Finken
Dennis D. Finken, Albany, MN US
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20090108110 | DEVICE AND METHOD FOR IMPROVING GRINDING EFFICACY IN GRAVITY-FED GRINDING MACHINES - The present invention regulates the delivery of feedstock to the fragmentation zone in a gravity-fed comminuting machine and reduces the ejection of feed materials by means of a rotating cylinder located at an offset position above the rotor. Rotationally mounted on an axis parallel to and above, but offset from, the axis of the rotor, this cylinder serves primarily as a striking surface, or anvil. The continual rotation of the anvil, in the opposite rotational direction as the rotor and with much slower rotational speed, assists in agitating the feed material, alleviating the problems of feed chute obstructions and feed aggregation. The cylinder forces the feed materials into contact with the rotor teeth through continuous rotation and provides a novel tooth design to improve efficacy and reduce wear. | 04-30-2009 |
Gerald Finken, Woodbury, MN US
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20160041089 | SYSTEMS AND METHODS UTILIZING LONG WAVELENGTH ELECTROMAGNETIC RADIATION FOR FEATURE DEFINITION - Methods that include directing an incident beam towards a substrate, the substrate having one or more features formed thereon wherein the incident beam has a wavelength from about 10 μm to about 10 mm, and the incident beam interacts with the substrate to form a modulated beam; varying one or more characteristics of the incident beam while directed towards the substrate; detecting the modulated beam while varying the one or more characteristics of the incident beam to collect a spectrum; and determining at least one spatial metric of the at least one feature based on the collected spectrum. | 02-11-2016 |
Gerald Finken, Fargo, ND US
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20140237950 | SYSTEM AND METHOD FOR LABELING TRIAL STUDY MATERIALS - The present disclosure relates to methods and systems for labeling trial study materials. The method, in some embodiments comprises the steps of providing bulk supplies to one or more study supply depots, receiving one or more requests for at least one study test kit at the one or more study supply depots, packaging the bulk supplies into one or more study test kit components, printing at least two different study supply label types on a single label sheet, affixing the at least two different study supply label types to the study test kit components, packaging the study test kit components into at least one study test kit; and shipping the at least one study test kit to a trial site. | 08-28-2014 |
20140238214 | LABEL DEVICE - A label device may include an inlet system, an outlet system, and a label creation area arranged between the inlet system and the outlet system, including a platform and a cutter assembly arranged above the platform and configured to move through a programmed route to physically delineate a label on label material backed by the platform. | 08-28-2014 |
Gerald Arthur Finken, Woodbury, MN US
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20080212057 | Substrate comprising a mark - A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height. | 09-04-2008 |
Gerald E. Finken, Fargo, ND US
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20160125171 | SYSTEMS AND METHODS FOR MANAGING CLINICAL TRIALS - Systems and methods for managing, analyzing, and evaluating clinical trials. Clinical trial data collection, management, review, and analysis may be performed independent of the clinical trial. A clinical trial manager may have a study review and management application and a clinical trial database. The study review and management application may have a protocol selecting engine, a data collection engine, and a data analysis engine. The data collection engine may have a communication routine and documentation routine for collecting data and documenting the data in the clinical trial database. The data analysis engine may have a categorization routine and analysis routine for categorizing and analyzing the data collected by the data collection engine. The clinical trial manager may be accessible via a user interface. | 05-05-2016 |
Holger Gerhard Clemens Finken, Pretoria ZA
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20080298534 | Nuclear Plant with a Pebble Bed Nuclear Reactor - This invention relates to a nuclear plant including a main power system and a fuel handling and storage system. The system is connected to a sphere inlet and a sphere outlet of a multi-pass high temperature gas cooled pebble bed reactor. The system is configured such that gas flows from the system into the reactor through both the sphere inlet and the sphere outlet thereby inhibiting the ingress of high temperature gas from the reactor into the system. Restricting indexers permit the movement of spheres between the reactor and the system and dampen out the transmission of pressure fluctuations from the power system to the system. | 12-04-2008 |
20120230458 | NUCLEAR PLANT WITH A PEBBLE BED NUCLEAR REACTOR - This invention relates to a nuclear plant including a main power system and a fuel handling and storage system. The system is connected to a sphere inlet and a sphere outlet of a multi-pass high temperature gas cooled pebble bed reactor. The system is configured such that gas flows from the system into the reactor through both the sphere inlet and the sphere outlet thereby inhibiting the ingress of high temperature gas from the reactor into the system. Restricting indexers permit the movement of spheres between the reactor and the system and dampen out the transmission of pressure fluctuations from the power system to the system. | 09-13-2012 |
Michael Finken, Dresden DE
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20080203487 | FIELD EFFECT TRANSISTOR HAVING AN INTERLAYER DIELECTRIC MATERIAL HAVING INCREASED INTRINSIC STRESS - By providing a highly stressed interlayer dielectric material, the performance of at least one type of transistor may be increased due to an enhanced strain-inducing mechanism. For instance, by providing a highly compressive silicon dioxide of approximately 400 Mega Pascal and more as an interlayer dielectric material, the drive current of the P-channel transistors may be increased by 2% and more while not unduly affecting the performance of the N-channel transistors. | 08-28-2008 |
20090001453 | METHOD OF FORMING A SEMICONDUCTOR STRUCTURE COMPRISING A FIELD EFFECT TRANSISTOR HAVING A STRESSED CHANNEL REGION - A method of forming a semiconductor structure comprises providing a semiconductor substrate comprising at least one transistor element. An etch stop layer is formed over the transistor element. A stressed first dielectric layer is formed over the etch stop layer. A protective layer adapted to reduce an intrusion of moisture into the first dielectric layer is formed over the first dielectric layer. At least one electrical connection to the transistor element is formed. At least a portion of the protective layer remains over the first dielectric layer after completion of the formation of the at least one electrical connection. | 01-01-2009 |
20090108335 | STRESS TRANSFER BY SEQUENTIALLY PROVIDING A HIGHLY STRESSED ETCH STOP MATERIAL AND AN INTERLAYER DIELECTRIC IN A CONTACT LAYER STACK OF A SEMICONDUCTOR DEVICE - By forming two or more individual dielectric layers of high intrinsic stress levels with intermediate interlayer dielectric material, the limitations of respective deposition techniques, such as plasma enhanced chemical vapor deposition, may be respected while nevertheless providing an increased amount of stressed material above a transistor element, even for highly scaled semiconductor devices. | 04-30-2009 |
20090166800 | INTERLAYER DIELECTRIC MATERIAL IN A SEMICONDUCTOR DEVICE COMPRISING A DOUBLET STRUCTURE OF STRESSED MATERIALS - By forming a buffer material above differently stressed contact etch stop layers followed by the deposition of a further stress-inducing material, enhanced overall device performance may be accomplished, wherein an undesired influence of the additional stress-inducing layer may be reduced in device regions, for instance, by removing the additional material or by performing a relaxation implantation process. Furthermore, process uniformity during a patterning sequence for forming contact openings may be enhanced by partially removing the additional stress-inducing layer at an area at which a contact opening is to be formed. | 07-02-2009 |
20090166814 | INTERLAYER DIELECTRIC MATERIAL IN A SEMICONDUCTOR DEVICE COMPRISING STRESSED LAYERS WITH AN INTERMEDIATE BUFFER MATERIAL - A highly stressed dielectric material, such as a tensile stressed material, may be deposited in a conformal manner so as to respect any deposition constraints caused by pronounced surface topography of highly scaled semiconductor devices, followed by the deposition of a buffer material having enhanced gap-filling capabilities. Thereafter, a further stress-inducing layer is deposited to form a doublet structure, which acts on the transistor elements, thereby enhancing overall performance, without increasing the probability of creating deposition-related irregularities. Hence, production yield as well as performance of highly scaled semiconductor devices may be increased. | 07-02-2009 |
20100276790 | INTERLAYER DIELECTRIC MATERIAL IN A SEMICONDUCTOR DEVICE COMPRISING STRESSED LAYERS WITH AN INTERMEDIATE BUFFER MATERIAL - A highly stressed dielectric material, such as a tensile stressed material, may be deposited in a conformal manner so as to respect any deposition constraints caused by pronounced surface topography of highly scaled semiconductor devices, followed by the deposition of a buffer material having enhanced gap-filling capabilities. Thereafter, a further stress-inducing layer is deposited to form a doublet structure, which acts on the transistor elements, thereby enhancing overall performance, without increasing the probability of creating deposition-related irregularities. Hence, production yield as well as performance of highly scaled semiconductor devices may be increased. | 11-04-2010 |
Stephen E. Finken, Overland Park, KS US
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20080205039 | Ornament with Image Projector - Some embodiments of a decoration apparatus may have an attractive appearance and multi-functional capabilities. The decoration apparatus may include one or more internal light sources that provide lighting effects in combination with decorative elements formed in the structure. In addition to providing internal lighting effects, the decoration apparatus may include a projector device, which is capable of displaying a light pattern on a remote surface, such as a wall or a ceiling. | 08-28-2008 |