Patent application number | Description | Published |
20080281545 | DETERMINING DIE TEST PROTOCOLS BASED ON PROCESS HEALTH - A method includes receiving a first set of parameters associated with a subset of a plurality of die on a wafer. A die health metric is determined for at least a portion of the plurality of die based on the first set of parameters. The die health metric includes at least one process component associated with the fabrication of the die and at least one performance component associated with an electrical performance characteristic of the die. At least one of the die is tested. A protocol of the testing is determined based on the associated die health metric. | 11-13-2008 |
20090006021 | METHOD AND APPARATUS FOR IMPLEMENTING SCALED DEVICE TESTS - A method includes defining a hierarchy of test routines in a test program for testing integrated circuit devices. A first device is tested at a first screening level in the hierarchy. The first device is tested at a second detailed level in the hierarchy responsive to the first device failing the testing at the first screening level. | 01-01-2009 |
20090012730 | Method and apparatus for matching test equipment calibration - A method includes collecting trace data associated with a plurality of device testers. Tester health metrics are generated for each of the device testers. The tester health metrics are analyzed to identify a selected tester health metric that diverges from the plurality of tester health metrics. A corrective action is initiated for the tester associated with the selected tester health metric. A method includes collecting trace data associated with a plurality of device testers. The trace data for each of the device testers is compared to a reference trace data set to generate tester health metrics for each of the device testers based on the difference therebetween. The tester health metrics are analyzed to identify a selected tester health metric that diverges from the plurality of tester health metrics. A corrective action is initiated for the tester associated with the selected tester health metric. | 01-08-2009 |
20090058449 | METHOD AND APPARATUS FOR EMPLOYING PREVIOUS TEST INSERTION RESULTS FOR TESTING A DEVICE - A method includes determining at least a first characteristic of a device during a first test insertion and storing the first characteristic. The device is identified during a second test insertion. The first characteristic is retrieved responsive to the identification of the device. A test program for the second insertion is configured based on the first characteristic. The configured test program is executed to test the device during the second test insertion. | 03-05-2009 |
20090144686 | METHOD AND APPARATUS FOR MONITORING MARGINAL LAYOUT DESIGN RULES - A method includes generating a layout for an integrated circuit device in accordance with a plurality of layout design rules. A plurality of metrology sites on the layout associated with at least one subset of the layout design rules is identified. A metrology tag associated with each of the metrology sites is generated. At least one metrology recipe for determining a characteristic of the integrated circuit device is generated based on the metrology tags. Metrology data is collected using the at least one metrology recipe. A selected layout design rule in the at least one subset is modified based on the metrology data. | 06-04-2009 |
20090144692 | METHOD AND APPARATUS FOR MONITORING OPTICAL PROXIMITY CORRECTION PERFORMANCE - A method includes specifying a plurality of optical proximity correction metrology sites on a wafer. Metrology data is collected from at least a subset of the metrology sites. Data values are predicted for the subset of the metrology sites using an optical proximity correction design model. The collected metrology data is compared to the predicted data values to generate an optical proximity correction metric. A problem condition associated with the optical proximity correction design model is identified based on the optical proximity correction metric. | 06-04-2009 |
20090153818 | METHOD AND APPARATUS FOR EXTRACTING DOSE AND FOCUS FROM CRITICAL DIMENSION DATA - A method for monitoring a photolithography system includes defining a model of the photolithography system for modeling top and bottom critical dimension data associated with features formed by the photolithography system as a function of dose and focus. A library of model inversions is generated for different combinations of top and bottom critical dimension values. Each entry in the library specifies a dose value and a focus value associated with a particular combination of top and bottom critical dimension values. A top critical dimension measurement and a bottom critical dimension measurement of a feature formed by the photolithography system using a commanded dose parameter and a commanded focus parameter are received. The library is accessed using the top and bottom critical dimension measurements to generate values for a received dose parameter and the received focus parameter. The received dose and focus parameters are compared to the commanded dose and focus parameters to characterize the photolithography system. | 06-18-2009 |
20090157577 | METHOD AND APPARATUS FOR OPTIMIZING MODELS FOR EXTRACTING DOSE AND FOCUS FROM CRITICAL DIMENSION - A method includes defining a reference model of a system having a plurality of terms for modeling data associated with the system. A reference fit error metric is generated for the reference model. A set of evaluation models each having one term different than the reference model is generated. An evaluation fit error metric for each of the evaluation models is generated. The reference model is replaced with a selected evaluation model responsive to the selected evaluation model having an evaluation fit error metric less than the reference fit error metric. The model evaluation is repeated until no evaluation model has an evaluation fit error metric less than the reference fit error metric. The reference model is trained using the data associated with the system, and the trained reference model is employed to determine at least one characteristic of the system. | 06-18-2009 |