Johannes Käppeler
Johannes Käppeler, Würselen DE
Patent application number | Description | Published |
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20090183682 | SOURCE CONTAINER OF A VPE REACTOR - The invention relates to a source arrangement of a VPE deposition device, comprising a container ( | 07-23-2009 |
20100170435 | DEVICE FOR THE TEMPERATURE CONTROL OF THE SURFACE TEMPERATURES OF SUBSTRATES IN A CVD REACTOR - The invention relates to a CVD reactor having a plurality of rotary tables ( | 07-08-2010 |
20100273320 | DEVICE AND METHOD FOR SELECTIVELY DEPOSITING CRYSTALLINE LAYERS USING MOCVD OR HVPE - The invention relates to a device for depositing one or more layers, in particular crystalline layers, on one or more substrates, in particular crystalline substrates ( | 10-28-2010 |
Johannes Käppeler, Wurselen DE
Patent application number | Description | Published |
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20100003405 | METHOD FOR DEPOSITING LAYERS IN A CVD REACTOR AND GAS INLET ELEMENT FOR A CVD REACTOR - The invention relates to a method for coating one or more substrates with a layer the components of which are passed into a process chamber ( | 01-07-2010 |
20100162957 | DEVICE FOR COATING A PLURALITY OF CLOSEST PACKED SUBSTRATES ARRANGED ON A SUSCEPTOR - The invention relates to a device for coating a plurality of substrates ( | 07-01-2010 |
20120204796 | CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones - The invention relates to a CVD reactor having a process chamber ( | 08-16-2012 |
20130040054 | COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A SHIELDING PLATE - A device for treating a substrate ( | 02-14-2013 |
20130045548 | Apparatus and method for simultaneous deposition of a plurality of semiconductor layers in a plurality of process chambers - A method for depositing a semiconductor layer on a multiplicity of substrates. The process chamber height (H), which is defined by the spacing between a process chamber ceiling ( | 02-21-2013 |