Minoru Sugiyama
Minoru Sugiyama, Neyagawa-Shi JP
Patent application number | Description | Published |
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20100261862 | FLAME-RETARDANT PROCESSING METHOD AND FLAME-RETARDED CELLULOSIC FIBER MATERIAL - A flame-retardant processing method, containing: | 10-14-2010 |
Minoru Sugiyama, Kyoto JP
Patent application number | Description | Published |
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20090103960 | DEVELOPING APPARATUS - A developing apparatus disclosed includes a spin chuck for spinnably holding a substrate, a developer nozzle having a plurality of exhaust ports arranged in a row for discharging a developer, the developer nozzle causing the developer discharged from the exhaust ports to impinge in separate streams on the substrate, a horizontal movement mechanism for moving the developer nozzle in one direction extending to the center of the substrate in plan view while maintaining a direction of arrangement of the exhaust ports in the one direction, thereby to move the developer nozzle between substantially the center and an edge of the substrate in plan view, and a controller for controlling the spin chuck and horizontal movement mechanism to cause the separate streams of the developer discharged from the exhaust ports to impinge spirally on the substrate, thereby to develop the substrate. | 04-23-2009 |
20120122038 | DEVELOPING APPARATUS - A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other. | 05-17-2012 |
20150104747 | DEVELOPING APPARATUS - A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other. | 04-16-2015 |
Minoru Sugiyama, Hyogo-Ken JP
Patent application number | Description | Published |
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20080272759 | DC converter with halt mode setting means - A DC converter with a halt mode setting is disclosed for preventing the occurrence of over-current while alleviating the increase in the size of circuits, along with a method for setting up such a halt mode. The DC converter includes a semiconductor switch, a clock generator for outputting a clock signal to a gate of the semiconductor switch to be utilized for controlling an on/off time of the semiconductor switch such that a predetermined power is output from the generator, and a drive circuit for switching the semiconductor switch to the continuous-on state according to a halt mode setting requirement regardless of the clock signal, when the semiconductor switch, normally repeating on/off operations responsive to the clock signal, is in its off-state. | 11-06-2008 |
Minoru Sugiyama, Kyoto-Shi JP
Patent application number | Description | Published |
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20130133708 | CUP AND SUBSTRATE PROCESSING APPARATUS - A cup intermediate portion and a cup lower portion surround a substrate. The cup intermediate portion is arranged above an upper surface of the cup lower portion. A sidewall surrounds the cup intermediate portion and the cup lower portion. A spacing between the upper surface of the cup lower portion and a lower surface of the cup intermediate portion gradually decreases outward from an outer peripheral portion of the substrate while a clearance is formed between the lower surface of the cup intermediate portion and the upper surface of the cup lower portion in respective outer peripheral portions of the cup intermediate portion and the cup lower portion. An inner peripheral surface of the sidewall is spaced apart from the clearance outside the clearance and surrounds the clearance. | 05-30-2013 |
20130315627 | DEVELOPMENT PROCESSING DEVICE - A slit nozzle is moved by a nozzle lifting/lowering mechanism and a nozzle sliding mechanism relative to substrates held in a substantially horizontal attitude by spin chucks. A development liquid is discharged on each substrate from a discharge port of the slit nozzle such that development processing for the substrate is performed. After the development liquid is discharged, the slit nozzle is moved to a waiting position excluding positions over the substrates held by the spin chucks. In waiting pods provided at the waiting positions, cleaning processing for the slit nozzle is performed by a cleaning liquid with gas bubbles mixed therein. | 11-28-2013 |
20140060424 | PROCESSING CUP AND SUBSTRATE PROCESSING APPARATUS - A substrate is surrounded by an inner cup and an outer cup. A distance between an upper surface of an inner cup lower portion and a lower surface of an inner cup upper portion of the inner cup is gradually reduced outward from an outer periphery of the substrate. A clearance is formed between the upper surface of the inner cup lower portion and the lower surface of the inner cup upper portion at outer peripheries of the inner cup lower portion and the inner cup upper portion. A collection space is formed between the upper surface of the inner cup lower portion and the lower surface of the inner cup upper portion. A scatter capturing space that allows a processing liquid that has passed through the clearance to scatter and captures the scattering processing liquid is formed by an outer cup. An upper portion and an outer periphery of the scatter capturing space are covered by a lower surface and an inner side surface of the outer cup, respectively. The processing liquid that has passed through the clearance is led to the inner side surface by the lower surface of the outer cup. | 03-06-2014 |