Patent application number | Description | Published |
20110204838 | ROTARY DRIVE DEVICE - A first angle-detecting unit outputs a first rotation angle according to the rotation angle of a rotation shaft of a servo motor. A second angle-detecting unit outputs a second rotation angle according to a rotation angle of a rotation shaft of a reduction gear. A torque calculation unit calculates the torque acting on the rotation shaft of the reduction gear according to the angle difference between the first rotation angle and the second rotation angle. An angle-control unit generates a torque reference value according to the difference between the angle reference value and the second rotation angle. A torque control unit generates a current reference value according to the difference between the torque reference value and the torque. | 08-25-2011 |
20110258847 | ROBOTIC CELL - A robotic cell enables a robotic station to be downsized and both high maintainability and high rigidity to be attained. To this end, the robotic cell for assembling parts by using multiple robots includes multiple booths for housing multiple trestles, on each of which a pair of robotic arms are mounted, with the trestles adjoining one another. Each trestle has an opening portion on one side surface thereof, through which a power controller box is carried in and out. To compensate for a decrease in rigidity of the trestle due to the opening portion, a connecting member is used for coupling two trestles adjacent to each other across the respective booths. Both end portions of each connecting member are fastened to the both trestles with screws, respectively. | 10-27-2011 |
20120007374 | GRIPPING APPARATUS, ROBOT SYSTEM AND GRIPPING METHOD - In a conventional technology, it has been difficult to precisely position a gripping object when gripping the gripping object. Therefore, in the present invention, a multifingered hand includes a palm and a plurality of fingers having joints, to grip a tool with the palm and the plurality of fingers. The palm has a palm side contact surface brought into contact with a gripping object side contact surface of the tool. The palm side contact surface is provided with holes into which projections provided on the gripping object side contact surface are inserted. Moreover, when the projections are inserted into the holes, the tool is positioned in a tangential direction of the palm side contact surface, and the tool is also positioned in a rotational direction around a normal line of the palm side contact surface which is a rotary shaft center. | 01-12-2012 |
20130055560 | ROBOT CELL APPARATUS AND PRODUCTION SYSTEM - Provided is a robot cell apparatus in which a cooperatively operable area for a pair of robot arms can be widened and which has an excellent workability. The present invention includes a table with a plane having a quadrangular shape in plan view, a workpiece being placed on the plane. Proximal ends of robot arms are respectively fixed to two corners at diagonal positions among four corners of the plane of the table. A cooperatively operable area in which the pair of robot arms are cooperatively operable is formed in a space above the plane of the table. | 03-07-2013 |
20130086801 | ASSEMBLING APPARATUS AND PRODUCTION SYSTEM - To enable positioning a robot arm and a workpiece with high accuracy while reducing vibrations of a camera. According to the claimed invention for this purpose, a robot station | 04-11-2013 |
20140291192 | COMPONENT CARRYING TRAY - A component carrying tray includes a bottom plate on which a component is stacked, and a projection. The projection has a main body and a regulator. The main body is hollow and has a tapering shape. The regulator is formed in the main body and extends in a direction perpendicular to the carrying surface and contacts a side surface of the component to regulate the component carried on the carrying surface. The bottom plate has a through hole so that when the component carrying tray is stacked on an additional component carrying tray, a projection of the additional component carrying tray comes into the hollow part of the main body. An opening is formed in the projection and configured to avoid, when the component carrying tray is stacked on an additional component carrying tray, interference between the projection and a regulator of the additional component carrying tray. | 10-02-2014 |
Patent application number | Description | Published |
20090148782 | EXPOSURE METHOD, PHOTO MASK, AND RETICLE STAGE - An exposure method includes setting a photo mask into an exposure apparatus. The exposure apparatus includes an opening/closing unit configured to block a part of exposure light from a light source to the wafer. The photo mask having a product area in which a pattern to be used when a central part of a wafer is exposed is formed and peripheral exposure areas in each of which a pattern to be used when a peripheral area is exposed is formed. The peripheral exposure areas are formed to have a plurality of types of pattern densities. Then, a peripheral part of the wafer exposed. When exposing, the opening/closing unit is opened such that one or more of exposed photo mask areas selected from among the peripheral exposure areas has a pattern density corresponding to a shot position of the peripheral part. | 06-11-2009 |
20100023146 | CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING APPARATUS, CONTROL SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE - A control method for a semiconductor manufacturing apparatus, comprising: generating, as log data, a history of operation states of the semiconductor manufacturing apparatus when a wafer is processed by the semiconductor manufacturing apparatus; specifying, based on the log data, processing results in which operation states of the semiconductor manufacturing apparatus are abnormal states out of processing results after the processing of the wafer processed by the semiconductor manufacturing apparatus as abnormal processing results; creating control data for the semiconductor manufacturing apparatus based on the processing results and the abnormal processing results; and controlling the processing by the semiconductor manufacturing apparatus using the control data. | 01-28-2010 |
20100075443 | TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE - A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template. | 03-25-2010 |
Patent application number | Description | Published |
20110097827 | PATTERN FORMATION METHOD AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE - In one embodiment, a pattern formation method is disclosed. The method can place a liquid resin material on a workpiece substrate. The method can press a template against the resin material and measuring distance between a lower surface of a projection of the template and an upper surface of the workpiece substrate. The template includes a pattern formation region and a circumferential region around the pattern formation region. A pattern for circuit pattern formation is formed in the pattern formation region and the projection is formed in the circumferential region. The method can form a resin pattern by curing the resin material in a state of pressing the template. In addition, the method can separate the template from the resin pattern. | 04-28-2011 |
20110192300 | IMPRINT METHOD AND IMPRINT APPARATUS - According to one embodiment, an imprint method is disclosed. The method can include forming a liquid droplet of a transfer material with a volume greater than a predetermined reference volume by dropping the transfer material onto a major surface of a processing substrate. The method can include reducing the volume of the liquid droplet to be less than the reference volume by volatilizing the liquid droplet. In addition, the method can include filling the transfer material into a recess provided in a transfer surface of a template by bringing the liquid droplet having the volume reduced to be less than the reference volume into contact with the transfer surface of the template. | 08-11-2011 |
20130130158 | METHOD FOR FABRICATING PELLICLE, PHOTO MASK, AND SEMICONDUCTOR DEVICE - An aspect of the present embodiment, there is provided a method for fabricating a pellicle, including acquiring a shape of a pellicle frame, deciding a thickness distribution of an adhesive to be coated on the pellicle frame on a basis of the acquired shape of the pellicle frame, and coating the adhesive on the pellicle frame based on the decision of the thickness distribution. | 05-23-2013 |
20130222782 | SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTERN TRANSFER METHOD - According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface. | 08-29-2013 |
20130240480 | METHOD FOR MANUFACTURING MOLD - According to one embodiment, a method is disclosed for manufacturing a mold. The method can include forming a second major surface receded from a first major surface by irradiating a portion of the first major surface with a charged beam to etch a base material having the first major surface. The method can include forming a mask pattern on the first major surface and the second major surface. In addition, the method can include forming a first pattern on the first major surface and a second pattern on the second major surface by etching the base material through the mask pattern. | 09-19-2013 |
20140072668 | MOLD AND MOLD BLANK SUBSTRATE - According to one embodiment, a mold includes a base material, a pedestal portion and a pattern portion. The base material includes a first surface and a second surface. The pedestal portion protruded from the first surface of the base material and includes a side surface. The pattern portion is provided in the pedestal portion and includes an concave-convex pattern. The pedestal portion includes a first region and a second region. The first region is provided with the concave-convex pattern. The second region is provided between the first region and the side surface. The second region has maximum height equal to maximum height of the first region. The second region has a first height of the second region on the side surface side and a second height of the second region on the first region side. The first height is lower than the second height. | 03-13-2014 |
20140246808 | PATTERN FORMATION METHOD AND PATTERN FORMATION DEVICE - According to one embodiment, a pattern formation method is disclosed. The method is configured to transfer a shape of a pattern to a plurality of shot regions of an object using a mold including a first pattern region and a second pattern region aligned with the first pattern region. The method can include transferring the shape of the pattern to each of the plurality of shot regions sequentially in a first direction from the first pattern region toward the second pattern region when the shape of the pattern is transferred using the first pattern region. The method can include transferring the shape of the pattern to each of the plurality of shot regions sequentially in a second direction from the second pattern region toward the first pattern region when the shape of the pattern is transferred using the second pattern region. | 09-04-2014 |