Nyhus, US
Daniel A. Nyhus, Payson, AZ US
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20090250548 | FLEXIBLE DUCTING SYSTEM INCLUDING AN ARTICULABLE SEALED JOINT - Aircraft including a powerplant mounted on an airframe and a rotor/wing rotatably mounted on the airframe. The rotor/wing has multiple blades extending outward from roots adjacent the airframe to tips opposite the roots and having internal conduits extending between inlets adjacent the roots and downstream outlets. The aircraft also includes multiple intermediate ducts having upstream ends including flanges and downstream ends slidably and pivotally connected to corresponding blade inlets. Moreover, the aircraft includes a manifold having an upstream end in fluid communication with the powerplant and multiple downstream ends including flanges connected to upstream ends of corresponding intermediate ducts. The aircraft further includes multiple covers connected to corresponding manifold flanges and covering corresponding intermediate duct flanges. The aircraft also includes multiple absorbers positioned between corresponding intermediate duct flanges and manifold flanges and between the intermediate duct flanges and corresponding covers to control movement of the intermediate duct flanges. | 10-08-2009 |
20090309354 | FLEXIBLE DUCTING SYSTEM INCLUDING AN ARTICULABLE SEALED JOINT - Aircraft including a powerplant mounted on an airframe and a rotor/wing rotatably mounted on the airframe. The rotor/wing has multiple blades extending outward from roots adjacent the airframe to tips opposite the roots and having internal conduits extending between inlets adjacent the roots and downstream outlets. The aircraft also includes multiple intermediate ducts having upstream ends including flanges and downstream ends slidably and pivotally connected to corresponding blade inlets. Moreover, the aircraft includes a manifold having an upstream end in fluid communication with the powerplant and multiple downstream ends including flanges connected to upstream ends of corresponding intermediate ducts. The aircraft further includes multiple covers connected to corresponding manifold flanges and covering corresponding intermediate duct flanges. The aircraft also includes multiple absorbers positioned between corresponding intermediate duct flanges and manifold flanges and between the intermediate duct flanges and corresponding covers to control movement of the intermediate duct flanges. | 12-17-2009 |
20110030336 | COANNULAR DUCTED FAN - Secondary air flow is provided for a ducted fan having an engine core driving a fan blisk. The fan blisk incorporates a set of thrust fan blades extending from an outer hub and a set of integral secondary flow blades extending intermediate an inner hub and the outer hub. A nacelle provides a first flow duct for the thrust fan blades and a secondary flow duct carries flow from the integral secondary flow blades. | 02-10-2011 |
Jason R. Nyhus, Hopkins, MN US
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20140207567 | Cross Channel Conversion Tracking System and Method - A cross channel conversion tracking system and method provides online marketers with information regarding which ads lead to conversion transactions, such as purchases. The system and method provides means to track purchases made when a particular user receives a marketing exposure on one device or channel but purchases on another device or channel. A cross channel conversion tracking system and method may be comprised of at least a data collection module, a data integration module, and a communications module with sub-modules as described. A data collection module may collect data on marketing exposures, post-purchase online interactions and device associations. A communications module may be used to retrieve data from local databases or third party systems when available, to allow for cross-device and cross-channel tracking. A data integration module may associate the various types of data to present a picture of marketing expenditure efficiency. | 07-24-2014 |
Julie Nyhus, Eugene, OR US
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20090155182 | OPTICAL IN VIVO IMAGING CONTRAST AGENTS AND METHODS OF USE - Provided is an optical in vivo contrast agent comprising a fluorescent polymeric microsphere, wherein the microsphere is impregnated with a dye having an excitation and emission spectrum compatible with in vivo imaging, and wherein the microsphere is coated with a block copolymer. | 06-18-2009 |
20090311193 | METHODS AND REAGENTS FOR IN VIVO IMAGING OF CANCER CELL LINES - Provided are reagents and methods for non-invasive in vivo imaging wherein the reagents comprise targeted carrier molecules conjugated to a NIR reporter molecule. In one aspect the targeted carrier molecule is an antibody, or fragment thereof that has specificity for an antigen in a living body, animal or human. In one embodiment the antibodies are anti-cancer/tumor marker antibodies, organ specific antibodies, tissue specific antibodies, cell type specific antibodies, cell surface specific antibodies, anti-viral antibodies, anti-bacterial antibodies and anti-pathogenic antibodies. The NIR reporter molecules are any fluorescent reporter molecule compatible with in vivo imaging and generally having an excitation wavelength of at least 580 nm. | 12-17-2009 |
20120253160 | Methods and Reagents for in Vivo Imaging of Cancel Cell Lines - Provided is reagents and methods for non-invasive in vivo imaging wherein the reagents comprise targeted carrier molecules conjugated to a NIB reporter molecule. In one aspect the targeted carrier molecule is an antibody, or fragment thereof that has specificity for an antigen in a living body, animal or human. In one embodiment the antibodes are anti-cancer/tumor marker antibodies, organ specific antibodies, tissue specific antibodies, cell type specific antibodies, cell surface specific antibodies, anti-viral antibodies, anti-bacterial antibodies and anti-pathogenic antibodies. The NIP reporter molecules are any fluorescent reporter molecule compatible with in vivo imaging and generally having an excitation wavelength of at least 580 nm. | 10-04-2012 |
20120276015 | Optical in vivo Imaging Contrast Agents and Methods of Use - Provided is an optical in vivo contrast agent comprising a fluorescent polymeric microsphere, wherein the micro-sphere is impregnated with a dye having an excitation and emission spectrum compatible with in vivo imaging, and wherein the microsphere is coated with a block copolymer. | 11-01-2012 |
Julie Nyhus, Terrace, WA US
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20120077211 | STABLE COMPOSITIONS COMPRISING CHROMOGENIC COMPOUNDS AND METHODS OF USE - Compositions, assays, methods, and kits are disclosed for use in applications that utilize oxidation of a chromogenic electron donor such as diaminobenzidine (DAB) to generate a signal. Applications include, but are not limited to, immunohistochemistry, chromogenic in situ hybridization, Western blots, Northern blots, Southern blots, ELISA assays, and microarray detection. The compositions, assays, methods, and kits disclosed herein make use of a novel, stabilized formulation of DAB and a novel, stabilized formulation of hydrogen peroxide. | 03-29-2012 |
Orville Nyhus, Glendale, AZ US
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20140238724 | FABRICATION OF THREE-DIMENSIONAL PRINTED CIRCUIT BOARD STRUCTURES - A method of fabricating components for a three-dimensional circuit structure includes providing a printed circuit board (PCB) having a top surface, an opposing bottom surface, and an end section. A first angled channel is formed in the top surface at the end section, with the first angled channel extending to an edge of the end section and dividing the end section into a first end portion and a second end portion. The PCB material is removed from the top surface at the first end portion to form a first support member having an upper surface at a preselected distance below the top surface. A second angled channel is formed in the bottom surface at the end section of the first PCB, with the second angled channel extending to the edge of the end section and being adjacent to the first support member. The PCB material is removed from the bottom surface at the second end portion to form a second support member having an upper surface that is contiguous with the top surface of the PCB. A ramp portion extends between the first support member and the second support member. | 08-28-2014 |
Paul Nyhus, Portland, OR US
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20080318137 | Lithography masks for improved line-end patterning - In one embodiment, a mask for use in semiconductor processing comprises a first region formed from a first material that is primarily opaque, a second region formed from a second material that is primarily transmissive, and a third region in which at least a portion of the second material is removed to generate a phase shift in radiation applied to the mask. | 12-25-2008 |
20090104542 | USE OF CHROMELESS PHASE SHIFT MASKS TO PATTERN CONTACTS - Method for using chromeless phase shift lithography (CPL) masks to pattern contacts corresponding CPL masks. The method for patterning contacts includes illuminating a CPL mask comprising a reticle having plurality of phase-shifting features interspersed with non-phase-shifting areas with a short wavelength light source, wherein the phase-shifting features are configured in a pattern corresponding to a target pattern of the contacts on the semiconductor substrate. Phase-shifted and non-phase-shifted light passing through the reticle is the projected as an aerial image onto a layer of a negative tone resist applied over the semiconductor substrate to pattern the contacts in the resist. The phase-shifting features may comprise recesses or mesas, and cause light passing therethrough to be phase-shifted in phase approximately 180° from light passing through non-phase-shifting areas of the mask. | 04-23-2009 |
20100062228 | NEGATIVE TONE DOUBLE PATTERNING METHOD - A method of forming a pattern on a wafer is provided. The method includes applying a photoresist on the wafer and exposing the wafer to define a first pattern on the photoresist. The method also includes exposing the wafer to define a second pattern on the photoresist, wherein each of the first and second patterns comprises unexposed portions of the photoresist and developing the wafer to form the first and second patterns on the photoresist, wherein the first and second patterns are formed by removing the unexposed portions of the photoresist. | 03-11-2010 |
Paul A. Nyhus, Portland, OR US
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20100068633 | SUB-RESOLUTION ASSIST FEATURES - Systems and techniques relating to the layout and use of sub-resolution assist features. In one implementation, a mask includes a first feature and a second feature separated from each other by a gap and a sub-resolution assist feature bridging the gap between the first feature and the second feature. | 03-18-2010 |
20140053117 | TECHNIQUES FOR PHASE TUNING FOR PROCESS OPTIMIZATION - Techniques are provided for determining how thick or how deep to make the phased regions of a lithography mask. One example embodiment provides a method that includes: providing first mask layout design including a first test set, and providing a second mask layout design including a second test set, wherein the second test set is larger than the first test set; simulating critical dimensions through focus of structures of interest in the first test set for a range of phase depths/thicknesses, and selecting an initial preferred mask phase depth/thickness based on results of the simulating; and generating a fast thick-mask model (FTM) at the initial preferred phase depth/thickness, and correcting the second test set of the second mask layout design using the FTM, thereby providing an optimized mask layout design. A mask having the optimized mask layout design may be implemented to give the optimum patterning. | 02-20-2014 |
20140091476 | DIRECTED SELF ASSEMBLY OF BLOCK COPOLYMERS TO FORM VIAS ALIGNED WITH INTERCONNECTS - A method of an aspect includes forming an interconnect line etch opening in a hardmask layer. The hardmask layer is over a dielectric layer that has an interconnect line disposed therein. The interconnect line etch opening is formed aligned over the interconnect line. A block copolymer is introduced into the interconnect line etch opening. The block copolymer is assembled to form a plurality of assembled structures that are spaced along a length of the interconnect line etch opening. An assembled structure is directly aligned over the interconnect line that is disposed within the dielectric layer. | 04-03-2014 |
20140170821 | PATTERNING OF VERTICAL NANOWIRE TRANSISTOR CHANNEL AND GATE WITH DIRECTED SELF ASSEMBLY - Directed self-assembly (DSA) material, or di-block co-polymer, to pattern features that ultimately define a channel region a gate electrode of a vertical nanowire transistor, potentially based on one lithographic operation. In embodiments, DSA material is confined within a guide opening patterned using convention lithography. In embodiments, channel regions and gate electrode materials are aligned to edges of segregated regions within the DSA material. | 06-19-2014 |
20140272711 | PRE-PATTERNED HARD MASK FOR ULTRAFAST LITHOGRAPHIC IMAGING - A method of fabricating a substrate including coating a first resist onto a hardmask, exposing regions of the first resist to electromagnetic radiation at a dose of 10.0 mJ/cm | 09-18-2014 |