowires may be selectively functionalized. Nanodetector devices are described. | 09-04-2008 |
20090057650 | Nanoscale wires and related devices - The present invention relates generally to sub-microelectronic circuitry, and more particularly to nanometer-scale articles, including nanoscale wires which can be selectively doped at various locations and at various levels. In some cases, the articles may be single crystals. The nanoscale wires can be doped, for example, differentially along their length, or radially, and either in terms of identity of dopant, concentration of dopant, or both. This may be used to provide both n-type and p-type conductivity in a single item, or in different items in close proximity to each other, such as in a crossbar array. The fabrication and growth of such articles is described, and the arrangement of such articles to fabricate electronic, optoelectronic, or spintronic devices and components. For example, semiconductor materials can be doped to form n-type and p-type semiconductor regions for making a variety of devices such as field effect transistors, bipolar transistors, complementary inverters, tunnel diodes, light emitting diodes, sensors, and the like. | 03-05-2009 |
20100155698 | Nanoscale wires and related devices - The present invention relates generally to sub-microelectronic circuitry, and more particularly to nanometer-scale articles, including nanoscale wires which can be selectively doped at various locations and at various levels. In some cases, the articles may be single crystals. The nanoscale wires can be doped, for example, differentially along their length, or radially, and either in terms of identity of dopant, concentration of dopant, or both. This may be used to provide both n-type and p-type conductivity in a single item, or in different items in close proximity to each other, such as in a crossbar array. The fabrication and growth of such articles is described, and the arrangement of such articles to fabricate electronic, optoelectronic, or spintronic devices and components. For example, semiconductor materials can be doped to form n-type and p-type semiconductor regions for making a variety of devices such as field effect transistors, bipolar transistors, complementary inverters, tunnel diodes, light emitting diodes, sensors, and the like. | 06-24-2010 |
20100243990 | NANOSENSORS - Electrical devices comprised of nanowires are described, along with methods of their manufacture and use. The nanowires can be nanotubes and nanowires. The surface of the nanowires may be selectively functionalized. Nanodetector devices are described. | 09-30-2010 |
20100258784 | Method Of Efficient Coupling Of Light From Single-Photon Emitter To Guided Radiation Localized To Sub-Wavelength Dimensions On Conducting Nanowires - A cavity free, broadband approach for engineering photon emitter interactions via sub-wavelength confinement of optical fields near metallic nanostructures. When a single CdSe quantum dot (QD) is optically excited in close proximity to a silver nanowire (NW), emission from the QD couples directly to guided surface plasmons in the NW, causing the wire's ends to light up. Nonclassical photon correlations between the emission from the QD and the ends of the NW demonstrate that the latter stems from the generation of single, quantized plasmons. Results from a large number of devices show that the efficient coupling is accompanied by more than 2.5-fold enhancement of the QD spontaneous emission, in a good agreement with theoretical predictions. | 10-14-2010 |
20110315962 | NANOSENSORS - Electrical devices comprised of nanowires are described, along with methods of their manufacture and use. The nanowires can be nanotubes and nanowires. The surface of the nanowires may be selectively functionalized Nanodetector devices are described. | 12-29-2011 |
20130260467 | MOLECULAR DELIVERY WITH NANOWIRES - A molecular delivery device including a plurality of nanowires (e.g., Si NWs) coated with an electrically conductive layer. Also disclosed are methods for delivering a molecule by nanowire-mediated electroporation. | 10-03-2013 |
20130284612 | NANOWIRES FOR ELECTROPHYSIOLOGICAL APPLICATIONS - An electrical device including a substrate that has a surface and a plurality of electrically conductive nanowires, each of which has a first end and a second end. Each of the nanowires is formed of a semiconductor, a compound semiconductor, a metal, as or a combination thereof and is coated with an electrically insulating layer except for its first and second ends, the first end being attacked to the surface and the second end being coated with an electrically conductive layer. Also disclosed is a method of sending or receiving an electrical signal to or from a biological cell using the above-described device. | 10-31-2013 |
20150191688 | MULTIWELL PLATES COMPRISING NANOWIRES - The present invention generally relates to nanowires and, in particular, to multiwell plates comprising nanowires, including systems and methods of making the same. Such multiwell plates can, in some cases, be used in automated equipment or high-throughput applications. For example, a plurality of cells may be placed in at least some of the wells of the multiwell plate, and one or more nanowires may be inserted into at least some of the cells within the wells of the multiwell plate. In some cases, one or more of the nanowires may have coated thereon a biological effector. The cells in each of the wells may be identical or different, and/or the biological effector may the same or different. Such multiwell plates may be used, for example, to test a biological effector against a variety of cell types, or to test a variety of biological effectors against a one or more cell types, or the like. | 07-09-2015 |
20150197807 | USE OF NANOWIRES FOR DELIVERING BIOLOGICAL EFFECTORS INTO IMMUNE CELLS - The present invention generally relates to nanowires and, in some aspects, to methods of using nanowire arrays to identify a therapeutic target for treating a disorder in a subject, identify a treatment for a disorder in a subject, or deliver a biological effector to immune cells. Previous techniques for delivering biological effectors into live immune cells yielded low efficiencies, activated the immune response and induced non-specific inflammation, and/or required harsh conditions that resulted in widespread apoptosis. By contrast, some of the methods described herein are capable of efficiently delivering biomolecular cargo into immune cells, have negligible toxicity, do not activate immune cell function, and/or allow cells to respond appropriately to physiological stimuli. | 07-16-2015 |
20150203348 | FABRICATION OF NANOWIRE ARRAYS - The present invention generally relates to nanowire arrays and methods of fabricating such arrays. In certain embodiments, the fabrication methods can consistently form NW arrays with reproducible configurations at nanoscale sites and produce NWs of specified heights, diameters, and densities. In some cases, the methods also allow formation of NW arrays containing barriers between regions, which would be prohibitively expensive if prepared by other methods. | 07-23-2015 |
Patent application number | Description | Published |
20100216277 | Formation of Devices by Epitaxial Layer Overgrowth - Methods and structures are provided for formation of devices, e.g., solar cells, on substrates including, e.g., lattice-mismatched materials, by the use of aspect ratio trapping (ART) and epitaxial layer overgrowth (ELO). In general, in a first aspect, embodiments of the invention may include a method of forming a structure. The method includes forming a first opening in a masking layer disposed over a substrate that includes a first semiconductor material. A first layer, which includes a second semi-conductor material lattice-mismatched to the first semiconductor material, is formed within the first opening. The first layer has a thickness sufficient to extend above a top surface of the masking layer. A second layer, which includes the second semiconductor material, is formed on the first layer and over at least a portion of the masking layer. A vertical growth rate of the first layer is greater than a lateral growth rate of the first layer and a lateral growth rate of the second layer is greater than a vertical growth rate of the second layer. | 08-26-2010 |
20120068226 | Formation of Devices by Epitaxial Layer Overgrowth - Methods and structures are provided for formation of devices on substrates including, e.g., lattice-mismatched materials, by the use of aspect ratio trapping and epitaxial layer overgrowth. A method includes forming an opening in a masking layer disposed over a substrate that includes a first semiconductor material. A first layer, which includes a second semiconductor material lattice-mismatched to the first semiconductor material, is formed within the opening. The first layer has a thickness sufficient to extend above a top surface of the masking layer. A second layer, which includes the second semiconductor material, is formed on the first layer and over at least a portion of the masking layer. A vertical growth rate of the first layer is greater than a lateral growth rate of the first layer and a lateral growth rate of the second layer is greater than a vertical growth rate of the second layer. | 03-22-2012 |
20120199876 | Defect Reduction Using Aspect Ratio Trapping - Lattice-mismatched epitaxial films formed proximate non-crystalline sidewalls. Embodiments of the invention include formation of facets that direct dislocations in the films to the sidewalls. | 08-09-2012 |
20130134480 | Formation of Devices by Epitaxial Layer Overgrowth - Methods and structures are provided for formation of devices, e.g., solar cells, on substrates including, e.g., lattice-mismatched materials, by the use of aspect ratio trapping and epitaxial layer overgrowth. A method includes forming an opening in a masking layer disposed over a substrate that includes a first semiconductor material. A first layer, which includes a second semiconductor material lattice-mismatched to the first semiconductor material, is formed within the opening. The first layer has a thickness sufficient to extend above a top surface of the masking layer. A second layer, which includes the second semiconductor material, is formed on the first layer and over at least a portion of the masking layer. A vertical growth rate of the first layer is greater than a lateral growth rate of the first layer and a lateral growth rate of the second layer is greater than a vertical growth rate of the second layer. | 05-30-2013 |
20140342536 | Defect Reduction Using Aspect Ratio Trapping - Lattice-mismatched epitaxial films formed proximate non-crystalline sidewalls. Embodiments of the invention include formation of facets that direct dislocations in the films to the sidewalls. | 11-20-2014 |
Patent application number | Description | Published |
20090321882 | EPITAZIAL GROWTH OF CRYSTALLINE MATERIAL - A device includes an epitaxially grown crystalline material within an area confined by an insulator. A surface of the crystalline material has a reduced roughness. One example includes obtaining a surface with reduced roughness by creating process parameters which result in the dominant growth component of the crystal to be supplied laterally from side walls of the insulator. In a preferred embodiment, the area confined by the insulator is an opening in the insulator having an aspect ratio sufficient to trap defects using an ART technique. | 12-31-2009 |
20100072515 | FABRICATION AND STRUCTURES OF CRYSTALLINE MATERIAL - A surface of the first semiconductor crystalline material has a reduced roughness. A semiconductor device includes a low defect, strained second semiconductor crystalline material over the surface of the first crystalline material. A surface of the strained second semiconductor crystalline material has a reduced roughness. One example includes obtaining a surface with reduced roughness by creating process parameters that reduce impurities at an interfacial boundary between the first and second semiconductor crystalline materials. In one embodiment, the first semiconductor crystalline material can be confined by an opening in an insulator having an aspect ratio sufficient to trap defects using Aspect Ratio Trapping techniques. | 03-25-2010 |
20110121310 | SOLID STATE LIGHTING DEVICES WITH SELECTED THERMAL EXPANSION AND/OR SURFACE CHARACTERISTICS, AND ASSOCIATED METHODS - Solid state lighting devices with selected thermal expansion and/or surface characteristics, and associated methods are disclosed. A method in accordance with a particular embodiment includes forming an SSL (solid state lighting) formation structure having a formation structure coefficient of thermal expansion (CTE), selecting a first material of an interlayer structure to have a first material CTE greater than the substrate CTE, and selecting a second material of the interlayer structure based at least in part on the second material having a second material CTE less than the first material CTE. The method can further include forming the interlayer structure over the SSL formation structure by disposing (at least) a first layer of the first material over the SSL formation structure, a portion of the second material over the first material, and a second layer of the first material over the second material. The SSL formation structure supports an SSL emitter material, and the method further includes counteracting a force placed on the formation structure by the first material, by virtue of the difference between the second material CTE and the first material CTE. In other embodiments, the SSL formation structure can have an off-cut angle with a non-zero value of up to about 4.5 degrees. | 05-26-2011 |
20120098034 | Epitaxial Growth of Crystalline Material - A device includes an epitaxially grown crystalline material within an area confined by an insulator. A surface of the crystalline material has a reduced roughness. One example includes obtaining a surface with reduced roughness by creating process parameters which result in the dominant growth component of the crystal to be supplied laterally from side walls of the insulator. In a preferred embodiment, the area confined by the insulator is an opening in the insulator having an aspect ratio sufficient to trap defects using an ART technique. | 04-26-2012 |
20130062615 | SOLID STATE LIGHTING DEVICES WITH SELECTED THERMAL EXPANSION AND/OR SURFACE CHARACTERISTICS, AND ASSOCIATED METHODS - Solid state lighting (SSL) devices and methods are disclosed. A particular method includes forming an SSL formation structure having a CTE, selecting a first material of an interlayer structure to have a first material CTE greater than the substrate CTE, and selecting a second material based at least in part on the second material having a CTE less than the first material CTE. The intelayer structure is formed over the SSL formation structure e.g., with a first layer of the first material over the SSL formation structure, a portion of the second material over the first material, and a second layer of the first material over the second material. The CTE difference between the first and second materials can counteract a force placed on the formation structure by the first material. Particular formation structures can have an off-cut angle with a non-zero value of up to about 4.5 degrees. | 03-14-2013 |
20140332850 | Epitaxial Growth of Crystalline Material - A device includes an epitaxially grown crystalline material within an area confined by an insulator. A surface of the crystalline material has a reduced roughness. One example includes obtaining a surface with reduced roughness by creating process parameters which result in the dominant growth component of the crystal to be supplied laterally from side walls of the insulator. In a preferred embodiment, the area confined by the insulator is an opening in the insulator having an aspect ratio sufficient to trap defects using an ART technique. | 11-13-2014 |
Patent application number | Description | Published |
20100224404 | DUAL ACCESS LUMINAIRE JUNCTION BOX - A recessed fixture having a junction box positioned adjacent at least one ceiling support structure comprises a recessed luminaire fixture, the junction box mounted to the recessed luminaire frame, the junction box being horizontally oriented, the junction box having a first facing junction box door and a second junction box door, the first junction box door and the second junction box door being oppositely positioned and pivotally connected to a junction box housing, the first and second junction doors being in a substantially horizontal orientation in a closed position, one of the first junction box door and the second junction box door facing substantially upwardly and the other of the first junction box door and the second junction box door facing substantially downwardly, wherein the horizontal orientation allows the junction box doors to be positioned adjacent a ceiling structure without limiting opening of the junction box doors. | 09-09-2010 |
20110103062 | RECESSED LIGHTING FIXTURE WITH SOCKET ADJUSTMENT MECHANISM - A recessed luminaire with adjustable socket assembly comprises a housing having a sidewall, a top wall and a lower opening allowing light output, a socket adjustment assembly disposed in the housing, the socket adjustment assembly having: a lamp socket connected to a socket carriage, a track having a socket carriage movably positioned on the track, wherein the carriage moves along the track and the lamp socket is movable in at least one of a vertical or a horizontal direction. | 05-05-2011 |
20110103068 | RECESSED LIGHTING REMODELER FIXTURE WITH SLIDING HOUSING - A recessed luminaire with adjustable socket assembly comprises a housing having a sidewall, a top wall and a lower opening allowing light output, a socket adjustment assembly disposed in the housing, the socket adjustment assembly having: a lamp socket connected to a socket carriage, a track having a socket carriage movably positioned on the track wherein the carriage moves along the track and the lamp socket is movable in at least one of a vertical or a horizontal direction. | 05-05-2011 |
20130170232 | ADJUSTABLE RECESSED TRIM - Methods and apparatus related to adjustable recessed trim. An adjustable recessed trim ( | 07-04-2013 |
Patent application number | Description | Published |
20120171617 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are polymers that include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety. Also provided are photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 07-05-2012 |
20120219901 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 08-30-2012 |
20120219902 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 08-30-2012 |
20120288794 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 11-15-2012 |
20130011783 | MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 01-10-2013 |
20130115559 | METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT - Provided are methods of forming photolithographic patterns by negative tone development. The methods employ a photoresist composition that includes a polymer having a unit of the following general formula (I): | 05-09-2013 |
20130244180 | PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES - Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices. | 09-19-2013 |
20130244438 | PHOTOLITHOGRAPHIC METHODS - Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices. | 09-19-2013 |
20130302735 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS - Provided are monomers, polymers, photoresist compositions and coated substrates which find use in the formation of photolithographic patterns by negative tone development. The monomers are of the following general formula (I): | 11-14-2013 |
20140038102 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist compositions include one or more polymer additive that contains a basic moiety and which is substantially non-miscible with a resin component of the resist. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 02-06-2014 |
Patent application number | Description | Published |
20140212816 | PHOTOLITHOGRAPHIC METHODS - Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices. | 07-31-2014 |
20150132921 | GAP-FILL METHODS - Provided are gap-fill methods. The methods comprise: (a) providing a semiconductor substrate having a relief image on a surface of the substrate, the relief image comprising a plurality of gaps to be filled; (b) applying a gap-fill composition over the relief image, wherein the gap-fill composition comprises a self-crosslinkable polymer and a solvent, wherein the self-crosslinkable polymer comprises a first unit comprising a polymerized backbone and a crosslinkable group pendant to the backbone; and (c) heating the gap-fill composition at a temperature to cause the polymer to self-crosslink. The methods find particular applicability in the manufacture of semiconductor devices for the filling of high aspect ratio gaps. | 05-14-2015 |
20150159038 | PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES - Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices. | 06-11-2015 |
20150179467 | Methods of Forming Patterns - Some embodiments include methods of forming patterns. A first mask is formed over a material. The first mask has features extending therein and defines a first pattern. The first pattern has a first level of uniformity across a distribution of the features. A brush layer is formed across the first mask and within the features to narrow the features and create a second mask from the first mask. The second mask has a second level of uniformity across the narrowed features which is greater than the first level of uniformity. A pattern is transferred from the second mask into the material. | 06-25-2015 |
20150183935 | METHODS FOR ANNEALING BLOCK COPOLYMERS AND ARTICLES MANUFACTURED THEREFROM - Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; where the vinyl aromatic monomer has at least one alkyl substitution on an aromatic ring; a second block derived from a siloxane monomer; where a chi parameter that measures interactions between the first block and the second block is 0.03 to 0.18 at a temperature of 200° C. Disclosed herein is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing a siloxane monomer; and where the block copolymer has a chi parameter of 0.03 to 0.18 at a temperature of 200° C.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer. | 07-02-2015 |
20150184017 | COPOLYMER FORMULATIONS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME - Disclosed herein is a method comprising disposing a mat composition on a surface of a semiconductor substrate; where the mat composition comprises a random copolymer comprising a first acrylate unit and a second unit; where the copolymer does not comprise a polystyrene or a polyepoxide; crosslinking the random copolymer; disposing a brush backfill composition on the substrate; such that the brush backfill composition and the mat composition alternate with each other; disposing on the brush backfill composition and on the mat composition a block copolymer that undergoes self assembly; and etching the block copolymer to create uniformly spaced channels in the semiconductor substrate. | 07-02-2015 |
20150184024 | METHOD OF CONTROLLING BLOCK COPOLYMER CHARACTERISTICS AND ARTICLES MANUFACTURED THEREFROM - Disclosed herein is a composition comprising a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer. | 07-02-2015 |
20150185607 | PHOTORESIST OVERCOAT COMPOSITIONS - Photoresist overcoat compositions comprise: a quenching polymer wherein the quenching polymer comprises: a first unit having a basic moiety; and a second unit formed from a monomer of the following general formula (I): | 07-02-2015 |
20150185615 | PHOTOLITHOGRAPHIC METHODS - Methods of forming an electronic device, comprising in sequence: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises a quenching polymer and an organic solvent, wherein the quenching polymer comprises a unit having a basic moiety effective to neutralize acid generated by the photoacid generator in a surface region of photoresist layer; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an organic solvent developer. The methods have particular applicability in the semiconductor manufacturing industry. | 07-02-2015 |
20150210793 | CROSSLINKABLE POLYMERS AND UNDERLAYER COMPOSITIONS - A crosslinkable polymer comprising: a first unit of the following general formula (I-A) or (I-B): | 07-30-2015 |
Patent application number | Description | Published |
20120038807 | IMAGING SIGNAL PROCESSING METHODS AND APPARATUS - Methods and apparatus are provided for performing multiple correlated double sampling (CDS) operations on an imaging pixel, and in some cases on an array of imaging pixels, during a single integration cycle of the pixel(s). The multiple CDS operations may produce multiple CDS values, which may be processed in combination to produce a resulting value substantially free of various types of noise. The CDS operations may be performed using a CDS circuit including a single-ended charge amplifier having an input capacitor. The charge amplifier may also include a variable capacitance providing a variable gain. The variable capacitance may be provided by a feedback capacitor. | 02-16-2012 |
20120217376 | IMAGING SIGNAL PROCESSING METHODS AND APPARATUS - Methods and apparatus are provided for performing multiple correlated double sampling (CDS) operations on an imaging pixel, and in some cases on an array of imaging pixels, during a single integration cycle of the pixel(s). The multiple CDS operations may produce multiple CDS values, which may be processed in combination to produce a resulting value substantially free of various types of noise. The CDS operations may be performed using a CDS circuit including a single-ended charge amplifier having an input capacitor. The charge amplifier may also include a variable capacitance providing a variable gain. The variable capacitance may be provided by a feedback capacitor. | 08-30-2012 |
20140093023 | RF Carrier Synchronization and Phase Alignment Methods and Systems - A method comprising generating a baseband information signal by mixing a received modulated carrier signal with a local oscillator (LO) signal having an LO frequency; obtaining baseband signal samples of the baseband information signal having a baseband signal magnitude and a baseband signal phase; determining a cumulative phase measurement associated with baseband signal samples having a baseband signal magnitude greater than a threshold; and, applying a correction signal to compensate for an LO frequency offset of the LO frequency based on the cumulative phase. | 04-03-2014 |
20140093024 | RF Carrier Synchronization and Phase Alignment Methods and Systems - A method comprising generating a baseband information signal by mixing a received modulated carrier signal with a local oscillator (LO) signal having an LO frequency; obtaining baseband signal samples of the baseband information signal having a baseband signal magnitude and a baseband signal phase; determining a cumulative phase measurement associated with baseband signal samples having a baseband signal magnitude greater than a threshold; and, applying a correction signal to compensate for an LO frequency offset of the LO frequency based on the cumulative phase. | 04-03-2014 |
Patent application number | Description | Published |
20130309280 | SPINNING NANOWIRES AND METHOD FOR INDUCING CELL ERADICATION USING SAME - The present invention provides a cell eradication method and a cell eradication principle for necrotizing a cell by agitating a cell using a physical turning force from the impression of an AC magnetic field, after preparing a magnetic nanowire having a dipole and introducing the magnetic nanowire into a cell. Therefore, the composition for inducing cell eradication of the present invention, when applied to a cell that is requested to be removed such as a cancer cell, can eradicate the cell by applying a physical impact through the rotation of the nanowire introduced inside the cell. Additionally, the heat generated from induced current from the magnetic field impression can add an effect of thermotherapy, and also, attaching a drug to the surface of the nanowire enhances the treatment effects. | 11-21-2013 |
20130317421 | STRUCTURE HAVING NANOANTENNA AND METHOD FOR MANUFACTURING SAME - The present invention relates to a structure having a nanoantenna, a method for manufacturing same, a drug delivery body having the same, a thermotherapy complex, a drug therapy device, and a thermotherapy device. The structure of the present invention has a nanoantenna pattern formed on the outer surface of a porous micro-container, thereby enabling wireless control from the outside, and when the structure is used as a drug delivery system and a thermotherapy complex, drug therapy and thermotherapy can be carried out at a desired application region inside a living body at a desired time. Also, the structure of the present invention enables transmission and reception of a wireless signal with an external controller through the nanoantenna, thereby enabling the detection of a signal inside the living body and the transmission of the signal to the external controller, and the discharge of a drug or nanowires according to a response signal transmitted from the external controller. | 11-28-2013 |
Patent application number | Description | Published |
20120268524 | INK JET PRINT HEAD FRONT FACE HAVING A TEXTURED SUPEROLEOPHOBIC SURFACE AND METHODS FOR MAKING THE SAME - An ink jet print head front face or nozzle plate having a textured superoleophobic surface that prevents undesirable drooling, wetting and/or adhesion of the ink on the print head. The textured surface includes a rim formed around the nozzle. Also described are methods for forming the textured superoleophobic ink jet print head front face or nozzle plate from silicon having the textured, oleophobic surface. | 10-25-2012 |
20120270344 | INK JET PRINT HEAD FRONT FACE HAVING A TEXTURED SUPEROLEOPHOBIC SURFACE AND METHODS FOR MAKING THE SAME - An ink jet print head front face or nozzle plate having a textured superoleophobic surface that prevents undesirable drooling, wetting and/or adhesion of the ink on the print head. The textured surface includes a rim formed around the nozzle. Also described are methods for forming the textured superoleophobic ink jet print head front face or nozzle plate from silicon having the textured, oleophobic surface. | 10-25-2012 |
20130025322 | PROCESS FOR MAKING NANOCONE STRUCTURES AND USING THE STRUCTURES TO MANUFACTURE NANOSTRUCTURED GLASS - Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed. | 01-31-2013 |
20140015900 | METHOD OF MAKING SUPEROLEOPHOBIC RE-ENTRANT RESIST STRUCTURES - A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface. | 01-16-2014 |
20140190352 | LIQUID COLLECTING PERMEABLE STRUCTURES - A structure for collecting liquid droplets from an aerosol can have a structure and properties that are selected for efficient liquid collection. In particular, the strand radius and spacing of a mesh, and a material for coating the mesh, can be selected to provide efficient collection of water droplets from fog. | 07-10-2014 |
20140336039 | ANTI-FINGERPRINT PHOTOCATALYTIC NANOSTRUCTURE FOR TRANSPARENT SURFACES - Titania-based porous nanoparticle coatings are mechanically robust, with low haze, which exhibit short time scales for decomposition of fingerprint oils under ultraviolet light. The mechanism by which a typical dactylogram is consumed combines wicking of the sebum into the nanoporous titania structure followed by photocatalytic degradation. These TiO | 11-13-2014 |
20140349071 | COM/IPHONE METHOD OF MAKING SUPEROLEOPHOBIC RE-ENTRANT RESIST STRUCTURES - A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface. | 11-27-2014 |
Patent application number | Description | Published |
20090127455 | Ion guide for mass spectrometers - The present invention relates generally to mass spectrometry and the analysis of chemical samples, and more particularly to ion guides for use therein. The invention described herein comprises an improved method and apparatus for transporting ions from a first pressure region in a mass spectrometer to a second pressure region therein. More specifically, the present invention provides a segmented ion funnel for more efficient use in mass spectrometry (particularly with ionization sources) to transport ions from the first pressure region to the second pressure region. | 05-21-2009 |
20120273670 | Spectrum Acquisition Modes For Ion Mobility Spectrometers Using Trapped Ions - In an ion mobility spectrometer in which a gas flows through a gas-tight tube with a radially quadrupolar RF field therein and blows ions against a DC electric field barrier, a mobility scan with a mobility scale that is linear in time is obtained by holding the height of the DC electric field barrier constant while changing the pressure and temperature conditions of the flowing gas. Alternatively, the mobility scan is performed by holding the pressure and temperature conditions of the flowing gas constant and reducing the height of the DC electric field barrier non-linearly with respect to time. | 11-01-2012 |
20120273673 | Selective Ion Mobility Spectrometer - Ions with a predetermined range of ion mobilities are produced by filtering input ions with at least two consecutive ion mobility high pass and/or low pass filters. Each ion mobility filter is formed by entraining ions in a moving gas and applying a DC electric field to the ions which causes the ions to move in a direction opposite to the gas flow. An ion mobility high pass filter is formed when the DC electric field drives the ions against the flow of gas, whereas an ion mobility low pass filter is formed when a the gas flow drives entrained ions against an DC electric field barrier. | 11-01-2012 |
20120273674 | Resolution Enhancement For Ion Mobility Spectrometers - In an ion mobility spectrometer in which a gas pushes ions along a spectrometer axis against and over an electrical field barrier, the electric field barrier is generated with a plateau of slightly increasing height along the axis of the spectrometer. Alternately, the electric filed barrier may have a plateau with constant height, but the gas flow decreases in velocity along the axis of the spectrometer in the vicinity of the plateau. | 11-01-2012 |
20120286156 | SELECTIVE ION MOBILITY SPECTROMETER - Ions with a predetermined ion mobility range are produced by filtering ions entrained in a stream of moving gas with two ion mobility low pass filters located consecutively in the gas stream. Each filter is formed by applying a DC electric field to the gas stream which causes the ions to move in a direction opposite to the gas flow. Ions are collected between the two filters and transferred to a detector or analyzing device. In one embodiment, the maximum field strength of the electric field barrier in the first ion mobility low pass filter is continued as a plateau of essentially constant field strength up to the electric field barrier in the second ion mobility low pass filter, which has a maximum field strength higher that the maximum field strength of the electric field barrier in the first ion mobility low pass filter. | 11-15-2012 |
20120298860 | MEANS AND METHOD FOR FIELD ASYMMETRIC ION MOBILITY SPECTROMETRY COMBINED WITH MASS SPECTROMETRY - Analyte ions are analyzed first by field asymmetric ion mobility spectrometry (FAIMS) before being analyzed by a mass analyzer. Analyte ions are produced at near atmospheric pressure and transferred via a dielectric capillary into the vacuum system of the mass analyzer. While passing through the capillary, the ions are analyzed by FAIMS via electrodes on the interior wall of the capillary. Improved ion transmission is achieved by providing smooth geometric transitions between the channel in FAIMS analyzer and the channel in the remainder of the capillary. | 11-29-2012 |
20120305758 | ABRIDGED MULTIPOLE STRUCTURE FOR THE TRANSPORT AND SELECTION OF IONS IN A VACUUM SYSTEM - An abridged multipole structure for the transport and selection of ions along a central axis in a vacuum system is constructed from a plurality of rectilinear electrode structures, each having a substantially planar face with a first dimension and a second dimension perpendicular to the first dimension. When a voltage is applied across the second dimension, an electrical potential is produced at the planar face whose amplitude is a linear function of position along the second dimension. Two electrode structures can be arranged parallel to each other with the first dimension extending along the central axis or more electrodes structures can be arranged to form multipole structures with various polygonal cross sections. | 12-06-2012 |
20120305759 | ABRIDGED MULTIPOLE STRUCTURE FOR THE TRANSPORT, SELECTION AND TRAPPING OF IONS IN A VACUUM SYSTEM - An abridged multipole structure for the transport and selection of ions along a central axis in a vacuum system is constructed from a plurality of rectilinear electrode structures, each having a substantially planar face with a first dimension and a second dimension perpendicular to the first dimension. When a voltage is applied across the second dimension, an electrical potential is produced at the planar face whose amplitude is a linear function of position along the second dimension. Two electrode structures can be arranged parallel to each other with the first dimension extending along the central axis or more electrodes structures can be arranged to form multipole structures with various polygonal cross sections. Additional embodiments can act as linear ion traps or Paul ion traps. | 12-06-2012 |
20130009050 | ABRIDGED MULTIPOLE STRUCTURE FOR THE TRANSPORT, SELECTION, TRAPPING AND ANALYSIS OF IONS IN A VACUUM SYSTEM - An abridged multipole structure for the transport and selection of ions along a central axis in a vacuum system is constructed from a plurality of rectilinear electrode structures, each having a substantially planar face with a first dimension and a second dimension perpendicular to the first dimension. When a voltage is applied across the second dimension, an electrical potential is produced at the planar face whose amplitude is a linear function of position along the second dimension. Two electrode structures can be arranged parallel to each other with the first dimension extending along the central axis or more electrodes structures can be arranged to form multipole structures with various polygonal cross sections. Additional embodiments can be used to excite ions into secular motion, inductively detect the ions, and thereby generate a mass spectrum. | 01-10-2013 |
20130009051 | ABRIDGED ION TRAP - TIME OF FLIGHT MASS SPECTROMETER - An improved trap-TOF mass spectrometer has a set of electrodes arranged to produce both a quadrupolar RF confining field and a substantially homogeneous dipole field. In operation, ions are first confined by the RF field and then, at a selected time, the RF confining field is discontinued and the dipole field is used to accelerate the ions so as to initiate a TOF MS analysis. The apparatus of the present invention may be used alone or in conjunction with other analyzers to produce mass spectra from analyte ions. | 01-10-2013 |
20130277570 | METHOD AND DEVICE FOR GAS-PHASE ION FRAGMENTATION - The invention relates to a device for performing electron capture dissociation on multiply charged cations. Provided is an electron emitter which, upon triggering, emits a plurality of low energy electrons suitable for efficient electron capture reactions to occur. Further, the device contains a particle emitter being located proximate to the electron emitter and being capable, upon triggering, to emit a plurality of high energy charged particles substantially in a direction towards the electron emitter in order that the electron emitter receives a portion of the emitted plurality of high energy charged particles and emission of the plurality of low energy electrons is triggered. A volume capable of containing a plurality of multiply charged cations is located in opposing relation to the electron emitter such that the volume receives the plurality of low energy electrons upon emission as to allow electron capture dissociation to occur. | 10-24-2013 |
20140145076 | APPARATUS AND METHOD FOR CROSS-FLOW ION MOBILITY SPECTROMETRY - A cross-flow ion mobility spectrometer consists of two parallel plates defining a volume between them. Analyte ions flow along an axis from an entrance end to an exit end through the volume. An RF confining field tends to guide ions along the axis. An analytical gas flow is established orthogonal to the axis. A DC electrostatic analytical field is oriented in opposition to the analytical gas flow such that the “drag force” on ions of the selected mobility due to the analytical gas flow is balanced by the force on the ions due to the electrostatic analytical field. The selected ions are thereby able to follow a stable path to the exit end of the cross-flow mobility analyzer. However, the force on ions of other than the selected mobility is unbalanced and these ions are deflected and lost. | 05-29-2014 |
20140374590 | APPARATUS AND METHOD FOR CROSS-FLOW ION MOBILITY SPECTROMETRY - A cross-flow ion mobility spectrometer consists of two parallel plates defining a volume between them. Analyte ions flow along an axis from an entrance end to an exit end through the volume. An RF confining field tends to guide ions along the axis. An analytical gas flow is established orthogonal to the axis. A DC electrostatic analytical field is oriented in opposition to the analytical gas flow such that the “drag force” on ions of the selected mobility due to the analytical gas flow is balanced by the force on the ions due to the electrostatic analytical field. The selected ions are thereby able to follow a stable path to the exit end of the cross-flow mobility analyzer. However, the force on ions of other than the selected mobility is unbalanced and these ions are deflected and lost. | 12-25-2014 |
20150069228 | SELECTIVE ION MOBILITY SPECTROMETER FORMED FROM TWO CONSECUTIVE MASS SELECTIVE FILTERS - Ions with a predetermined range of ion mobilities are produced by filtering input ions with at least two consecutive ion mobility high pass and/or low pass filters. Each ion mobility filter is formed by entraining ions in a moving gas and applying a DC electric field to the ions which causes the ions to move in a direction opposite to the gas flow. An ion mobility high pass filter is formed when the DC electric field drives the ions against the flow of gas, whereas an ion mobility low pass filter is formed when a the gas flow drives entrained ions against an DC electric field barrier. | 03-12-2015 |
Patent application number | Description | Published |
20090304710 | NOVEL ANTI-CD38 ANTIBODIES FOR THE TREATMENT OF CANCER - Antibodies, humanized antibodies, resurfaced antibodies, antibody fragments, derivatized antibodies, and conjugates of same with cytotoxic agents, which specifically bind to CD38, are capable of killing CD38 | 12-10-2009 |
20110195021 | CD20 ANTIBODIES AND USES THEREOF - CD20 is a transmembrane protein of the tetra-spanin family expressed on the surface of B-cells and has been found on B-cells from peripheral blood as well as lymphoid tissues. CD20 expression persists from the early pre-B cell stage until the plasma cell differentiation stage. Conversely, it is not found on hematopoietic stem cells, pro-B cells, differentiated plasma cells or non-lymphoid tissues. In addition to expression in normal B-cells, CD20 is expressed in B-cell derived malignancies such as non-Hodgkin's lymphoma (NHL) and B-cell chronic lymphocytic leukemia (CLL). CD20 expressing cells are known to play a role in other diseases and disorders, including inflammation. The present invention includes anti-CD20 antibodies, forms and fragments, having superior physical and functional properties; immunoconjugates, compositions, diagnostic reagents, methods for inhibiting growth, therapeutic methods, improved antibodies and cell lines; and polynucleotides, vectors and genetic constructs encoding same. | 08-11-2011 |
20110195022 | CD20 ANTIBODIES AND USES THEREOF - CD20 is a transmembrane protein of the tetra-spanin family expressed on the surface of B-cells and has been found on B-cells from peripheral blood as well as lymphoid tissues. CD20 expression persists from the early pre-B cell stage until the plasma cell differentiation stage. Conversely, it is not found on hematopoietic stem cells, pro-B cells, differentiated plasma cells or non-lymphoid tissues. In addition to expression in normal B-cells, CD20 is expressed in B-cell derived malignancies such as non-Hodgkin's lymphoma (NHL) and B-cell chronic lymphocytic leukemia (CLL). CD20 expressing cells are known to play a role in other diseases and disorders, including inflammation. The present invention includes anti-CD20 antibodies, forms and fragments, having superior physical and functional properties; immunoconjugates, compositions, diagnostic reagents, methods for inhibiting growth, therapeutic methods, improved antibodies and cell lines; and polynucleotides, vectors and genetic constructs encoding same. | 08-11-2011 |
20110262454 | NOVEL ANTI-CD38 ANTIBODIES FOR THE TREATMENT OF CANCER - Antibodies, humanized antibodies, resurfaced antibodies, antibody fragments, derivatized antibodies, and conjugates of same with cytotoxic agents, which specifically bind to CD38, are capable of killing CD38 | 10-27-2011 |
20120156217 | Novel EGFR-Binding Molecules and Immunoconjugates Thereof - Novel anti-cancer agents, including, but not limited to, antibodies and immunoconjugates, that bind to EGFR are provided. Methods of using the agents, antibodies, or immunoconjugates, such as methods of inhibiting tumor growth are further provided. | 06-21-2012 |
20120156218 | NOVEL ANTI-CD38 ANTIBODIES FOR THE TREATMENT OF CANCER - Antibodies, humanized antibodies, resurfaced antibodies, antibody fragments, derivatized antibodies, and conjugates of same with cytotoxic agents, which specifically bind to CD38, are capable of killing CD38 | 06-21-2012 |
20120276119 | CD37-Binding Molecules and Immunoconjugates Thereof - Methods of using CD37 agents, including, but not limited to, antibodies and immunoconjugates, that bind to CD37 to deplete B-cells (e.g., non-cancerous B-cells) and methods of treating autoimmune and inflammatory diseases are further provided. | 11-01-2012 |
20130156796 | Method of Treatment of Tumors That Are Resistant to EGFR Therapies by EGFR Antibody Cytotoxic Agent Conjugate - The present invention relates to the identification that EGFR antibody immunoconjugates are effective in inhibiting the growth of tumor cells that have developed EGFR and/or ALK resistance mechanisms. Methods of administering the EGFR antibody immunoconjugates to patients having resistant tumor cells is also disclosed. | 06-20-2013 |
20140023662 | NON-ANTAGONISTIC EGFR-BINDING MOLECULES AND IMMUNOCONJUGATES THEREOF - Novel anti-cancer agents, including, but not limited to, antibodies and immunoconjugates, that bind to EGFR are provided. Methods of using the agents, antibodies, or immunoconjugates, such as methods of inhibiting tumor growth are further provided. | 01-23-2014 |
20140099308 | Novel EGFR-Binding Molecules and Immunoconjugates Thereof - Novel anti-cancer agents, including, but not limited to, antibodies and immunoconjugates, that bind to EGFR are provided. Methods of using the agents, antibodies, or immunoconjugates, such as methods of inhibiting tumor growth are further provided. | 04-10-2014 |
Patent application number | Description | Published |
20080230514 | METHOD OF PRODUCING NANOPATTERNED TEMPLATES - Nanopatterned substrates can be prepared by a method that includes forming a block copolymer film on a substrate, annealing the block copolymer film, surface reconstructing the annealed block copolymer film, coating an etch-resistant layer on the surface reconstructed block copolymer film, etching the resist-coated block copolymer film to create an etched article comprising a nanopatterned substrate, and separating the etch-resistant layer and the block copolymer film from the nanopatterned substrate. The method is applicable to a wide variety of substrate materials, avoids any requirement for complicated procedures to produce long-range order in the block copolymer film, and avoids any requirement for metal functionalization of the block copolymer. | 09-25-2008 |
20100075116 | SELF-ASSEMBLY OF BLOCK COPOLYMERS ON TOPOGRAPHICALLY PATTERNED POLYMERIC SUBSTRATES - Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films. | 03-25-2010 |
20100086801 | METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY - Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces. | 04-08-2010 |
20100112308 | METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY - A nanopatterned surface is prepared by forming a block copolymer film on a miscut crystalline substrate, annealing the block copolymer film, then reconstructing the surface of the annealed block copolymer film. The method creates a well-ordered array of voids in the block copolymer film that is maintained over a large area. The nanopatterned block copolymer films can be used in a variety of different applications, including the fabrication of high density data storage media. | 05-06-2010 |
20120211871 | METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY - A nanopatterned surface is prepared by forming a block copolymer film on a miscut crystalline substrate, annealing the block copolymer film, then reconstructing the surface of the annealed block copolymer film The method creates a well-ordered array of voids in the block copolymer film that is maintained over a large area. The nanopatterned block copolymer films can be used in a variety of different applications, including the fabrication of high density data storage media. | 08-23-2012 |
20130302632 | METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY - Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces. | 11-14-2013 |
20140175579 | METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY - A nanopatterned surface is prepared by forming a block copolymer film on a miscut crystalline substrate, annealing the block copolymer film, then reconstructing the surface of the annealed block copolymer film The method creates a well-ordered array of voids in the block copolymer film that is maintained over a large area. The nanopatterned block copolymer films can be used in a variety of different applications, including the fabrication of high density data storage media. | 06-26-2014 |
Patent application number | Description | Published |
20110209726 | SYSTEMS AND METHODS FOR ROBOTIC GUTTER CLEANING ALONG AN AXIS OF ROTATION - In embodiments of the present invention, a gutter-cleaning device comprises a housing containing an impeller drive facility, the housing configured to fit into a gutter, an impeller, disposed at an end of the housing and driven by the impeller drive facility, and a transport facility for transporting the housing along the gutter | 09-01-2011 |
20120059345 | SYSTEMS AND METHODS FOR WASTE DISPOSAL USING A WEARABLE DISPOSAL BAG - In embodiments of the present invention improved capabilities are described for waste disposal. A disposal bag may be configured to receive waste, wherein the bag is wearable. The disposal bag may include a frame associated with the bag at an opening, the frame being configured to enable a user to close the bag in a single-handed operation when opposing sides of the frame are brought into contact with one another and a sealing facility disposed on the frame for providing a resealable closure of the bag when opposing sides of the frame are brought into contact with one another. | 03-08-2012 |
20140027463 | FLUID CONTAINER - A biodegradable and compostable container for fluids achieves an environmentally friendly look and feel by minimizing the amount of bioplastic component parts that are visible and by maximizing the visibility of component parts made of water-permeable, biodegradable, and compostable material(s). The container includes one or more bioplastic junction pieces that are shaped and positioned to line and seal seams between container wall(s) and a base of the container, container wall(s) and a top of the container, or both. Thus, the one or more bioplastic junction pieces provide water-impermeable barriers at seams in the container where leakage is most likely to occur. The interior of the walls and the cover of the container are coated in one or more biodegradable, water-impermeable materials to ensure that fluid contained in the interior volume is not permitted to pass therethrough, while the resulting container as a whole remains compostable. | 01-30-2014 |
20140238440 | Systems And Methods For Robotic Gutter Cleaning Along An Axis Of Rotation - A gutter-cleaning device includes a body defining a forward drive direction and configured to fit into a residential gutter. The device also includes a drive system supporting the body and configured to maneuver across the gutter. A driven impeller disposed on the body defines an axis of rotation. The impeller has at least one agitator oriented about the axis of rotation. The axis of rotation is arranged at an angle to the forward drive direction to aim toward an inside corner of the gutter to eject agitated debris from the gutter and away from the impeller. | 08-28-2014 |
20140353202 | COMPOSTABLE CONTAINER WITH ELONGATE CONNECTOR - A compostable container has a top frame with a top frame opening, a base, an elongate connector coupling the top frame with the base, and a wall. The top end of the wall is coupled to the top frame, the bottom end of the wall is coupled to the base, the first side end of the wall is coupled to the elongate connector, and the second side end of the wall is coupled to the elongate connector, in such a way as to prevent direct exposure of the edges of the wall to the interior volume of the container and any water-based liquid substance contained within the container. The wall is formed of a water-permeable, biodegradable, and compostable material coated with a biodegradable, water-impermeable coating that forms a lining across the interior facing wall surface of the wall. | 12-04-2014 |