Patent application number | Description | Published |
20110108126 | METHOD AND APPARATUS FOR GAS FLOW CONTROL - A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow. | 05-12-2011 |
20120132291 | TRANSIENT MEASUREMENTS OF MASS FLOW CONTROLLERS - An apparatus to measure the transient response of a mass flow controller (MFC). The size of a variable orifice, upstream of the MFC, is controlled such that the pressure between the orifice and the MFC is held constant during the entire time that the MFC is going through its transient response. The known relationship between the size of the orifice and the flow through it allows a determination of the transient response of the MFC. | 05-31-2012 |
20140366952 | METHOD AND APPARATUS FOR GAS FLOW CONTROL - A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow. | 12-18-2014 |
20140367596 | METHOD AND APPARATUS FOR GAS FLOW CONTROL - A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow. | 12-18-2014 |
Patent application number | Description | Published |
20090180113 | METHOD AND APPARATUS FOR IDENTIFYING THE CHEMICAL COMPOSITION OF A GAS - Embodiments of the present invention relate to the analysis of the components of one or more gases, for example a gas mixture sampled from a semiconductor manufacturing process such as plasma etching or plasma enhanced chemical vapor deposition (PECVD). Particular embodiments provide sufficient power to a plasma of the sample, to dissociate a large number of the molecules and molecular fragments into individual atoms. With sufficient power (typically a power density of between 3-40 W/cm | 07-16-2009 |
20090183548 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. | 07-23-2009 |
20090183549 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. | 07-23-2009 |
20100018293 | METHOD AND APPARATUS FOR THE MEASUREMENT OF ATMOSPHERIC LEAKS IN THE PRESENCE OF CHAMBER OUTGASSING - Embodiments of the present invention employ measurement of argon as the means to detect the presence of an atmospheric leak in a processing chamber. Argon detected inside the process chamber is conclusive evidence of a leak. Furthermore, the amount of detected argon provides information on the rate of air entering through the leak. In one embodiment, leak detection takes place in the main plasma inside the processing chamber. In another embodiment, leak detection takes place in the self-contained plasma generated in a remote plasma sensor. Additional measurements can be performed, such as measuring the amount of oxygen, and/or the presence of moisture to help in detecting and quantifying outgassing from the processing chamber. | 01-28-2010 |
20110011183 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. | 01-20-2011 |
20110108126 | METHOD AND APPARATUS FOR GAS FLOW CONTROL - A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow. | 05-12-2011 |
20110137581 | METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE - An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces. | 06-09-2011 |
20110137582 | METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE - An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces. | 06-09-2011 |
20110137583 | METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE - An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces. | 06-09-2011 |
20110177625 | METHOD AND APPARATUS FOR IDENTIFYING THE CHEMICAL COMPOSITION OF A GAS - Embodiments of the present invention relate to the analysis of the components of one or more gases, for example a gas mixture sampled from a semiconductor manufacturing process such as plasma etching or plasma enhanced chemical vapor deposition (PECVD). Particular embodiments provide sufficient power to a plasma of the sample, to dissociate a large number of the molecules and molecular fragments into individual atoms. With sufficient power (typically a power density of between | 07-21-2011 |
20120132291 | TRANSIENT MEASUREMENTS OF MASS FLOW CONTROLLERS - An apparatus to measure the transient response of a mass flow controller (MFC). The size of a variable orifice, upstream of the MFC, is controlled such that the pressure between the orifice and the MFC is held constant during the entire time that the MFC is going through its transient response. The known relationship between the size of the orifice and the flow through it allows a determination of the transient response of the MFC. | 05-31-2012 |
20120304781 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume. | 12-06-2012 |
20140366952 | METHOD AND APPARATUS FOR GAS FLOW CONTROL - A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow. | 12-18-2014 |
20140367596 | METHOD AND APPARATUS FOR GAS FLOW CONTROL - A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow. | 12-18-2014 |
Patent application number | Description | Published |
20080288248 | VOICE MODEL FOR SPEECH PROCESSING BASED ON ORDERED AVERAGE RANKS OF SPECTRAL FEATURES - Methods and arrangements for generating a voice model in speech processing. Upon accepting at least two input vectors with spectral features, vectors of ranks are created via ranking values of the spectral features of each input vector, ordered vectors are created via arranging the values of each input vector according to rank, and a vector of ordered average values is created via determining the average of corresponding values of the ordered vectors. Thence, a vector of ordered average ranks is created via determining the sum or average of the vectors of ranks, a vector of ordered ranks is created via ranking the values of the ordered average ranks and a spectral feature vector is created via employing the rank order represented by the vector of ordered ranks to reorder the vector of ordered average ranks. | 11-20-2008 |
20080320421 | FEATURE EXTRACTION THAT SUPPORTS PROGRESSIVELY REFINED SEARCH AND CLASSIFICATION OF PATTERNS IN A SEMICONDUCTOR LAYOUT - A system, method and program product for searching and classifying patterns in a VLSI design layout. A method is provided that includes generating a target vector using a two dimensional (2D) low discrepancy sequence; identifying layout regions in a design layout; generating a feature vector for a layout region; comparing a subset of sequence values in the target vector with sequence values in the feature vector as an initial filter, wherein the system for comparing determines that the layout region does not contain a match if a comparison of the subset of sequence values in the target vector with sequence values in the feature vector falls below a threshold; and outputting search results. | 12-25-2008 |
20090310870 | METHOD AND SYSTEM FOR IMPLEMENTING PATTERN MATCHING OF INTEGRATED CIRCUIT FEATURES USING VORONOI DIAGRAMS - A method for implementing pattern matching of integrated circuit features includes computing Voronoi edge regions for both a reference configuration and a search space of an integrated circuit design to be searched and presenting the computed Voronoi edge regions of the reference configuration to a user; receiving one or more selected bisectors of the Voronoi computed reference configuration from the user, indicative of user identified salient regions of design shapes and/or corners to be searched, so as to define one or more search elements, wherein a search element comprises a given bisector and a pair of Voronoi edge regions bounded thereby; constructing a search pattern from the one or more search elements defined from the reference configuration; examining the search space for matching sequences with respect to the search pattern; and highlighting resulting matching patterns in the search space for the user. | 12-17-2009 |
20100017762 | IMPLEMENTING INTEGRATED CIRCUIT YIELD ESTIMATION USING VORONOI DIAGRAMS - A method for implementing integrated circuit yield estimation includes computing Voronoi regions for an original integrated circuit layout; for each bisector segment of the Voronoi regions and one or more failure mechanisms, computing a failure probability based on geometric parameters of corresponding Voronoi edge regions associated with the bisector segment, using pre-computed failure probabilities as a function of edge orientation and spacing for the failure mechanisms; for each segment of a design edge bounded by bisectors, computing a change in the failure probability based on the geometric parameters of the Voronoi regions, using pre-computed change in failure probabilities for the failure mechanisms; encoding the computed failure probabilities for each Voronoi region in a manner suitable for visual differentiation by a user; and encoding the computed change in failure probabilities by directional displacement of a layout edge segment that would result in a decrease in failure probability. | 01-21-2010 |