Patent application number | Description | Published |
20090183677 | TEMPERATURE CONTROL DEVICE AND PROCESSING APPARATUS USING THE SAME - Provided are a temperature control device capable of performing a temperature control of, e.g., a chamber wall of a processing apparatus with a high precision; and a processing apparatus using the same. The temperature control device | 07-23-2009 |
20090194236 | Plasma processing equipment - A plurality of concentric ring-shaped slots ( | 08-06-2009 |
20090194238 | PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus capable of easily processing a top surface of a mounting table to have a smooth shape, and also capable of preventing a temperature of a peripheral portion of a substrate from decreasing. A plasma processing apparatus | 08-06-2009 |
20100032094 | CEILING PLATE AND PLASMA PROCESS APPARATUS - A ceiling plate provided at a ceiling portion of a process chamber that may be evacuated to a vacuum is disclosed. The ceiling plate allows microwaves emitted from a slot of a planar antenna member provided along with the ceiling plate to pass through the ceiling plate into the process chamber, and includes plural protrusion portions provided in a radial pattern on a surface of the ceiling plate, the surface facing toward an inside of the process chamber. | 02-11-2010 |
20100288439 | TOP PLATE AND PLASMA PROCESS APPARATUS EMPLOYING THE SAME - A disclosed top plate that is configured as a solid part and provided in an opening in a ceiling portion of a plasma process chamber whose inside is evacuatable to vacuum includes plural gas conduits formed in a horizontal direction of the top plate; and gas ejection holes that are open in a first surface of the top plate, the first surface facing the inside of the plasma process chamber and in gaseous communication with the plural gas conduits. | 11-18-2010 |
20110000780 | TOP PLATE OF MICROWAVE PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma generation chamber of a plasma processing apparatus is closed by a top plate | 01-06-2011 |
20120118505 | PLASMA PROCESSING APPARATUS AND COOLING DEVICE FOR PLASMA PROCESSING APPARATUS - A coolant flow path for cooling a dielectric window of a side wall of a processing container of the plasma processing apparatus is provided. A coolant flows in a liquid or gaseous state in the coolant flow path without phase transition. At least a portion of the coolant flow path extending in a circumferential direction of the side wall has a cross-sectional area decreased toward downstream from upstream. | 05-17-2012 |
20130081763 | CEILING PLATE AND PLASMA PROCESS APPARATUS - A ceiling plate provided at a ceiling portion of a process chamber that may be evacuated to a vacuum is disclosed. The ceiling plate allows microwaves emitted from a slot of a planar antenna member provided along with the ceiling plate to pass through the ceiling plate into the process chamber, and includes plural protrusion portions arranged along a circle in a surface of the ceiling plate so as to form plural radially disposed virtual convex portions in a place between the concave portions, the surface facing toward an inside of the process chamber. A thickness of places where the concave portions are formed in the ceiling plate and another thickness of other places where the concave portions are not formed in the ceiling plate are determined so that the number of propagation modes of microwaves is different. | 04-04-2013 |