Patent application number | Description | Published |
20140253370 | WEATHER RADAR APPARATUS, OBSERVATION SEQUENCE GENERATION METHOD, AND OBSERVATION SEQUENCE GENERATION PROGRAM - According to one embodiment, a weather radar apparatus includes an antenna apparatus, a signal processing apparatus, a data converter, a forecasting unit, a state determination unit, and radar controller. The antenna apparatus radiates a radar pulse and receives a reflection pulse. The signal processing apparatus calculates a reception intensity, a Doppler speed, and a speed width. The data converter calculates rainfall intensity data and wind direction/speed data. The forecasting unit generates forecasting data based on the rainfall intensity data and on the wind direction/speed data. The state determination unit generates an observation sequence. The radar controller controls the antenna apparatus in accordance with the observation sequence. | 09-11-2014 |
20140316704 | WEATHER PREDICTION APPARATUS AND WEATHER PREDICTION METHOD - According to an embodiment, weather prediction apparatus divides prediction target area into grids and performs weather prediction for each grid. The apparatus includes receiver, calculator and corrector. Receiver receives observation value in each grid at a first time interval. Calculator sets first observation value received by receiver as initial value and calculates prediction value in each grid using advection model at a second time interval shorter than first time interval. When receiver receives second observation value after first observation value, corrector corrects advection model based on difference between second observation value and prediction value corresponding to observation time of second observation value. | 10-23-2014 |
20150070208 | WEATHER RADAR AND WEATHER OBSERVATION METHOD - According to one embodiment, weather radar includes first antenna unit, second antenna unit, transmitter and receiver. First antenna electronically scans first area of observation space with first transmission beams. Second antenna electronically scans second area whose slant range is shorter than that of first area with second transmission beams of wider width than first transmission beams. Transmitter transmits radio wave to first area from first antenna with first transmission beams and transmits radio wave to second area from second antenna with second transmission beams. Receiver forms reception beams with first antenna to receive reflected wave from first area and reflected wave from second area with reception beams. | 03-12-2015 |
Patent application number | Description | Published |
20100105153 | METHOD FOR MEASURING EXPANSION/CONTRACTION, METHOD FOR PROCESSING SUBSTRATE, METHOD FOR PRODUCING DEVICE, APPARATUS FOR MEASURING EXPANSION/CONTRACTION, AND APPARATUS FOR PROCESSING SUBSTRATE - An expansion/contraction measuring apparatus includes a transport section which transports a flexible substrate along a surface of the substrate; a detecting section detecting first and second marks which are formed on the substrate while being separated from each other by a predetermined spacing distance in a transport direction of the substrate and which are moved, in accordance with the transport of the substrate, to first and second detection areas disposed on a transport route for the substrate respectively; a substrate length setting section which sets a length of the substrate along the transport route between the first and second detection areas to a reference length; and a deriving section which derives information about expansion/contraction of the substrate in relation to the transport direction based on a detection result of the first and second marks. Accordingly, the expansion/contraction state of an expandable/contractible substrate is measured highly accurately. | 04-29-2010 |
20100265483 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTRUING DEVICE - An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond. | 10-21-2010 |
20110012294 | PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD - Six auxiliary sheet holders SH | 01-20-2011 |
20110013162 | PATTERN FORMATION APPARATUS, PATTERN FORMATION METHOD, AND DEVICE MANUFACTURING METHOD - When a segmented region SA | 01-20-2011 |
20110155838 | SUBSTRATE CASE AND SUBSTRATE ACCOMMODATION APPARATUS - A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate. | 06-30-2011 |
20120270144 | PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD - Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface. | 10-25-2012 |
20130027684 | EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus that transfers a pattern provided along a predetermined cylindrical surface onto a substrate while rotating the pattern in a circumferential direction of the cylindrical surface is provided, which includes a first projection optical system that projects an image of a first partial pattern of the pattern which is disposed in a first area of the cylindrical surface onto a first projection area, a second projection optical system that projects an image of a second partial pattern of the pattern which is disposed in a second area different from the first area onto a second projection area different from the first projection area, and a guide device that guides the substrate to the first projection area and the second projection area in synchronization with a rotation of the pattern in the circumferential direction. | 01-31-2013 |