Kobiyama
Toshie Kobiyama, Saitama-Shi JP
Patent application number | Description | Published |
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20100245377 | COLOR CONVERTER, COLOR CONVERSION METHOD AND COMPUTER READABLE MEDIUM - The color converter is provided with: a color conversion parameter generation unit that generates a color conversion parameter based on a source profile and a destination profile, the source profile indicating a color reproduction characteristic of a device used for generating an input image, the destination profile indicating a color reproduction characteristic of a device used for generating an output image; a conversion unit that converts color data of the input image into color data of the output image by using the color conversion parameter generated by the color conversion parameter generation unit; and a memory that stores the color conversion parameter generated by the color conversion parameter generation unit so that the color conversion parameter is associated with identification information of the source profile. | 09-30-2010 |
Toshie Kobiyama, Saitama JP
Patent application number | Description | Published |
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20080278736 | IMAGE PROCESSING APPARATUS AND METHOD, IMAGE OUTPUT APPARATUS, IMAGE PROCESSING SYSTEM, RECORDING MEDIUM IN WHICH IMAGE PROCESSING PROGRAM IS STORED, AND RECORDING MEDIUM IN WHICH IMAGE OUTPUT PROGRAM IS STORED - An image processing apparatus includes a first print information receiving unit for receiving first print information including image data and color information, a color conversion parameter generating unit that generates a color conversion parameter for converting a color signal of the image data to a color signal of a color space fixed in advance, based on the color information included in the first print information, and a second print information transmitting unit that generates second print information by adding the color conversion parameter to the first print information. Also disclosed is an image processing method. | 11-13-2008 |
Yuji Kobiyama, Yokohama JP
Patent application number | Description | Published |
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20100157046 | METHOD AND APPARATUS FOR ANALYZING A GROUP OF PHOTOLITHOGRAPHIC MASKS - The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated. | 06-24-2010 |