Patent application number | Description | Published |
20090133169 | Independently-addressable, self-correcting inking for cantilever arrays - An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays. | 05-21-2009 |
20100071098 | SCANNING PROBE EPITAXY - A dual tip probe for scanning probe epitaxy is disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The dual tip probe further includes a rib disposed on the cantilever arm between the first and second tips. The dual tip probe can also include a strain gauge disposed along the length of the cantilever arm. | 03-18-2010 |
20100115672 | SCANNING PROBE EPITAXY - A dual tip probe for scanning probe epitaxy and a method of forming the dual tip probe are disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The first tip can remain in contact with a substrate during writing and provide in situ characterization of the substrate and or structures written, while the second tip can perform in non-contact mode to write and synthesis nanostructures. This feature can allow the dual tip probe to detect errors in a printed pattern using the first tip and correct the errors using the second tip. | 05-06-2010 |
20110165341 | BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY - In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1 μm. | 07-07-2011 |