Patent application number | Description | Published |
20080223294 | Flooding Chamber For Coating Installations - The invention relates to a flooding chamber for coating installations, with which shorter flooding times, and therewith shorter clock cycles, can be attained. Two flooding means are therein utilized, between which a substrate is disposed symmetrically. The flooding means direct a gas jet directly onto the substrate. Hereby the substrate is fixed between the flooding means. | 09-18-2008 |
20090194027 | TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE - The present invention refers to a coating device for coating of substrates comprising
| 08-06-2009 |
20100101948 | ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT - A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder having a lateral surface, a middle part, a first end region and a second end region opposite to the first end region, wherein at least one of the first and the second end regions has a maximum outer diameter substantially equal to or less than the outer diameter of the middle part. | 04-29-2010 |
20110303149 | TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE - The present invention refers to a coating device for coating of substrates comprising at least two process chambers ( | 12-15-2011 |
20110303150 | TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE - The present invention refers to a coating device for coating of substrates comprising at least two process chambers ( | 12-15-2011 |
20110303151 | TWIN-TYPE COATING DEVICE WITH IMPROVED SEPARATING PLATE - The present invention refers to a coating device for coating of substrates comprising at least two process chambers ( | 12-15-2011 |
20120037503 | ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT - A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder ( | 02-16-2012 |
20160002780 | CARRIER FOR SUBSTRATES - A carrier for supporting a substrate in a substrate processing chamber for vacuum processing is described. The carrier includes a substrate fixation assembly, wherein the substrate fixation assembly includes one or more fixation units; a first fixation dement having a first surface configured for contacting a first substrate surface of the substrate; a second fixation element having a second surface configured for contacting a second substrate surface of the substrate; and a force dement for providing a fixation force for the substrate with at least one of the first and the second fixation element. | 01-07-2016 |