Patent application number | Description | Published |
20080277584 | Method for Changing Energy of Electron Beam in Electron Column - The present invention relates to a method of effectively changing the energy of an electron beam in an electron column for generating an electron beam. This includes the step of additionally applying voltage to an electrode such that the electron beam finally has the desired energy so as to freely control the energy when the electron beam reaches a sample. | 11-13-2008 |
20090014650 | DETECTOR FOR ELECTRON COLUMN AND METHOD FOR DETECTING ELECTRONS FOR ELECTRON COLUMN - In a conventional micro-channel plate (MCP), a secondary electron (SE) detector or a semi-conductor detector the number of the electrons is amplified through its own structure. For such amplification a small voltage difference is applied externally or generated due to its own structure and material. The electric current of electrons undergoing the above-described procedure is amplified by an external amplification circuit. In the present invention electrons—resulting from the collision of the electron beam generated by a microcolumn—are detected by surrounding conductive wiring. The detected electrons are amplified using an amplification circuit on the outside similar to a conventional detection method. | 01-15-2009 |
20090152461 | Hole Inspection Apparatus and Hole Inspection Method using the Same - Disclosed herein is an apparatus and method for inspecting the via holes of a semiconductor device using electron beams. The apparatus includes electron beam irradiation means, a current measuring means, and a current measuring means and data processing means. The electron beam irradiation means radiate respective electron beams to inspect a plurality of inspection target holes. The current measuring means measures current, which is generated by irradiating the electron beams, radiated from the electron beam irradiation means, through a conductive layer located under the holes, or through the conductive layer and a separate detector. The data processing means processes data acquired through the measurement of the current measuring means. | 06-18-2009 |
20100084566 | Electron Column Using A Magnetic Lens Layer Having Permanent Magnets - Disclosed herein is an electron column using a magnetic lens layer. The electron column includes a magnetic lens layer for condensing an electron beam using permanent magnets. The magnetic lens layer includes a support plate, an aperture formed through the support plate, and permanent magnets arranged around the aperture and disposed on or inserted into the support plate. | 04-08-2010 |
20100148086 | MAGNETIC DEFLECTOR FOR AN ELECTRON COLUMN - The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector ( | 06-17-2010 |
20100148656 | ELECTRON COLUMN USING CNT-TIP AND METHOD FOR ALIGNMENT OF CNT-TIP - The present invention relates to an electron column using an electron emission source, to which one or more carbon nanotubes (CNTs) are attached, in an electron column structure including an electron emission source and lenses. More particularly, the present invention relates to a method of easily aligning a carbon nanotube (CNT) tip, and an electron column capable of using the method. | 06-17-2010 |
20100200766 | ELECTRON EMITTER HAVING NANO-STRUCTURE TIP AND ELECTRON COLUMN USING THE SAME - The present invention relates to an electron emitter having a nanostructure tip and an electron column using the same, and, more particularly, to an electron emitter which includes a nanostructure tip which can easily emit electrons, composed of carbon nanotube (CNT), zinc oxide nanotube (ZnO nanotube), zinc oxide nanorod, zinc oxide nanopillar, zinc oxide nanowire, zinc oxide nanoparticle or the like, and an electron column using the same. | 08-12-2010 |
20110079731 | MULTIPOLE LENS FOR ELECTRON COLUMN - The present invention relates to an electron lens for use in an microcolumn, and more particularly to a multipole electron lens wherein the electron lens includes two or more electrode layers, each of the electrode layers has a slit aperture extending across a central optical axis along which an electron beam passes, and the two electrode layers are aligned on an electron optical axis such that the slit apertures are staggered with each other. Further, the present invention relates to a microcolumn using the multipole lens. The multipole lens according to the present invention can be manufactured and controlled in a simple fashion, reduces the defocusing of the microcolumn, and increases an active deflection area. | 04-07-2011 |
20140239190 | MICRO-COLUMN WITH DOUBLE ALIGNER - Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam. | 08-28-2014 |