Patent application number | Description | Published |
20140273504 | SELECTIVE DEPOSITION BY LIGHT EXPOSURE - A substrate processing chamber comprising a chamber wall enclosing a process zone having an exhaust port, a substrate support to support a substrate in the process zone, a gas distributor for providing a deposition gas to the process zone, a solid state light source capable of irradiating substantially the entire surface of the substrate with light, and a gas energizer for energizing the deposition gas. | 09-18-2014 |
20150070686 | TEST APPARATUS FOR REFLECTIVE CAVITY CHARACTERIZATION - An apparatus for reflectivity measurement is provided. The apparatus generally measures reflectivity characteristics of a reflective surface, such as a reflective cavity of a light array. The apparatus generally comprises a body defining a volume and a light emitting element disposed outside the volume. A sensor coupled to the body detects light reflected from a reflective surface. Various embodiments provide positioning of the apparatus relative to a light array having a reflective cavity. | 03-12-2015 |
20150096683 | LED BASED OPTICAL SOURCE COUPLED WITH PLASMA SOURCE - An apparatus configured to remove metal etch byproducts from the surface of substrates and from the interior of a substrate processing chamber. A plasma is used in combination with a solid state light source, such as an LED, to desorb metal etch byproducts. The desorbed byproducts may then be removed from the chamber. | 04-09-2015 |
20150099369 | PROCESS FOR ETCHING METAL USING A COMBINATION OF PLASMA AND SOLID STATE SOURCES - An apparatus configured to remove metal etch byproducts from the surface of substrates and from the interior of a substrate processing chamber. A plasma is used in combination with a solid state light source, such as an LED, to desorb metal etch byproducts. The desorbed byproducts may then be removed from the chamber. | 04-09-2015 |
20150103526 | LINEAR HIGH PACKING DENSITY FOR LED ARRAYS - Apparatus for providing energy to a process chamber are provided herein. In one embodiment, the apparatus include a supporting substrate, a first plurality of solid state light sources disposed on a first surface of the supporting substrate, and a second plurality of solid state light sources disposed on the top surface of the supporting substrate, wherein the first and second plurality of solid state light sources are aligned and electrically isolated from each other, and the first plurality of solid state light sources is in physical contact with the second plurality of solid state light sources. | 04-16-2015 |
20160131352 | APPARATUS AND METHOD FOR SOLID STATE SOURCE ARRAY DESIGN AND FABRICATION - Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include a base having a plurality of vias formed in a bottom surface of the base, and wherein an electrical connector is disposed in each via, a first metallic layer disposed on a top surface of the base and electrically coupled to the electrical connectors disposed in the plurality of via, and a plurality of solid state light sources disposed on a top surface of the metallic layer and electrically coupled to the metallic layer. | 05-12-2016 |