Patent application number | Description | Published |
20110284812 | METHOD FOR INSTALLING A DOUBLE BEARING IN A CASTING, WHEEL COMPRISING A DOUBLE BEARING, AND JOINT WITH DOUBLE BEARING - A method for installing a casting double bearing in a casting, and a wheel manufactured according to the method are provided. The double bearing includes at least two bearing units that are essentially similar. The method includes at least the following phases: a double bearing is formed by disposing two bearings next to each other side-by-side and by placing a separator that forms a gap between the bearings such that the separator rests on at least one of outer surface of the outer rim of a bearing, and the separator part of the separator is disposed between the side surfaces that face each other of the outer rims of the bearings; the formed double bearing is placed in the casting mold in the correct position; and the casting is cast around the double bearing | 11-24-2011 |
20120312640 | ELEVATOR, GUIDE RAIL BRACKET, ARRANGEMENT AND METHOD - Elevator, which includes a guide rail line, which includes a plurality of consecutive guide rails, which are supported on the building with guide rail brackets fixed to the building, which guide rail brackets comprise a frame, a mounting base and structure for pressing the guide rail against the mounting base, which guide rail bracket essentially prevents at its point lateral movement of the guide rail in relation to the fixing point of the guide rail bracket and permits longitudinal movement of the guide rail in relation to the fixing point of the guide rail bracket. The aforementioned mounting base is fixed to the frame of the guide rail bracket movably in the longitudinal direction of the guide rail. | 12-13-2012 |
20130142469 | METHOD FOR INSTALLING A DOUBLE BEARING IN A CASTING, WHEEL COMPRISING A DOUBLE BEARING, AND JOINT WITH DOUBLE BEARING - A method for installing a casting double bearing in a casting, and a wheel manufactured according to the method are provided. The double bearing includes at least two bearing units that are essentially similar. The method includes at least the following phases: a double bearing is formed by disposing two bearings next to each other side-by-side and by placing a separator that forms a gap between the bearings such that the separator rests on at least one of outer surface of the outer rim of a bearing, and the separator part of the separator is disposed between the side surfaces that face each other of the outer rims of the bearings; the formed double bearing is placed in the casting mold in the correct position; and the casting is cast around the double bearing | 06-06-2013 |
Patent application number | Description | Published |
20100118403 | Layered light guide with diffractive structures - A layered light guide structure has a number of planar light guides arranged in a stack to receive a number of different color light beams from the edge of the light guides. Each of the planar light guides has one or more diffractive structures imparted or provided on its upper surface. The diffractive structures on each light guide are configured to diffract light of a particular wavelength range so that they efficiently diffract the guided light within that light guide. The diffractive structure can be one or more keypad symbols such that the layered light guide structure can be used as a keypad. The symbols can be pixelized such that the pixels can have different color patterns. The diffractive structure can also be a simple patch so that the layered light guide structure can be used as a back-light source. | 05-13-2010 |
20100328317 | Automatic Zoom for a Display - A method, apparatus, user interface and computer program product include the ability to determine a brightness characteristic of a display, use the brightness characteristic to determine a minimum and optimum font size for information displayed on the display, and automatically adjust the displayed information such that a size of a smallest font of the information is not smaller than the minimum font size and that a size of a main font of the information is not smaller that the optimum font size. | 12-30-2010 |
20130009962 | AUTOMATIC ZOOM FOR A DISPLAY - A method, apparatus, computer program product, and user interface provide for determining a minimum and optimum font size for information displayed on a display based on a predetermined set of criteria, and automatically adjusting the displayed information on the display using a module such that a size of a smallest font of the information is not smaller than the minimum font size and that a size of a main font of the information is not smaller than the optimum font size. | 01-10-2013 |
Patent application number | Description | Published |
20090074964 | METHOD AND APPARATUS FOR REMOVING SUBSTANCES FROM GASES - The present invention concerns a method and an apparatus for removing substances from gases discharged from gas phase reactors. In particular, the invention provides a method for removing substances contained in gases discharged from an ALD reaction process, comprising contacting the gases with a “sacrificial” material having a high surface area kept at essentially the same conditions as those prevailing during the gas phase reaction process. The sacrificial material is thus subjected to surface reactions with the substances contained in the gases to form a reaction product on the surface of the sacrificial material and to remove the substances from the gases. The present invention diminishes the amount of waste produced in the gas phase process and reduces wear on the equipment. | 03-19-2009 |
20090181169 | METHOD FOR GROWING THIN FILMS - The invention relates to a method and apparatus for growing a thin film onto a substrate, in which method a substrate placed in a reaction space ( | 07-16-2009 |
20090263578 | Apparatus and methods for deposition reactors - An apparatus, such as an ALD (Atomic Layer Deposition) apparatus, including a precursor source configured for depositing material on a heated substrate in a deposition reactor by sequential self-saturating surface reactions. The apparatus includes an in-feed line for feeding precursor vapor from the precursor source to a reaction chamber and a structure configured for utilizing heat from a reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the reaction chamber. Also various other apparatus and methods are presented. | 10-22-2009 |
20090297710 | Methods and apparatus for deposition reactors - The invention relates to methods and apparatus in which precursor vapor is guided along at least one in-feed line into a reaction chamber of a deposition reactor, and material is deposited on surfaces of a batch of vertically placed substrates by establishing a vertical flow of precursor vapor in the reaction chamber and having it enter in a vertical direction in between said vertically placed substrates. | 12-03-2009 |
20100028122 | Atomic layer deposition apparatus and loading methods - The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being figured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question. | 02-04-2010 |
20130029042 | Atomic Layer Deposition Apparatus And Loading Methods - The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question. | 01-31-2013 |
20130183444 | Apparatus and Methods for Deposition Reactors - An apparatus, such as an ALD (Atomic Layer Deposition) apparatus, including a precursor source configured for depositing material on a heated substrate in a deposition reactor by sequential self-saturating surface reactions. The apparatus includes an in-feed line for feeding precursor vapor from the precursor source to a reaction chamber and a structure configured for utilizing heat from a reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the reaction chamber. Also various other apparatus and methods are presented. | 07-18-2013 |
20130240056 | APPARATUS AND METHODS FOR DEPOSITION REACTORS - An apparatus, such as an ALD (Atomic Layer Deposition) apparatus, including a precursor source configured for depositing material on a heated substrate in a deposition reactor by sequential self-saturating surface reactions. The apparatus includes an in-feed line for feeding precursor vapor from the precursor source to a reaction chamber and a structure configured for utilizing heat from a reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the reaction chamber. Also various other apparatus and methods are presented. | 09-19-2013 |
20140024223 | Atomic Layer Deposition with Plasma Source - The invention relates to method including operating a plasma atomic layer deposition reactor configured to deposit material in a reaction chamber on at least one substrate by sequential self-saturating surface reactions, and allowing gas from an inactive gas source to flow into a widening radical in-feed part opening towards the reaction chamber substantially during a whole deposition cycle. The invention also relates to a corresponding apparatus. | 01-23-2014 |
20140087093 | DEPOSITION REACTOR WITH PLASMA SOURCE - A deposition reactor includes an in-feed part that defines an expansion space which leads reactants as a top to bottom flow from a plasma source towards a reaction chamber, the expansion space widening towards the reaction chamber, and a lifting mechanism for loading at least one substrate to the reaction chamber from the top side of the reaction chamber. The deposition reactor deposits material on the at least one substrate in the reaction chamber by sequential self-saturating surface reactions. | 03-27-2014 |
20140335267 | ATOMIC LAYER DEPOSITION REACTOR FOR PROCESSING A BATCH OF SUBSTRATES AND METHOD THEREOF - The invention relates to a method that includes providing a reaction chamber module of an atomic layer deposition reactor for processing a batch of substrates by an atomic layer deposition process, and loading the batch of substrates before processing into the reaction chamber module via a different route than the batch of substrates is unloaded after processing. The invention also relates to a corresponding apparatus. | 11-13-2014 |