Patent application number | Description | Published |
20080239312 | Atomic analyzer - [Object] To identify and quantitate an atom of a solid element contained in sludge, waste fluid, or soil. | 10-02-2008 |
20080274392 | Method and Apparatus for Producing Catalyst Layer for Fuel Cell - A method for manufacturing a catalyst layer for a fuel cell support for a catalyst layer comprises the steps of vapor-growing a carbonaceous porous material having a nano-size structure, such as carbon nanowalls (CNWs), and supporting and dispersing a catalyst component and/or an electrolyte component on the support for a catalyst layer. The method simplifies the process for manufacturing an electrode layer for fuel cells and improves the dispersibility of the catalyst component and the electrolyte, whereby the generation efficiency of a fuel cell can be improved. | 11-06-2008 |
20090122317 | Spectroscopy Method and Spectroscope - To achieve an apparatus capable of measuring a light absorption coefficient f a sample with high sensitivity. A ring down spectroscope uses a wavelength-variable femtosecond soliton pulse light source | 05-14-2009 |
20090140651 | Discharge Light Source | 06-04-2009 |
20090263919 | PLASMA OXIDATION PROCESSING METHOD - A plasma oxidation process is performed to form a silicon oxide film on the surface of a target object by use of plasma with an O( | 10-22-2009 |
20090310134 | Multi Micro-Hollow Cathode Light Source and Multi-Atomic Simulataneous Absorption Spectrum Analyzer - [Object] To achieve a compact point light source exhibiting multielement emission spectra with which multi elements can be simultaneously analyzed. | 12-17-2009 |
20100009242 | CARBON NANOWALL WITH CONTROLLED STRUCTURE AND METHOD FOR CONTROLLING CARBON NANOWALL STRUCTURE - Provided is a method for controlling a carbon nanowall (CNW) structure having improved corrosion resistance against high potential by varying the spacing between the carbon nanowall (CNW) walls so that its surface area and crystallinity are controlled. Also provided is a carbon nanowall (CNW) with a high surface arca and a carbon nanowall (CNW) with a high crystallinity, both of which have a controlled structure. According to the present invention, provided are: (1) a carbon nanowall, characterized by having a wall surface area of 50 cm | 01-14-2010 |
20100093179 | PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A pattern forming method includes preparing a target object including silicon with an initial pattern formed thereon and having a first line width; performing a plasma oxidation process on the silicon surface inside a process chamber of a plasma processing apparatus and thereby forming a silicon oxide film on a surface of the initial pattern; and removing the silicon oxide film. The pattern forming method is arranged to repeatedly perform formation of the silicon oxide film and removal of the silicon oxide film so as to form an objective pattern having a second line width finer than the first line width on the target object. | 04-15-2010 |
20100201978 | LIGHT SOURCE - To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere. | 08-12-2010 |
20100212728 | Diode and Photovoltaic Device Using Carbon Nanostructure - To provide an electronic device employing a carbon nanostructure and exhibiting novel characteristics. | 08-26-2010 |
20100258247 | Atmospheric pressure plasma generator - According to the present invention, a long electric discharge path is formed, and a workpiece is irradiated with an atmospheric plasma of a long rectangular area. An argon flow at a first gas outlet forms argon plasma by high-frequency electric power between the first and second electrodes, and the plasma is jetted as an auxiliary plasma in the longitudinal direction from the left end of a primary plasma-generating zone. Another argon flow at a second gas outlet forms argon plasma by high-frequency electric power between the third and fourth electrodes, and the plasma is jetted as an auxiliary plasma in the longitudinal direction from the right end of the primary plasma-generating zone. When high-frequency electric power is applied to the first and third electrodes, electric discharge occurs between two argon plasmas flowing from both ends of the primary plasma-generating zone. Through the electric discharge, the discharge state is maintained in the entire primary plasma-generating zone. Then, oxygen and argon are supplied through gas mixture (argon and oxygen)-supplying pipes to the plasma-generating zone, oxygen plasma is generated. The oxygen plasma is jetted through 170 second holes disposed at the bottom side wall of the cylindrical section to the outside in a direction normal to the side wall, whereby a workpiece is irradiated with oxygen plasma in a long belt-like area having a length of 50 cm. | 10-14-2010 |
20100296979 | PLASMA GENERATOR - To provide a plasma generator having plasma-generating zone of increased volume. | 11-25-2010 |
20110042008 | PLASMA GENERATOR - To provide a plasma generator having a plasma-generating zone of an increased volume. | 02-24-2011 |
20110045207 | METHOD FOR PRODUCING CARBON NANOWALLS - To improve the crystallinity of carbon nanowalls. | 02-24-2011 |
20110114499 | METHOD FOR PRODUCING GRAPHENE - To provide a simple process for producing graphene. | 05-19-2011 |