Lori Anne
Lori Anne Cohen-Merfogel, Redding, CT US
Patent application number | Description | Published |
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20130157228 | Money counter and coin rods - A linear base has a coin-rod-receiving face and a predetermined number of numerical indicia. A first coin rod represents a first denomination of coin in a currency system; the first coin rod has a measuring direction dimension that is equal to a number of numerical indicia that is proportional to the value of the first denomination of coin in the currency system. The first coin rod is disposed on the coin-rod-receiving face. A second coin rod represents a second denomination of coin in the currency system. The second denomination is different than the first denomination. The second coin rod has a measuring direction dimension that is equal to a number of numerical indicia that is proportional to the value of the second denomination of coin in the currency system. The second coin rod is disposed on the coin-rod-receiving face. | 06-20-2013 |
Lori Anne Joesten, Charlton, MA US
Patent application number | Description | Published |
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20160062232 | MULTIPLE-PATTERN FORMING METHODS - Multiple-pattern forming methods are provided. The methods comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition comprising: a matrix polymer comprising an acid labile group; a photoacid generator; and a solvent; (c) patternwise exposing the photoresist layer to activating radiation; (d) baking the exposed photoresist layer; (e) contacting the baked photoresist layer with a first developer to form a first resist pattern; (f) treating the first resist pattern with a coating composition comprising an expedient for switching solubility of a sidewall region of the first resist pattern from soluble to insoluble with respect to a second developer that is different from the first developer; and (g) contacting the treated first resist pattern with the second developer to remove portions of the first resist pattern, leaving the solubility-switched sidewall region to form a multiple-pattern. The methods have particular applicability to the semiconductor manufacturing industry for the formation of fine lithographic patterns. | 03-03-2016 |
Lori Anne Metzgar, Burnthills, NY US
Patent application number | Description | Published |
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20130037022 | CPAP STABILIZING HAT - Ventilation apparatus includes a hat having an axis of symmetry and composed of a top and sides extending down to a rim extending all around the hat. An elongated flexible panel encircles the rim. Securements secure the panel to the rim at spaced-apart locations therearound to provide a plurality of relatively long channels extending between the rim and the panel. Each channel extends parallel to the axis and is sized to slidably receive a tube. In use, a patient wears the hat and inlet and outlet tubes are retained in selected hat channels so as to stabilize a patient interface cannula connected to the tubes so that the cannula's nasal prongs remain properly positioned in the patient's nares. | 02-14-2013 |