Patent application number | Description | Published |
20100214548 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction. | 08-26-2010 |
20100257731 | Device Suitable for Placing a Component on a Substrate, as well as Such a Method - A device suitable for placing a component on a substrate is provided with a component feeding device, a component pick-and-place device comprising a nozzle, a substrate carrier, means for moving the component pick-and-place device from the component feeding device to the substrate carrier and vice versa, as well as a global measuring system for determining the position of the component pick-and-place device during movement of the component pick-and-place device from the component feeding device to the substrate carrier and vice versa. The device is further provided with a local measuring system, remote from the global measuring system, for almost continually determining, in the proximity of a desired position of the component on the substrate, the position of the component pick-and-place device with respect to the substrate, which local measuring system is located closer to the substrate carrier than the global measuring system. | 10-14-2010 |
20110299054 | DISPLACEMENT DEVICE, LITHOGRAPHIC APPARATUS AND POSITIONING METHOD - A displacement device with a first and second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: at least three first coil block units having current conductors oriented parallel to a second direction, at least two second coil block units having current conductors oriented parallel to a first direction, wherein the displacement device includes a controller configured to control the position of the second part relative to the first part, and wherein when the second part mainly moves in the second direction the controller is configured to levitate the second part from the first part in the third direction by using first coil block units only. | 12-08-2011 |
20130097835 | METHOD FOR PLACING A COMPONENT ON A SUBSTRATE - A method is provided for placing a component on a substrate. The method uses a component feeding device and a component pick-and-place device to place a component on a substrate. | 04-25-2013 |
20130117989 | Component placement device comprising a machine frame and at least two component pickup units, as well as a method for driving such a component placement device - A component placement device comprises a machine frame and at least two component pickup units which are movable relative to at least one subframe supported by a machine frame. Each component pickup unit is movable at least in a direction of movement. The component placement device comprises means for determining the magnitude of a counterforce to be exerted on the subframe substantially in the direction of movement, as well as at least one drive unit for exerting the counterforce determined by said means substantially in the direction of movement on the subframe for the purpose of at least partially counteracting the reactive force exerted on the subframe by at least one component pickup unit during movement of the component pickup unit in the direction of movement relative to the subframe. | 05-16-2013 |
20150077728 | SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized. | 03-19-2015 |
20150212435 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An electromagnetic actuator includes a coil assembly including a coil; a magnet assembly including a first and a second magnet unit, each magnet unit including a magnetic yoke and a plurality of permanent magnets mounted to the magnetic yoke, the first and second magnet unit forming a magnetic circuit for receiving the coil assembly and, upon energizing the coil, generating a force in a first direction; and a holder for holding the magnet units, wherein a weight ratio of the magnet assembly over the coil assembly is smaller than the weight ratio of the magnet assembly over the coil assembly when the ratio of force over electrical power is maximized. | 07-30-2015 |