Patent application number | Description | Published |
20120248617 | MULTILAYERED LOW k CAP WITH CONFORMAL GAP FILL AND UV STABLE COMPRESSIVE STRESS PROPERTIES - The present disclosure provides a multilayered cap (i.e., migration barrier) that conforms to the substrate (i.e., interconnect structure) below. The multilayered cap, which can be located atop at least one interconnect level of an interconnect structure, includes, from bottom to top, a first layer comprising silicon nitride and a second layer comprising at least one of boron nitride and carbon boron nitride. | 10-04-2012 |
20130005146 | MULTILAYERED LOW k CAP WITH CONFORMAL GAP FILL AND UV STABLE COMPRESSIVE STRESS PROPERTIES - The present disclosure provides a multilayered cap (i.e., migration barrier) that conforms to the substrate (i.e., interconnect structure) below. The multilayered cap, which can be located atop at least one interconnect level of an interconnect structure, includes, from bottom to top, a first layer comprising silicon nitride and a second layer comprising at least one of boron nitride and carbon boron nitride. | 01-03-2013 |
20130333923 | MODULATED COMPOSITIONAL AND STRESS CONTROLLED MULTILAYER ULTRATHIN CONFORMAL SiNx DIELECTRICS USED IN NANO DEVICE FABRICATION - A layer of silicon nitride having a thickness from 0.5 nanometers to 2.4 nanometers is deposited on a substrate. A plasma nitridation process is carried out on the layer. These steps are repeated for a plurality of additional layers of silicon nitride, until a predetermined thickness is attained. Such steps can be used to provide a multilayer silicon nitride dielectric formed on a substrate having an upper surface of dielectric material with Cu and other conductors embedded within, and a plurality of steps. The multilayer silicon nitride dielectric has a plurality of individual layers each having a thickness from 0.5 nanometers to 2.4 nanometers, and the multilayer silicon nitride dielectric conformally covers the steps of the substrate with a conformality of at least seventy percent. A multilayer silicon nitride dielectric, and a multilevel back end of line interconnect wiring structure using same, are also provided. | 12-19-2013 |
20150252477 | IN-SITU CARBON AND OXIDE DOPING OF ATOMIC LAYER DEPOSITION SILICON NITRIDE FILMS - Embodiments disclosed herein generally relate to the processing of substrates, and more particularly, relate to methods for forming a dielectric film. In one embodiment, the method includes placing a plurality of substrates inside a processing chamber and performing a sequence of exposing the substrates to a first reactive gas comprising silicon, and then exposing the substrates to a plasma of a second reactive gas comprising nitrogen and at least one of oxygen or carbon, and repeating the sequence to form the dielectric film comprising silicon carbon nitride or silicon carbon oxynitride on each of the substrates. | 09-10-2015 |
20150255324 | SEAMLESS GAP-FILL WITH SPATIAL ATOMIC LAYER DEPOSITION - Embodiments disclosed herein generally relate to forming dielectric materials in high aspect ratio features. In one embodiment, a method for filling high aspect ratio trenches in one processing chamber is disclosed. The method includes placing a substrate inside a processing chamber, where the substrate has a surface having a plurality of high aspect ratio trenches and the surface is facing a gas/plasma distribution assembly. The method further includes performing a sequence of depositing a layer of dielectric material on the surface of the substrate and inside each of the plurality of trenches, where the layer of dielectric material is on a bottom and side walls of each trench, and removing a portion of the layer of dielectric material disposed on the surface of the substrate, where an opening of each trench is widened. The sequence repeats until the trenches are filled seamlessly with the dielectric material. | 09-10-2015 |
20150255507 | METHOD OF FORMING MAGNETIC TUNNELING JUNCTIONS - A method for fabricating an MRAM bit that includes depositing a spacer layer that protects the tunneling barrier layer during processing is disclosed. The deposited spacer layer prevents byproducts formed in later processing from redepositing on the tunneling barrier layer. Such redeposition may lead to product failure and decreased manufacturing yield. The method further includes non-corrosive processing conditions that prevent damage to the layers of MRAM bits. The non-corrosive processing conditions may include etching without using a halogen-based plasma. Embodiments disclosed herein use an etch-deposition-etch sequence that simplifies processing. | 09-10-2015 |
20150299856 | ACCURATE FILM THICKNESS CONTROL IN GAP-FILL TECHNOLOGY - Embodiments disclosed herein generally relate to the processing of substrates, and more particularly, relate to methods for accurate control of film thickness using deposition-etch cycles. Particularly, embodiments of the present disclosure may be used in controlling film thickness during filling high aspect ratio features. | 10-22-2015 |
Patent application number | Description | Published |
20090060020 | METHOD AND APPARATUS FOR ESTIMATING AND CORRECTING BASEBAND FREQUENCY ERROR IN A RECEIVER - A method and apparatus for estimating and correcting baseband frequency error in a receiver. In one embodiment, an equalizer performs equalization on a sample data stream and generates filter tap values based on the equalization. An estimated frequency error signal is generated based on at least one of the filter tap values. A rotating phasor is generated based on the estimated frequency error signal. The rotating phasor signal is multiplied with the sample data stream to correct the frequency of the sample data stream. In another embodiment, a channel estimator performs channel estimation and generates Rake receiver finger weights based on at least one of the finger weights. An estimated frequency error signal is generated based on at least one of the finger weights. | 03-05-2009 |
20090274197 | METHOD AND APPARATUS FOR COMPENSATING FOR PHASE NOISE OF SYMBOLS SPREAD WITH A LONG SPREADING CODE - A method and apparatus for compensating for phase noise of symbols spread with a long spreading code are disclosed. To compensate for the phase noise, a phase error estimate is generated from despread symbols with a short spreading code. A phase correcting phasor is applied to chip rate data before despreading the data with a long spreading code. A signal-to-interference ratio (SIR) on a common pilot channel (CPICH) may be calculated by spreading the data with a parent spreading code in an orthogonal variable spreading factor (OVSF) code tree and by combining symbols. Alternatively, a magnitude of the symbols may be used in estimating the SIR. The SIR of a channel using a short spreading code and an SIR of a channel using a long spreading code are measured. The SIR of the channel with the long spreading code may be compensated in accordance with a difference between degradation of the SIRs. | 11-05-2009 |
20090290630 | ADAPTIVE EQUALIZER WITH A DUAL-MODE ACTIVE TAPS MASK GENERATOR AND A PILOT REFERENCE SIGNAL AMPLITUDE CONTROL UNIT - An adaptive equalizer including an equalizer filter and a tap coefficients generator used to process a sample data stream derived from a plurality of received signals is disclosed. The tap coefficients generator includes an equalizer tap update unit, a vector norm square estimator, an active taps mask generator, a switch and a pilot amplitude reference unit used to minimize the dynamic range of the equalizer filter. A dynamic mask vector is used to mask active taps generated by the equalizer tap update unit when an unmasked signal output by the equalizer filter is selected by the switch to generate an error signal fed to the equalizer tap update unit. A fixed mask vector is used to mask active taps generated by the equalizer tap update unit when a masked signal output by the equalizer filter is used to generate the error signal. | 11-26-2009 |
20090316768 | METHOD AND APPARATUS FOR GENERATING EQUALIZER FILTER TAP COEFFICIENTS - A method and apparatus generating an error signal and an update vector signal used to generate filter tap coefficients for an equalizer filter residing in an equalizer. The equalizer filter outputs an equalized signal in response to receiving a sample data stream. The error signal is generated by down-sampling the equalized signal, subtracting the equalized signal from a reference signal, and filtering and down-sampling the resulting signal. Simultaneously, the update vector signal is generated by converting scalar samples of the sample data stream to a data vector signal and descrambling, filtering, and down-sampling the data vector signal. A tap coefficients generator is used to generate the filter tap coefficients for updating the equalizer filter based on the error signal and the update vector signal. | 12-24-2009 |
20120314755 | ADAPTIVE EQUALIZER WITH A DUAL-MODE ACTIVE TAPS MASK GENERATOR AND A PILOT REFERENCE SIGNAL AMPLITUDE CONTROL UNIT - An adaptive equalizer including an equalizer filter and a tap coefficients generator used to process a sample data stream derived from a plurality of received signals is disclosed. The tap coefficients generator includes an equalizer tap update unit, a vector norm square estimator, an active taps mask generator, a switch and a pilot amplitude reference unit used to minimize the dynamic range of the equalizer filter. A dynamic mask vector is used to mask active taps generated by the equalizer tap update unit when an unmasked signal output by the equalizer filter is selected by the switch to generate an error signal fed to the equalizer tap update unit. A fixed mask vector is used to mask active taps generated by the equalizer tap update unit when a masked signal output by the equalizer filter is used to generate the error signal. | 12-13-2012 |
Patent application number | Description | Published |
20080254474 | DNA METHYLATION ANALYSIS BY DIGITAL BISULFITE GENOMIC SEQUENCING AND DIGITAL METHYLIGHT - Provided are novel sensitive methylation assays referred to herein as Digital MethyLight, comprising stochastically distributing and compartmentalizing bisulfite-treated genomic DNA over multiple PCR reaction wells for detection of individually methylated DNA molecules in a large background of unmethylated DNA. Digital Bisulfite Genomic DNA Sequencing methods are also provided for high-resolution DNA methylation information without subcloning. Background signal and PCR contaminants are diluted, while the ratio of primer to methylated template DNA is kept high. Preferably, biological fluid (e.g., urine, blood-based (e.g., plasma and/or serum)) samples are analyzed for cancer diagnosis, prognosis and surveillance. Multiplexed PCR formats may be implemented to enhance when using small DNA amounts. Compositions and methods for diagnosis and/or prognosis of breast cancer, comprising the use of FOXE1, CLDN5 and/or RUNX3 gene markers are also provided (SEQ ID NOS: 17, 16 and 18, respectively for respective CpG island sequences), and in preferred embodiments plasma or serum samples are used. | 10-16-2008 |
20080286787 | High Throughput Method of DNA Methylation Haplotyping - Particular aspects provide novel, high-throughput methods to quantify DNA methylation (e.g., at a single-base resolution) in an allele-specific manner. The methods comprise use of an allele-specific sequence polymorphism (e.g., allele-specific single nucleotide polymorphism; SNP) in sufficient proximity to a CpG methylation site to provide for distinguishing the methylation levels between two alleles. In particular aspects, after bisulfite modification, the genomic DNA region is PCR-amplified, and the product subjected to allele-specific pyrosequencing, and the percentage of methylation determined based on the percentage of cytosine to thymidine conversion. In further embodiments, MethyLight™ is used after bisulfite treatment. The inventive methodology has, for example, substantial utility for affording quantitative analyses in the regulation of analyses of X-inactivation, the allele-specific expression of genes (e.g., in the immune system) and junk DNA, etc., and in classifying an individual as to whether they have loss of imprinting (LOI). | 11-20-2008 |
20090053706 | DNA METHYLATION MARKERS ASSOCIATED WITH THE CPG ISLAND METHYLATOR PHENOTYPE (CIMP) IN HUMAN COLORECTAL CANCER - Particular aspects confirm the existence of a CpG island methylator phenotype (CIMP) in colorectal cancer, and provide novel validated DNA methylation markers associated with CIMP. Additional aspects provide novel methods and compositions for: determining CIMP status in colorectal cancers, determining the relationship between CIMP status and other molecular features of the cancers (e.g., BRAF mutation, KRAS mutation and MSI status); determining the relationship between CIMP status and other variables (e.g., age, sex, tumor location, family history, race, country of origin, tumor characteristics (including, tumor type, tumor grade, invasive margin characteristics, lymphocyte infiltration characteristics, direct spread, lymph node spread, venous spread and type of residual adjacent polyp, if present)); and determining, between subgroups defined by CIMP status and BRAF mutations, effects of selected risk factors (e.g., body mass index, smoking history, alcohol intake, dietary folate intake, folate metabolic enzyme polymorphisms and history of hormonal use). | 02-26-2009 |
20090123915 | HIGH THROUGHPUT METHODS COMPRISING ANALYSIS OF REPETITIVE ELEMENT DNA METHYLATION - Preferred aspects provide novel high-throughput, sensitive methods (e.g., real-time PCR-based (MethyLight™) reactions) for detection and/or measurement of global genomic 5-methylcytosine content, based on measurement of DNA methylation of Alu, LINE-1 repetitive sequences, and the chromosome 1 centromeric satellite alpha and juxtacentromeric satellite 2 repeat sequences. Additional aspects provide sensitive methods for determining the amount of a DNA (e.g., in formalin-fixed, paraffin-embedded tissues). Combined (mean) use of Alu and Sat2 repeat methylation measurements provides for a surprisingly close correlation with global genomic 5-methylcytosine content measurements obtained by HPLC. Methylation of Alu repeats was determined to be closely associated with HPLC-based global methylation levels, as was methylation of satellite 2 and LINE-1 global genomic 5-methylcytosine content. The assays provide surrogate markers for global genomic 5-methylcytosine content analyses, and have substantial utility for high-throughput and population-based studies (e.g., genetic and dietary influences on global DNA methylation, folate deficiency, MTHFR gene polymorphisms, etc). | 05-14-2009 |
20120219946 | DNA METHYLATION MARKERS ASSOCIATED WITH THE CPG ISLAND METHYLATOR PHENOTYPE (CIMP) IN HUMAN COLORECTAL CANCER - Particular aspects confirm the existence of a CpG island methylator phenotype (CIMP) in colorectal cancer, and provide novel validated DNA methylation markers associated with CIMP. Additional aspects provide novel methods and compositions for: determining CIMP status in colorectal cancers, determining the relationship between CIMP status and other molecular features of the cancers (e.g., BRAF mutation, KRAS mutation and MSI status); determining the relationship between CIMP status and other variables (e.g., age, sex, tumor location, family history, race, country of origin, tumor characteristics (including, tumor type, tumor grade, invasive margin characteristics, lymphocyte infiltration characteristics, direct spread, lymph node spread, venous spread and type of residual adjacent polyp, if present)); and determining, between subgroups defined by CIMP status and BRAF mutations, effects of selected risk factors (e.g., body mass index, smoking history, alcohol intake, dietary folate intake, folate metabolic enzyme polymorphisms and history of hormonal use). | 08-30-2012 |
20160130643 | ACCURATE IN VITRO COPYING OF DNA METHYLATION - A method of copying a methylated nucleic acid molecule is provided. The method includes copying a nucleic acid molecule into a plurality of nucleic acid molecules; and contacting the plurality of nucleic acid molecules with a DNA methyltransferase enzyme and an E3 ubiquitin ligase. The method results in the copying of the methylated nucleic acid molecule. | 05-12-2016 |
Patent application number | Description | Published |
20080254245 | CONTAINER CONSTRUCTIONS - A container, according to various embodiments of the invention, includes a co-extruded, blow molded wall that comprises: (1) a first, inner surface layer, (2) a second, interior layer; and (3) a third layer. In one embodiment, the inner surface layer comprises an extrusion blow-molding-capable grade of PET; the second, interior layer comprises adhesive; and the third layer comprises a polyolefin and the regrind material from one or more containers similar to the blow molded container. In various embodiments, the third layer is an outer surface layer of the blow molded wall. Alternatively, the container may further comprise a fourth (e.g., exterior surface) layer that comprises a polyolefin. In other embodiments, the inner surface layer comprises an extrusion blow-molding-capable grade of PET; the second, interior layer comprises a barrier material, such as polyamide resin, EVOH, or a compatible oxygen scavenger; and the third layer comprises an extrusion blow-molding-capable grade of PET. | 10-16-2008 |
20100143547 | Pet Container And Compositions Having Enhanced Mechanical Properties And Gas Barrier Properties - A container comprising a polyester composition with enhanced mechanical properties is provided. The polyester composition comprises a polyester and a creep control agent. In particular embodiments, the polyester composition comprises a polyester, a creep control agent, and a gas barrier additive. In particular embodiments, the creep control agents are molecules or polymers comprising dianhydrides, bis-lactams, bis-oxazoles, and epoxides. | 06-10-2010 |
20120121837 | Pet Container and Compositions Having Enhanced Mechanical Properties and Gas Barrier Properties - A container comprising a polyester composition with enhanced mechanical properties is provided. The polyester composition comprises a polyester and a creep control agent. In particular embodiments, the polyester composition comprises a polyester, a creep control agent, and a gas barrier additive. In particular embodiments, the creep control agents are molecules or polymers comprising dianhydrides, bis-lactams, bis-oxazoles, and epoxides. | 05-17-2012 |
20120125941 | CONTAINER CONSTRUCTIONS - A container, according to various embodiments of the invention, includes a co-extruded, blow molded wall that comprises: (1) a first, inner surface layer, (2) a second, interior layer; and (3) a third layer. In one embodiment, the inner surface layer comprises an extrusion blow-molding-capable grade of PET; the second, interior layer comprises adhesive; and the third layer comprises a polyolefin and the regrind material from one or more containers similar to the blow molded container. In various embodiments, the third layer is an outer surface layer of the blow molded wall. Alternatively, the container may further comprise a fourth (e.g., exterior surface) layer that comprises a polyolefin. In other embodiments, the inner surface layer comprises an extrusion blow-molding-capable grade of PET; the second, interior layer comprises a barrier material, such as polyamide resin, EVOH, or a compatible oxygen scavenger; and the third layer comprises an extrusion blow-molding-capable grade of PET. | 05-24-2012 |
20140147608 | CONTAINER CONSTRUCTIONS - A container, according to various embodiments of the invention, includes a co-extruded, blow molded wall that comprises: (1) a first, inner surface layer, (2) a second, interior layer; and (3) a third layer. In one embodiment, the inner surface layer comprises an extrusion blow-molding-capable grade of PET; the second, interior layer comprises adhesive; and the third layer comprises a polyolefin and the regrind material from one or more containers similar to the blow molded container. In various embodiments, the third layer is an outer surface layer of the blow molded wall. Alternatively, the container may further comprise a fourth (e.g., exterior surface) layer that comprises a polyolefin. In other embodiments, the inner surface layer comprises an extrusion blow-molding-capable grade of PET; the second, interior layer comprises a barrier material, such as polyamide resin, EVOH, or a compatible oxygen scavenger; and the third layer comprises an extrusion blow-molding-capable grade of PET. | 05-29-2014 |
20140154446 | Pet Container and Compositions Having Enhanced Mechanical Properties and Gas Barrier Properties - A container comprising a polyester composition with enhanced mechanical properties is provided. The polyester composition comprises a polyester and a creep control agent. In particular embodiments, the polyester composition comprises a polyester, a creep control agent, and a gas barrier additive. In particular embodiments, the creep control agents are molecules or polymers comprising dianhydrides, bis-lactams, bis-oxazoles, and epoxides. | 06-05-2014 |
20150045482 | Pet Container and Compositions Having Enhanced Mechanical Properties and Gas Barrier Properties and Methods - A container comprising a polyester composition with enhanced mechanical properties is provided. The polyester composition comprises a polyester and a creep control agent. In particular embodiments, the polyester composition comprises a polyester, a creep control agent, and a gas barrier enhancing additive. In particular embodiments, the creep control agents are molecules or polymers comprising dianhydrides, bis-lactams, bis-oxazoles, and epoxides. | 02-12-2015 |