Patent application number | Description | Published |
20100250223 | SEMICONDUCTOR CIRCUIT DETERIORATION SIMULATION METHOD AND COMPUTER PROGRAM MEDIUM - A semiconductor circuit deterioration simulation method for a circuit including MOSFETs includes inserting a dynamic voltage source associated with a fluctuation in voltage/current characteristics into each gate terminal of a plurality of MOSFETs in series, calculating dynamic deterioration amounts of the plurality of MOSFETs by performing circuit simulation and calculating a dynamic deterioration amount, and repeating the above processing to perform the circuit deterioration simulation over the long term. | 09-30-2010 |
20120026779 | NONVOLATILE MEMORIES AND RECONFIGURABLE CIRCUITS - A nonvolatile memory according to an embodiment includes at least one memory cell including: a variable resistance memory comprising one end connected to a first terminal, and the other end connected to a second terminal, a drive voltage being applied to the first terminal; and a diode comprising a cathode connected to the second terminal, and an anode connected to a third terminal, a ground potential being applied to the third terminal. An output of the memory cell is output from the second terminal, the output of the memory cell depends on a resistance state of the variable resistance memory. | 02-02-2012 |
20120061731 | NONVOLATILE PROGRAMMABLE LOGIC SWITCHES AND SEMICONDUCTOR INTEGRATED CIRCUIT - A nonvolatile programmable logic switch according to an embodiment includes: a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type; a memory cell transistor including a first insulating film formed on the first semiconductor region, a charge storage film formed on the first insulating film, a second insulating film formed on the charge storage film, and a control gate formed on the second insulating film; a pass transistor including a third insulating film formed on the second semiconductor region, and a gate electrode formed on the third insulating film and electrically connected to the first drain region; a first electrode applying a substrate bias to the first semiconductor region, the first electrode being formed in the first semiconductor region; and a second electrode applying a substrate bias to the second semiconductor region, the second electrode being formed in the second semiconductor region. | 03-15-2012 |
20120080739 | NONVOLATILE PROGRAMMABLE LOGIC SWITCH - A nonvolatile programmable logic switch according to an embodiment includes: a memory cell transistor including: a first source region and a first drain region of a second conductivity type formed at a distance from each other in a first semiconductor region of a first conductivity type; a first insulating film, a charge storage film, a second insulating film, and a control gate stacked in this order and formed on the first semiconductor region between the first source region and the first drain region; a pass transistor including: a second source region and a second drain region of a second conductivity type formed at a distance from each other in a second semiconductor region of the first conductivity type; a third insulating film, a gate electrode stacked in this order and formed on the second semiconductor region between the second source region and the second drain region, the gate electrode being electrically connected to the first drain region; and an electrode for applying a substrate bias to the first and second semiconductor regions. | 04-05-2012 |
20120139030 | NONVOLATILE SEMICONDUCTOR MEMORY - According to one embodiment, a nonvolatile semiconductor memory includes first to n-th (n is a natural number not less than 2) semiconductor layers in a first direction and extend in a second direction, and the semiconductor layers having a stair case pattern in a first end of the second direction, a common semiconductor layer connected to the first to n-th semiconductor layers commonly in the first end of the second direction, first to n-th layer select transistors which are provided in order from the first electrode side between the first electrode and the first to n-th memory strings, and first to n-th impurity regions which make the i-th layer select transistor (i is one of 1 to n) a normally-on state in the first end of the second direction of the i-th semiconductor layer. | 06-07-2012 |
20130307054 | SEMICONDUCTOR INTEGRATED CIRCUIT - One embodiment provides a semiconductor integrated circuit, including: a substrate; a plurality of nonvolatile memory portions formed in the substrate, each including a first nonvolatile memory and a second nonvolatile memory; and a plurality of logic transistor portions formed in the substrate, each including at least one of logic transistor, wherein the logic transistors include: a first transistor which is directly connected to drains of the first and second nonvolatile memories at its gate; and a second transistor which is not directly connected to the drains of the first and second nonvolatile memories, and wherein a bottom surface of the gate of each of the logic transistors sandwiching the first and second nonvolatile memories is lower in height from a top surface of the substrate than a bottom surface of the control gate of each of the first and second nonvolatile memories. | 11-21-2013 |