Patent application number | Description | Published |
20090261242 | APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | 10-22-2009 |
20090267003 | SEMICONDUCTOR EXPOSURE DEVICE USING EXTREME ULTRA VIOLET RADIATION - The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity. | 10-29-2009 |
20090289205 | MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield. | 11-26-2009 |
20100054297 | OPTICAL ELEMENT FOR GAS LASER AND GAS LASER APPARATUS USING THE SAME - At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF | 03-04-2010 |
20100078577 | Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device - An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller. | 04-01-2010 |
20100078580 | Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump. | 04-01-2010 |
20100090133 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 04-15-2010 |
20100117009 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE | 05-13-2010 |
20100128747 | POLARIZATION PURITY CONTROL DEVICE AND GAS LASER APPARATUS PROVIDED WITH THE SAME - A degree of polarization control device includes:
| 05-27-2010 |
20100193710 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus. | 08-05-2010 |
20100200776 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - [Problem] An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material. | 08-12-2010 |
20100220756 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - A laser apparatus comprises an amplifier including at least one of a MOPA and a MOPO each of which amplifies a single-longitudinal or multiple-longitudinal mode laser light, an amplifiable agent of the amplifier being a molecular gas, a master oscillator constructed from a semiconductor laser being able to oscillate a single-longitudinal or multiple-longitudinal mode laser light of which wavelength is within one or more amplification lines of the amplifier; and a controller executing a wave shape control adjusting a pulse shape and/or a pulse output timing of a single-longitudinal or multiple-longitudinal mode laser light outputted from the master oscillator. | 09-02-2010 |
20110158281 | GAS DISCHARGE CHAMBER - A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window ( | 06-30-2011 |
20110216800 | TWO-STAGE LASER SYSTEM FOR ALIGNERS - The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser ( | 09-08-2011 |
20110220816 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light. | 09-15-2011 |
20110253913 | CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus and a focusing optical system for focusing a laser beam outputted from the laser apparatus may include: a chamber provided with an inlet through which the laser beam is introduced into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; and a collection unit provided in the chamber for collecting a charged particle generated when the target material is irradiated with the laser beam in the chamber. | 10-20-2011 |
20110284775 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux. | 11-24-2011 |
20110310365 | CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber. | 12-22-2011 |
20120068091 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD FOR CONTROLLING SATURABLE ABSORBER USED IN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump. | 03-22-2012 |
20120085922 | CHAMBER APPARATUS AND METHOD OF CONTROLLING MOVEMENT OF DROPLET IN THE CHAMBER APPARATUS - A chamber apparatus is used in combination with a laser apparatus. The chamber apparatus includes a chamber with an inlet. The inlet is configured for introducing a laser beam into the chamber. A target supply unit is provided to the chamber to supply a target material into the chamber. The target supply unit may electrically be isolated from the chamber. A potential control unit is connected to at least the target supply unit, and configured to control the supply of the target material. | 04-12-2012 |
20120104289 | DROPLET GENERATION AND DETECTION DEVICE, AND DROPLET CONTROL DEVICE - A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal. | 05-03-2012 |
20120104290 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly. | 05-03-2012 |
20120161040 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 06-28-2012 |
20120177072 | POLARIZATION PURITY CONTROL DEVICE AND GAS LASER APPARATUS PROVIDED WITH THE SAME - A degree of polarization control device includes:
| 07-12-2012 |
20120205559 | TARGET SUPPLY DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device is configured for supplying a target material for generating an extreme ultraviolet (EUV) light. The target supply device comprises a target storage unit for storing at least the target material, and a target discharge unit comprising a surface having an opening from which a through-hole extends to communicate with the target storage unit. The target material is discharged through the opening for generating the EUV light. The surface at least around the opening is formed of a material so that the target material has a contact angle greater than 90 degrees with the surface. | 08-16-2012 |
20120217414 | APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | 08-30-2012 |
20120217422 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber. | 08-30-2012 |
20120223257 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element. | 09-06-2012 |
20120224600 | TWO-STAGE LASER SYSTEM FOR ALIGNERS - The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser ( | 09-06-2012 |
20120228525 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result. | 09-13-2012 |
20120236884 | LASER APPARATUS - This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path. | 09-20-2012 |
20120236885 | LASER DEVICE FOR EXPOSURE APPARATUS - A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus, | 09-20-2012 |
20120236894 | WAVELENGTH CONVERSION DEVICE, SOLID-STATE LASER APPARATUS, AND LASER SYSTEM - A wavelength conversion device in this disclosure may include: a nonlinear crystal including a first surface; a first film to be joined to the first surface and including at least one layer; and a first prism to be joined to the first film. | 09-20-2012 |
20120241649 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD - An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis. | 09-27-2012 |
20120243566 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 09-27-2012 |
20120248342 | MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser. | 10-04-2012 |
20120248343 | CHAMBER APPARATUS - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit. | 10-04-2012 |
20120248344 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. | 10-04-2012 |
20120250709 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system in this disclosure may include: a master oscillator configured to output pulsed laser light, a coherence reduction optical system configured to reduce coherence of the pulsed laser light from the master oscillator, and a controller configured to control the coherence reduction optical system so that a speckle of the pulsed laser light varies. | 10-04-2012 |
20120250710 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device. | 10-04-2012 |
20120256105 | SEMICONDUCTOR EXPOSURE DEVICE USING EXTREME ULTRA VIOLET RADIATION - The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity. | 10-11-2012 |
20120305809 | APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection. | 12-06-2012 |
20120305811 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. | 12-06-2012 |
20120307851 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 12-06-2012 |
20120319014 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller. | 12-20-2012 |
20130020511 | MIRROR, MIRROR DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A mirror includes a mirror base provided with a flow channel through which a heat medium passes for cooling the mirror. The flow channel includes a buffer tank portion for adjusting a flow rate of the heat medium in the flow channel. A reflective film is provided on the mirror base. | 01-24-2013 |
20130026393 | CHAMBER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR CONTROLLING THE EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region. | 01-31-2013 |
20130032640 | TARGET SUPPLY UNIT, MECHANISM FOR CLEANING NOZZLE THEREOF, AND METHOD FOR CLEANING THE NOZZLE - An apparatus for physically cleaning a nozzle inside a chamber may include a cleaning member disposed inside the chamber. The nozzle is configured to output a target material into the chamber in which extreme ultraviolet light is generated. The cleaning member is configured to remove the target material deposited around the nozzle. | 02-07-2013 |
20130032735 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS - A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter. | 02-07-2013 |
20130034116 | SLAB AMPLIFICATION DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An EUV light generation system includes a driver laser comprising a master oscillator such as a semiconductor laser, a spatial filter, gas slab amplification devices, relay optical systems, and high-speed axial-flow amplifiers. The slab amplification devices include beam adjusting optical units disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction and/or an elongated direction of the beam profile with the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes. | 02-07-2013 |
20130037693 | OPTICAL SYSTEM AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION SYSTEM INCLUDING THE OPTICAL SYSTEM - An optical system used with a laser apparatus may include a focusing optical system, a beam splitter, and an optical sensor. The focusing optical system has one or more focus, for focusing a laser beam outputted from the laser apparatus. The beam splitter is disposed between the focusing optical system and the one or more focus of the focusing optical system. The optical sensor is disposed on a beam path of a laser beam split by the beam splitter. | 02-14-2013 |
20130048886 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter. | 02-28-2013 |
20130050862 | MIRROR DEVICE - A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts. | 02-28-2013 |
20130062538 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector. | 03-14-2013 |
20130092849 | LASER DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser device having master oscillators that output seed beams is provided. The seed beams are guided from the master oscillators to a regenerative amplifier such that at least one of the seed beams enters the regenerative amplifier at an angle that differs from an angle at which another seed beam enters the regenerative amplifier. A laser apparatus and an extreme ultraviolet light generation system using the laser device are also provided. | 04-18-2013 |
20130094529 | LASER APPARATUS, METHOD FOR GENERATING LASER BEAM, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser apparatus for generating extreme ultraviolet (EUV) light at a wavelength of approximately 13 nm is provided. The laser apparatus may be combined with a reduced projection reflective optical system. Systems and methods for generating EUV light are also provided. | 04-18-2013 |
20130099140 | LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR GENERATING LASER BEAM - A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam. | 04-25-2013 |
20130105712 | APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT | 05-02-2013 |
20130114215 | LASER APPARATUS - A laser apparatus may include: a first module including an oscillator configured to output a laser beam and an oscillator support portion for supporting the oscillator; a second module including a beam delivery unit for delivering the laser beam and a beam delivery unit support portion for supporting the beam delivery unit; a third module including an amplifier for amplifying the laser beam and an amplifier support portion for supporting the amplifier; and a frame on which the modules are placed, the frame including mounts on which the oscillator support portion, the beam delivery support portion and the amplifier support portion are placed. | 05-09-2013 |
20130119232 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image. | 05-16-2013 |
20130126751 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: a first beam shaping unit configured to transform a first laser beam incident thereon into a second laser beam having an annular cross section; and a first focusing optical element for focusing the second laser beam in a first predetermined location so as to generate a Bessel beam. | 05-23-2013 |
20130134330 | HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element. | 05-30-2013 |
20130146682 | TARGET SUPPLY DEVICE - A target supply device may include a reservoir configured to store a target material, the reservoir having a first channel through which the target material passes, a nozzle plate having a second channel through which the target material passes after passing through the first channel, and a filter having a first surface and a second surface and provided between the reservoir and the nozzle plate such that the first surface and the reservoir are face-sealed and the second surface and the nozzle plate are face-sealed, the filter having a plurality of through-holes through which the target material passes. | 06-13-2013 |
20130148674 | LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, METHOD FOR CONTROLLING THE LASER APPARATUS, AND METHOD FOR GENERATING THE EXTREME ULTRAVIOLET LIGHT - A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth. | 06-13-2013 |
20130148677 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD OF ADJUSTING LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller. | 06-13-2013 |
20130153794 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus uses first and second laser beams from a laser apparatus to generate extreme ultraviolet light. The apparatus may include a chamber provided with at least one inlet through which at least one of first and second laser beams outputted from the laser apparatus travels into the chamber. A beam shaping unit is provided on a beam path of the first laser beam for transforming the first laser beam into a hollow laser beam. A first focusing optical element is provided downstream of the beam shaping unit for focusing the hollow laser beam in a first location inside the chamber. | 06-20-2013 |
20130161540 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light (EUV) includes a chamber, a target supply unit, a collector mirror, an exhaust device, a gas supply device and an ultraviolet light source. The target supply unit supplies a target material to a predetermined region inside the chamber. The collector mirror collects EUV light generated from the target material. The exhaust device is connected to the chamber. The gas supply device is connected to the chamber to supply an etchant gas into the chamber. The ultraviolet light source irradiates a reflective surface of the collector mirror with ultraviolet light. | 06-27-2013 |
20130186567 | TARGET SUPPLY DEVICE - A target supply device includes a nozzle portion, a cover, a first electrode, and a potential controller. The nozzle portion has a through-hole defined therein to allow a target material to be discharged therethrough. The cover includes an electrically conductive material and is disposed to cover the nozzle portion. The cover has a through-hole defined therein to allow the target material to pass therethrough. The first electrode is disposed on the cover. The first electrode has a through-hole to allow the target material to pass therethrough. The potential controller is configured to control the first electrode to have a first potential that is lower than a second potential of the cover. | 07-25-2013 |
20130187065 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller. | 07-25-2013 |
20130206863 | TARGET SUPPLY DEVICE - A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body. | 08-15-2013 |
20130208742 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit. | 08-15-2013 |
20130256568 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 10-03-2013 |
20130277452 | CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber. | 10-24-2013 |
20130315272 | REGENERATIVE AMPLIFIER, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position. | 11-28-2013 |
20130322483 | GAS DISCHARGE CHAMBER - A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window ( | 12-05-2013 |
20140001369 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM | 01-02-2014 |
20140034852 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light. | 02-06-2014 |
20140050239 | POLARIZATION PURITY CONTROL DEVICE AND GAS LASER APPARATUS PROVIDED WITH THE SAME - A degree of polarization control device includes:
| 02-20-2014 |
20140077099 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 03-20-2014 |
20140084183 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. | 03-27-2014 |
20140124685 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS - An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam. | 05-08-2014 |
20140183379 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 07-03-2014 |
20140300950 | LASER APPARATUS - A laser apparatus includes at least one oscillator configured to output a first laser beam; a filter device provided in a beam path of the first laser beam, the filter device including either an optical element having transmittance properties depending on a polarization direction and a wavelength and a filter device including a wavelength dispersive element; and at least one amplifier configured to amplify a second laser beam from the filter device and output as a third laser beam. | 10-09-2014 |
20140307244 | METHOD FOR ADJUSTING SPECTRUM WIDTH OF NARROW-BAND LASER - An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized. | 10-16-2014 |
20140341239 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device. | 11-20-2014 |
20140369373 | TWO-STAGE LASER SYSTEM FOR ALIGNERS - The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser ( | 12-18-2014 |
20140374605 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit. | 12-25-2014 |