Patent application number | Description | Published |
20090035497 | STORAGE CONTAINER FOR PHOTOMASK-FORMING SYNTHETIC QUARTZ GLASS SUBSTRATE - A storage container for containing a photomask-forming synthetic quartz glass substrate comprises inner walls facing the front and back surfaces of the glass substrate, and reservoirs provided on the container inner walls for receiving an absorber for components outgassing from the container. A ratio A/B is in the range of 1.0-120 m | 02-05-2009 |
20100190414 | METHOD OF PROCESSING SYNTHETIC QUARTZ GLASS SUBSTRATE FOR SEMICONDUCTOR - Disclosed is a method of processing a synthetic quartz glass substrate for a semiconductor, wherein a polishing part of a rotary small-sized processing tool is put in contact with a surface of the synthetic quartz glass substrate in a contact area of 1 to 500 mm | 07-29-2010 |
20100264114 | MICROPROCESSING OF SYNTHETIC QUARTZ GLASS SUBSTRATE - In a process for microprocessing a synthetic quartz glass substrate by wet etching, an organic coating layer of silane or silazane is formed on the substrate, and a photoresist film is formed on the organic coating layer, prior to the wet etching. | 10-21-2010 |
20110143267 | PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD - A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 μm. | 06-16-2011 |
20110159785 | PREPARATION OF SYNTHETIC QUARTZ GLASS SUBSTRATES - A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2) immersing the polished substrate in an acidic or basic solution for etching the substrate surface to a depth of 0.001-1 nm. The method produces a synthetic quartz glass substrate while preventing formation of defects of a size that is detectable by the high-sensitivity defect inspection tool, and providing the substrate with a satisfactory surface roughness. | 06-30-2011 |
20110287219 | SYNTHETIC QUARTZ GLASS SUBSTRATE AND MAKING METHOD - A synthetic quartz glass substrate has a surface of 6 inch squares including a central surface area of 132 mm squares. The central surface area of 132 mm squares has a flatness of up to 50 nm. A frame region obtained by subtracting the central surface area of 132 mm squares from the central surface area of 148 mm squares has a flatness of up to 150 nm. | 11-24-2011 |
20110308737 | TREATMENT OF SYNTHETIC QUARTZ GLASS SUBSTRATE - A synthetic quartz glass substrate having a resist film coated thereon is treated by immersing it in a terpene-containing solvent until the resist film is released, and rinsing the substrate with water. | 12-22-2011 |
20110318995 | METHOD FOR MANUFACTURING ELECTRONIC GRADE SYNTHETIC QUARTZ GLASS SUBSTRATE - An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures. | 12-29-2011 |
20110318996 | METHOD FOR MANUFACTURING ELECTRONIC GRADE SYNTHETIC QUARTZ GLASS SUBSTRATE - An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining. | 12-29-2011 |
20120021675 | SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING SLURRY AND MANUFACTURE OF SYNTHETIC QUARTZ GLASS SUBSTRATE USING THE SAME - A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector. | 01-26-2012 |
20120207865 | MOLD-FORMING SUBSTRATE AND INSPECTION METHOD - A circular mold-forming substrate of 125-300 mm diameter having a surface on which a topological pattern is to be formed is provided wherein the thickness of the substrate has a variation of up to 2 μm within a circle having a diameter of 125 mm. | 08-16-2012 |
20120263816 | NANOIMPRINT-MOLD RELEASE AGENT, SURFACE TREATMENT METHOD, AND NANOIMPRINT MOLD - A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided | 10-18-2012 |
20120264962 | SILAZANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME - Disclosed are silazane compounds having two fluoroalkyl groups, represented by the following general formula (1): | 10-18-2012 |
20120264964 | ALKOXYSILANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME - Alkoxysilane compounds having two fluoroalkyl groups and represented by the formula (1): | 10-18-2012 |
20130101790 | ELECTRONIC GRADE GLASS SUBSTRATE AND MAKING METHOD - An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished. | 04-25-2013 |
20130122785 | METHOD OF PREPARING SUBSTRATE - A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects. | 05-16-2013 |
20130130596 | SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING SLURRY AND MANUFACTURE OF SYNTHETIC QUARTZ GLASS SUBSTRATE USING THE SAME - In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution. | 05-23-2013 |
20130152483 | METHOD FOR RECOVERY OF CERIUM OXIDE - A method for recovery of cerium oxide from the abrasive waste composed mainly of cerium oxide arising from the polishing of glass substrates, said method including the steps of (i) adding to the abrasive waste an aqueous solution of a basic substance; (ii) adding to the resulting solution a precipitant, thereby forming precipitates composed mainly of cerium oxide, and removing the supernatant liquid; (iii) adding to the resulting precipitates a solution of an acid substance, thereby making said precipitate slightly acid to neutral; (iv) washing the precipitates with an organic solvent; and (v) drying and crushing the precipitates. | 06-20-2013 |
20130203324 | MANUFACTURE OF SYNTHETIC QUARTZ GLASS SUBSTRATE - A rough surface of a starting synthetic quartz glass substrate is polished to a mirror finish, using a polishing slurry containing tetragonal or cubic zirconia. | 08-08-2013 |
20140004309 | PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD | 01-02-2014 |
20140120198 | RECTANGULAR MOLD-FORMING SUBSTRATE - A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible. | 05-01-2014 |
20140242884 | SYNETHETIC QUARTZ GLASS SUBTRATE POLISHING SLURRY AND MANUFACTURE OF SYNETHETIC QUARTZ GLASS SUBSTRATE USING THE SAME - A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector. | 08-28-2014 |
20140295738 | COLLOIDAL SILICA POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SYNTHETIC QUARTZ GLASS SUBSTRATES USING THE SAME - A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz glass substrates, the polishing composition ensures a higher polishing rate than conventional colloidal silica and is effective for preventing any microscopic defects on the substrate surface, thus providing the substrate with a high smoothness. The polishing composition can be used as the ceria replacement polishing composition for polishing a lapped surface. | 10-02-2014 |
20150021292 | POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE - Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan. | 01-22-2015 |