Kvasnica
David Kvasnica, Dusseldorf DE
Patent application number | Description | Published |
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20130154950 | APPARATUS AND METHOD PERTAINING TO DISPLAY ORIENTATION - A control circuit detects a touch-based user interaction with a touch-responsive portion of a display and responsively alters a display modality of the display. This touch-responsive portion of the display may be visually non-specific as regards any corresponding touch-based functionality. This touch-responsive portion can comprise a touch-responsive periphery of the display. The touch-based user interaction can comprise a gesture that begins and/or concludes in the touch-responsive portion. The resultant alteration of the display modality can comprise rotating the display about a center point. This rotation can comprise, by one approach, switching from a landscape modality to a portrait modality or vice versa. | 06-20-2013 |
Samuel Kvasnica, Vienna AT
Patent application number | Description | Published |
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20080203317 | MULTI-BEAM DEFLECTOR ARRAY DEVICE FOR MASKLESS PARTICLE-BEAM PROCESSING - The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path. | 08-28-2008 |
Samuel Kvasnica, Wien AT
Patent application number | Description | Published |
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20160071684 | Correction of Short-Range Dislocations in a Multi-Beam Writer - Method for computing an exposure pattern for exposing a desired pattern on a target in a charged-particle lithography apparatus, in which a particle beam is directed to and illuminates a pattern definition device comprising an aperture array composed of a plurality of blanking apertures through which said particle beam penetrates for writing said desired pattern by exposing a multitude of pixels within an exposure area on the target, said method taking into account a spatially dependent distortion of the target within the exposure area, with respect to dislocations transversal to the direction of the particle beam. | 03-10-2016 |