Patent application number | Description | Published |
20150069549 | MAGNETIC ELEMENT AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a first magnetic layer, a first nonmagnetic layer on the first magnetic layer, a second magnetic layer on the first nonmagnetic layer, a second nonmagnetic layer on the second magnetic layer, and a third magnetic layer on the second nonmagnetic layer, the third magnetic layer having a sidewall includes a material which is included in the second nonmagnetic layer. | 03-12-2015 |
20150069559 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a nonvolatile semiconductor memory device includes a magnetoresistive element formed on a semiconductor substrate, a first contact plug which extends through an interlayer dielectric film formed on the semiconductor substrate and immediately below the magnetoresistive element, has a bottom surface in contact with an upper surface of the semiconductor substrate, and is adjacent to the magnetoresistive element, and an insulating film formed between the magnetoresistive element and the first contact plug and on the interlayer dielectric film, wherein the insulating film includes a first region positioned on a side of the interlayer dielectric film, and a second region positioned in the insulating film and on an upper surface of the first region, the insulating film is made of SiN, and the first region is a nitrogen rich film compared to the second region. | 03-12-2015 |
20150072439 | METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT - According to one embodiment, a method of manufacturing a magnetoresistive element, the method includes forming a first non-magnetic layer on a first magnetic layer, forming a second magnetic layer on the first non-magnetic layer, forming a second non-magnetic layer on the second magnetic layer, forming a third magnetic layer on the second non-magnetic layer, patterning the third magnetic layer by a RIE using an etching gas including a noble gas and a nitrogen gas until a surface of the second non-magnetic layer is exposed, and patterning the second non-magnetic layer and the second magnetic layer after patterning of the third magnetic layer. | 03-12-2015 |
20150072440 | METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT - According to one embodiment, a method of manufacturing a magnetoresistive element, the method includes forming a non-magnetic layer on a first magnetic layer, forming a second magnetic layer on the non-magnetic layer, and patterning the second magnetic layer by a RIE using an etching gas including a noble gas and a hydrocarbon gas. | 03-12-2015 |
20150263265 | MAGNETIC MEMORY DEVICE - According to one embodiment, a magnetic memory device includes a stacked structure including a magnetic element, a protective insulating film covering the stacked structure, and an interface layer provided at an interface between the stacked structure and the protective insulating film. The interface layer contains a predetermined element which is not contained in the magnetic element or the protective insulating film. | 09-17-2015 |
20150263272 | MANUFACTURING METHOD OF MAGNETIC MEMORY DEVICE AND MANUFACTURING APPARATUS OF MAGNETIC MEMORY DEVICE - According to one embodiment, a method of manufacturing a magnetic memory device, includes accommodating, in an etching chamber, a substrate with a stacked film including a magnetic layer, etching at least a part of the stacked film in the etching chamber to form a columnar structure, and transferring the substrate with the columnar structure from the etching chamber to a transfer chamber in which a reducing purge gas is supplied. | 09-17-2015 |
20150263273 | MAGNETIC MEMORY HAVING MAGNETORESISTIVE ELEMENT AND METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT - According to one embodiment, a magnetic memory includes a transistor having first and second diffusion layers in a semiconductor substrate and a gate electrode between the first and second diffusion layers, a first insulating layer on the semiconductor substrate, the first insulating layer covering the transistor, a first contact plug in the first insulating layer, the first contact plug connected to the first diffusion layer, a second contact plug in the first insulating layer, the second contact plug connected to the second diffusion layer, a magnetoresistive element on the first insulating layer, the magnetoresistive element connected to the first contact plug, an electrode on the magnetoresistive element, and an impurity region in the first insulating layer, the second contact plug, and the electrode. | 09-17-2015 |
20150263275 | MANUFACTURING METHOD OF MAGNETIC MEMORY DEVICE AND MANUFACTURING APPARATUS OF MAGNETIC MEMORY DEVICE - According to one embodiment, a method of manufacturing a magnetic memory device, includes etching at least a part of a stacked film including a magnetic layer, to form a columnar structure, and performing a surface treatment on a side surface of the columnar structure, using a surface treatment gas containing a predetermined element and hydrogen. | 09-17-2015 |