Patent application number | Description | Published |
20080206686 | METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE - A method of forming fine patterns on a semiconductor substrate includes forming a first pattern, including first line patterns having a feature size F and an arbitrary pitch P, and forming a second pattern, including second line patterns disposed between adjacent first line patterns, to form a fine pattern having a half pitch P/2, the first and second line patterns being repeated in the first direction. A gap is formed in at least one first line pattern in a second direction, perpendicular to the first direction, to connect second line patterns positioned on each side of the first line pattern through the gap. At least one jog pattern, extending in the first direction, is formed from at least one first line pattern adjacent to the connected second line patterns. The jog pattern causes a gap in at least one of the connected second line patterns in the second direction. | 08-28-2008 |
20080239781 | Semiconductor memory device and method of forming a layout of the same - A semiconductor memory device having a double-patterned memory cell array that includes a plurality of first bit lines spaced apart from each other and having a first pattern, a plurality of second bit lines spaced apart from each other and having a second pattern, the second bit lines being between the first bit lines to define an alternating array of first and second bit lines, the first and second patterns being different from each other, a first main memory cell array defined by a first portion of the alternating array, a second main memory cell array defined by a second portion of the alternating array, bit lines in the first main memory cell array having a substantially same regularity as bit lines in the second main memory cell array, and a dummy array between the first main memory cell array and the second main memory cell array. | 10-02-2008 |
20090262580 | FLASH MEMORY DEVICE ADAPTED TO PREVENT READ FAILURES DUE TO DUMMY STRINGS - In a NAND flash memory device, a dummy NAND string is arranged between a plurality of normal NAND strings. A dummy bit line connected to the dummy NAND string is formed and/or controlled such that when program voltages are applied to the normal NAND strings, memory cells within the dummy NAND string are not programmed. | 10-22-2009 |
20100290285 | Flash Memory Device Using Double Patterning Technology and Method of Manufacturing the Same - Provided are a flash memory device and a method of manufacturing the same. The flash memory device includes strings. Each of the strings has a string selection line, a ground selection line, and an odd number of word lines formed between the string selection line and the ground selection line. | 11-18-2010 |
Patent application number | Description | Published |
20090034336 | Flash memory device having improved bit-line layout and layout method for the flash memory device - Provided are a flash memory device having an improved bit-line layout and a layout method for the flash memory device. The flash memory device in which bit lines are disposed based on double patterning technology (DPT), may include at least one main bit line connected to a cell string including a memory cell storing data, at least one dummy bit line disposed parallel to the at least one main bit line, and a common source line transferring a common source voltage, and disposed on a different layer from a layer on which the at least one main bit line and the at least one dummy bit line are disposed, wherein the at least one dummy bit line may include a first dummy bit line transferring a first voltage and a second dummy bit line transferring a second voltage. | 02-05-2009 |
20100128530 | FLASH MEMORY DEVICE AND LAYOUT METHOD OF THE FLASH MEMORY DEVICE - Provided is a flash memory device including a plurality of page buffer high voltage transistors. The plurality of high voltage transistors are operatively associated with a page buffer circuit, wherein each high voltage transistor includes; a gate pattern separating a first pattern from a second pattern. The first and second patterns extend in parallel and serve as respective source/drain regions, and the first pattern is floated and the second pattern receives an erase voltage during an erase operation. A first set of high voltage transistors is series connected in a columnar arrangement, such that column adjacent high voltage transistors are laid out with alternating source/drain symmetry in the columnar direction. | 05-27-2010 |
20100149869 | MULTI-LEVEL CELL FLASH MEMORY DEVICE AND READ METHOD - A method of reading data of a multi-level cell (MLC) flash memory device is disclosed. The method includes reading a least significant bit (LSB) and a most significant bit (MSB) of the data programmed to a plurality of memory cells. Reading each of the LSB and MSB includes; reading a MSB flag indicating whether or not the MSB for memory cells in a page of memory cells has been programmed, performing a first read with respect to a plurality of first bit lines, setting a target voltage in view of the read value of the MSB flag, applying the target voltage to a plurality of second bit lines, and performing a second read with respect to the plurality of second bit lines. | 06-17-2010 |