Patent application number | Description | Published |
20150132779 | Method for Determining Ubiqutin Chain Length - Protein ubiquitylation, an essential post-translational modification, regulates almost every cellular process including protein degradation, protein trafficking, signal transduction, and DNA damage response in eukaryotic cells. The diverse functions of ubiquitylation are thought to be mediated by distinct chain topologies resulting from eight different ubiquitin linkages, chain lengths, and complexities. Currently, ubiquitin linkages are generally thought to be a critical determinant of ubiquitin signaling. However, ubiquitin chain lengths, another key element of ubiquitin signaling, have not been well documented especially in vivo situation during past three decades from the discovery of ubiquitin. The reason of this was simply because no method has been available for determination of ubiquitin chain length in endogenous ubiquitylated substrates. In the present invention, a practical technique for determining the actual length of substrate-attached polyubiquitin chains from biological samples is established. Using the method, the mean length of substrate-attached polyubiquitin chains was determined and the robustness of ubiquitin chain length regulation in cells is investigated. The following is a summary of findings in this invention: 1. A method for determining ubiquitin chain length was developed and this method was named ‘ubiquitin protection from trypsinization’ (Ub-ProT). 2. Using Ub-ProT, it was determined that the mean length of substrate-attached ubiquitin chains is in the dimer to decamer range. 3. By quantitative proteomics, it was found that the mean lengths of five major types of ubiquitin chains can be divided into two groups. 4. Proteasome-inhibition did not alter the mean length of substrate-attached polyubiquitin chains, indicating that cells have a robust system for regulating ubiquitin chain length. | 05-14-2015 |
Patent application number | Description | Published |
20100243960 | COATING SOLUTION FOR APPLICATION METHOD OF DISCHARGING COATING SOLUTION THROUGH SLIT-LIKE DISCHARGE PORT - A coating solution for an application method in which a coating solution is discharged through a slit discharge port includes an organic compound that is a solid at 20° C., a first solvent having a boiling point of lower than 170° C. and a second solvent having a boiling point of 170° C. or higher. | 09-30-2010 |
20120024383 | METHOD FOR COATING AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT - A method for coating a body with a coating liquid, the body being arranged above a nozzle through which the coating liquid is to be discharged upwardly, the coating method comprising:
| 02-02-2012 |
20120268006 | METHOD FOR PRODUCING ORGANIC EL ELEMENT - In a step of forming one or a plurality of organic layers, an object to be coated to become an organic EL element is arranged such that a surface to form the organic layer faces down, while a nozzle having a plurality of slit-shaped outlets for discharging thereabove a coating liquid containing a material to become the organic layer and downwardly depressed cutouts respectively formed at both end parts of each of the slit-shaped outlets is arranged under the object. A coating step of moving the nozzle and the object relative to each other in a predetermined coating direction while keeping the coating liquid discharged from the nozzle in contact with the object and a non-coating step of moving the nozzle and the object relative to each other in the coating direction while keeping the coating liquid away from the object are alternately repeated. | 10-25-2012 |
20130052905 | METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE - The present invention provides a manufacturing method of a light-emitting device including the steps of bringing a nozzle | 02-28-2013 |
Patent application number | Description | Published |
20120165501 | PROCESS FOR PRODUCING POLYARYLENE SULFIDE - Provided is a production process by which polyarylene sulfide can be obtained at a low temperature and in a short time, which production process is a process for producing polyarylene sulfide, comprising heating a cyclic polyarylene sulfide in the presence of a zero-valent transition metal compound. Examples of zero-valent transition metal compounds include complexes comprising, as metal species, nickel, palladium, platinum, silver, ruthenium, rhodium, copper, silver, and gold, and heating is preferably carried out in the presence of 0.001 to 20 mol % of the zero-valent transition metal compound based on sulfur atoms in the cyclic polyarylene sulfide. | 06-28-2012 |
20140288263 | POLYARYLENE SULFIDE - A polyarylene sulfide includes 0.01 to 5 mol %, per mol of arylene sulfide structural units, of a function group selected from the group consisting of an amino group, a carboxyl group, a hydroxyl group, an acid anhydride group, an isocyanate group, an epoxy group, a silanol group, and an alkoxysilane group having a dispersity represented by (weight average molecular weight)/(number average molecular weight) of 2.5 or less and a weight loss ratio at 100° C. to 330° C. of 0.2% by weight or less when the polyarylene sulfide is subjected to thermogravimetric analysis from 50° C. to 340° C. at a temperature ramp-up rate of 20° C./min under a non-oxidative atmosphere of normal pressure. | 09-25-2014 |
20150057429 | PRODUCTION METHOD OF POLYARYLENE SULFIDE, CYCLIC POLYARYLENE SULFIDE PELLET AND PRODUCTION METHOD THEREOF - A production method includes a process (I) of heating a cyclic polyarylene sulfide composition under reduced pressure and a process (II) of heating and polymerizing a cyclic polyarylene sulfide composition. This simple method allows for production of a polyarylene sulfide of the higher molecular weight and can produce a polyarylene sulfide having a narrow molecular weight distribution, low gas generation and high industrial usability. Additionally, pelletization after the process (I) can produce a cyclic polyarylene sulfide pellet having ease of conveyance, excellent molding processability, less gas generation amount and high industrial usability. | 02-26-2015 |
Patent application number | Description | Published |
20130225771 | METHOD FOR PRODUCING POLYARYLENE SULFIDE, AND POLYARYLENE SULFIDE - A reactive functional group-containing polyarylene sulfide being narrow in dispersity and little in gas generation amount is produced by heating a cyclic polyarylene sulfide composition in the presence of 0.1 mol % to 25 mol %, per mol of arylene sulfide structural units, of a sulfide compound having a reactive functional group selected from among an amino group, a carboxyl group, a hydroxyl group, an acid anhydride group, an isocyanate group, an epoxy group, a silanol group, and an alkoxysilane group. | 08-29-2013 |
20150126668 | POLYARYLENE SULFIDE RESIN COMPOSITION, MANUFACTURING METHOD OF RESIN COMPOSITION AND MOLDED PRODUCT OF RESIN COMPOSITION - A reactive functional group-containing polyarylene sulfide resin composition having a narrow polydispersity and a low gas generation amount is manufactured by mixing a polyarylene sulfide resin (a) and a polyarylene sulfide resin (b), wherein the polyarylene sulfide (a) has a weight reduction ratio ΔWr of not higher than 0.18% under heating and an increase rate of melt viscosity of less than 1.05 times by addition of a reactive compound (c) having a reactive group relative to melt viscosity prior to addition of the reactive compound (c), and the polyarylene sulfide (b) has the weight reduction ratio ΔWr of not higher than 0.18% under heating and the increase rate of melt viscosity of not less than 1.05 times by addition of the reactive compound (c) having the reactive group relative to melt viscosity prior to addition of the reactive compound (c). | 05-07-2015 |
Patent application number | Description | Published |
20120328993 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN - A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition. | 12-27-2012 |
20130115554 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R | 05-09-2013 |
20140178821 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R | 06-26-2014 |
20140186769 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOLECULAR WEIGHT COMPOUND - A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, and the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1); a method for forming a resist pattern using the resist composition; and a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), are disclosed. | 07-03-2014 |
20140220492 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN - A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R | 08-07-2014 |
20140221673 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R | 08-07-2014 |
20140356787 | RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN - A resist composition comprising a compound (m0) (wherein Rb | 12-04-2014 |
20140357896 | SULFONIUM SALT AND PHOTO-ACID GENERATOR - Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. | 12-04-2014 |