Patent application number | Description | Published |
20100168909 | Substrate Processing Apparatus - A single-wafer substrate processing apparatus includes a substrate transfer chamber including a substrate transfer robot, a process chamber, connected to the substrate transfer chamber, for processing a substrate, and a plurality of port sets including (i) a load port, connected to the substrate transfer chamber for receiving an unprocessed substrate to be supplied to the substrate transfer robot, and (ii) an unload port connected to the substrate transfer chamber, as a member different from the load port, for receiving a processed substrate to be retrieved by the substrate transfer robot. Each of the plurality of port sets, the load port and the unload port are arranged adjacent to each other. The plurality of port sets is arranged apart from one another and around the substrate transfer chamber, and the load port and the unload port are adapted to be capable of vacuum exhaust and vacuum break independently of each other. A controller selects a port set to transfer a substrate using the substrate transfer robot, from among the plurality of port sets, and the unprocessed substrate is transferred one-by-one to the load port. When the unprocessed substrate is transferred to the load port, the inside of the load port is vacuum-exhausted, and when the processed substrate is transferred to the unload port, the inside of the unload port is vacuum-broken. | 07-01-2010 |
20140124664 | DEVICE FOR CORRECTING DIFFRACTION ABERRATION OF ELECTRON BEAM - A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed. | 05-08-2014 |
20140131590 | CHARGED PARTICLE BEAM APPARATUS - In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a beginner is unlikely to sufficiently show a performance of an apparatus. This disclosure aims to provide the charged particle beam apparatus including a parameter adjustment practice function for allowing any user to easily learn the manual adjustment technology. | 05-15-2014 |
20150014530 | CHARGED PARTICLE BEAM APPARATUS - Provided is a charged particle beam apparatus ( | 01-15-2015 |
20150074523 | CHARGED PARTICLE BEAM APPARATUS, SPECIMEN OBSERVATION SYSTEM AND OPERATION PROGRAM - Skills of a novice user operating a charged particle beam apparatus can be improved. Provided are an image display device which displays operation items of an electron microscope on an operation screen, a storage device which stores information of assist buttons which display image state information acquired via a detector of the electron microscope such that the information of assist buttons is correspondent to image quality of the image thus acquired as well as to observation conditions composed of a combination of parameter setting values of the electron microscope, an operation program which analyzes the image quality of the image acquired via the detector, acquires the information of the assist buttons based on analytical results of the image quality of the image as well as current observation conditions, and makes the assist buttons be displayed on the predetermined part of the operation screen. | 03-12-2015 |
20150076348 | CHARGED PARTICLE BEAM APPARATUS, SPECIMEN OBSERVATION SYSTEM AND OPERATION PROGRAM - For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference. | 03-19-2015 |
20150108351 | Scanning Electron Microscope - Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron. The electron beam enters the sample at a predetermined convergence semi-angle, and a lattice image is acquired at a second convergence semi-angle larger than a first convergence semi-angle at which a beam diameter is minimized on the sample. | 04-23-2015 |