Patent application number | Description | Published |
20140264621 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SAME - A semiconductor structure and a manufacturing method for the same are provided. The method comprises following steps. A first gate structure is formed on a substrate in a first region. A protecting layer is formed covering the first gate structure. A second gate structure is formed on the substrate in second region exposed by the protecting layer and adjacent to the first region. | 09-18-2014 |
20150091076 | ISOLATION FORMATION FIRST PROCESS SIMPLIFICATION - A method for manufacturing a memory device includes providing a substrate having a plurality of active layers, forming a plurality of holes through the plurality of active layers including a first row of holes and a second row of holes, and filling the plurality of holes with an isolation material. The method includes etching the plurality of active layers to form first and second sets of interdigitated stacks of active strips, where the first set includes strips extending from pads in a first stack of pads and terminating at isolation strips remaining from corresponding filled holes in the first row, and the second set includes strips extending from pads in a second stack of pads and terminating at isolation strips remaining from corresponding filled holes in the second row. | 04-02-2015 |
20150117101 | SPLIT PAGE 3D MEMORY ARRAY - A semiconductor device includes active strips. Active strip stack selection structures electrically couple to the active strip stacks at positions between the first and second ends, and select particular ones of the active strip stacks for operations. In one embodiment, different pads coupled to opposite pads have a higher voltage, depending on the memory cell selected for read. The same active strip stack selection structure can act as a pair of side gates for opposite sides of a first active strip stack, and as one side gate for each of the adjacent active strip stacks. Each active strip stack can have: a first structure from a first set acting as first and second side gates on a first side of word lines; and a second structure and a third structure from a second set respectively acting as third and fourth side gates on the second side of word lines. | 04-30-2015 |
20150187694 | SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME - A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes a substrate, a stacked structure, a dielectric layer, a conductive structure, a dielectric structure and a conductive plug. The stacked structure includes dielectric films and conductive films arranged alternately. The dielectric layer is between the conductive structure and a sidewall of the stacked structure. The dielectric structure is on the stacked structure and defining a through via. The conductive plug fills the through via and physically contacts one of the conductive films exposed by the through via and adjoined with the dielectric layer. | 07-02-2015 |
20150194481 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD OF THE SAME - A semiconductor structure and a manufacturing method of the same are provided. The semiconductor structure includes a substrate, a stacked strip structure, and a tensile material strip. The stacked strip structure is formed vertically on the substrate, the stacked strip structure having compressive stress. The stacked strip structure comprises a plurality of conductive strips and a plurality of insulating strips, and the conductive strips and the insulating strips are interlaced. The tensile material strip is formed on the stacked strip structure, the tensile material strip having tensile stress. | 07-09-2015 |