Patent application number | Description | Published |
20080198438 | Optical Element - An optical element comprises a fluid chamber, the fluid chamber having side and end walls, and contains a first fluid ( | 08-21-2008 |
20080198473 | Variable Focus Lens - The invention relates to variable focus lenses based on magneto wetting and related devices, wherein two fluids, one of which is magnetically susceptible, are in contact over a meniscus. The shape of the meniscus is controlled by means of an applied magnetic field gradient. The contact angle between the chamber wall and the meniscus is a conserved. Implementation of special shaping to the internal or external walls of the chamber, while conserving the contact angle, results in better lens shape in the variable focus lens and lower levels of lens distortion. | 08-21-2008 |
20080218726 | Lithographic apparatus and device manufacturing method - Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space. | 09-11-2008 |
20080252960 | Optical Element - An optical element comprises a fluid chamber and a device for providing a magnetic field over at least a portion of the fluid chamber The fluid chamber has side portions and end portions, and contains a first fluid and a second fluid. The fluids are non-miscible and the second fluid is capable of being influenced by a magnetic field. The end portions of the fluid chamber are connected together only by the side portions. | 10-16-2008 |
20080278696 | Lithographic apparatus - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant. | 11-13-2008 |
20090002652 | Lithographic apparatus and device manufacturing method - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 01-01-2009 |
20090174115 | IMPRINT LITHOGRAPHY - An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state. | 07-09-2009 |
20090205488 | CYCLONIC LIQUID DEGASSING SEPARATOR AND METHOD FOR DEGASSING A FLUID MIXTURE - A method and cyclonic separator are disclosed for degassing a fluid mixture comprising a carrier liquid and gaseous and/or vaporizable components, wherein: the fluid mixture is accelerated in a throat section ( | 08-20-2009 |
20100071848 | NON-LEACHING ADHESIVE SYSTEM AND ITS USE IN A LIQUID IMMERSION OBJECTIVE - A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymerizable groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed. | 03-25-2010 |
20100084565 | IMPRINT LITHOGRAPHY - An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal. | 04-08-2010 |
20100139862 | IMPRINT LITHOGRAPHY - A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium. | 06-10-2010 |
20100182576 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate. | 07-22-2010 |
20110001942 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. | 01-06-2011 |
20110007285 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 01-13-2011 |
20110090473 | LITHOGRAPHIC APPARATUS - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant. | 04-21-2011 |
20110116061 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus. | 05-19-2011 |
20110157570 | LITHOGRAPHIC APPARATUS - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant. | 06-30-2011 |
20110167869 | PROCESS AND APPARATUS FOR REMOVING GASEOUS CONTAMINANTS FROM GAS STREAM COMPRISING GASEOUS CONTAMINANTS - A transformer has a toroidal core with an opening therein and a plurality of wires to define a central winding section, a plurality of outer twisted wire sections and a plurality of wire proximity sections positioned between each outer twisted wire section and the central winding section. The central winding section includes a plurality of wires wrapped around the toroidal core and coupling a conductor of a primary side of a transformer and a conductor of a secondary side of a transformer. Each outer twisted wire section includes at least a pair of wires twisted together in a predetermined twisted pattern that are electrically connected to but spaced from the central winding section. The wire proximity section is configured to maintain physical proximity between the conductor of the primary side of the transformer and the conductor of the secondary side of the transformer. | 07-14-2011 |
20110170077 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. | 07-14-2011 |
20110228241 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 09-22-2011 |
20110279800 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 11-17-2011 |
20110285977 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 11-24-2011 |
20120006055 | PROCESS AND APPARATUS FOR SEPARATING A GASEOUS PRODUCT FROM A FEED STREAM COMPRISING CONTAMINANTS - A process and apparatus for separating at least part of a gaseous product from a feed stream which comprises contaminants. The process comprises:
| 01-12-2012 |
20120013867 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus. | 01-19-2012 |
20120013869 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant. | 01-19-2012 |
20120257178 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant. | 10-11-2012 |
20120274911 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 11-01-2012 |
20130301017 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 11-14-2013 |
20140245889 | SYSTEM AND METHOD FOR REMOVING CONTAMINANTS FROM A CONTAMINATED GAS STREAM - A system for removing contaminants from a contaminated gas stream using a liquid absorbent, the system having a first and a second separation unit. The first separation unit includes a first separator having an inlet for a contaminated gas stream to be separated, a first outlet for separated gas and a second outlet for separated liquid absorbent; a rising conduit for transporting the contaminated gas stream to the inlet of the first separator; a conduit for removing the separated gas at the first outlet of the first separator; and a conduit for removing separated liquid absorbent at the second outlet of the first separator. The second separation unit includes a second separator having an inlet for a stream to be separated, a first outlet for separated gas and a second outlet for separated liquid absorbent; a rising conduit for transporting a contaminated stream to the inlet of the second separator; a conduit for removing separated gas at the first outlet of the second separator; and a descending conduit for removing separated liquid absorbent at the second outlet of the second separator. The descending conduit of the second separation unit is fluidly connected to the rising conduit of the first separation unit and the height of the descending conduit of the second separation unit is selected such that during use the hydrostatic force in the descending conduit of the second separation unit can induce the liquid absorbent in the rising conduit of the first separation unit to flow to the inlet of the first separator. | 09-04-2014 |
20140253890 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus. | 09-11-2014 |
20140368799 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate. | 12-18-2014 |
20140375972 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant. | 12-25-2014 |