Patent application number | Description | Published |
20090244506 | SLM Calibration - Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals. | 10-01-2009 |
20110233175 | PICK-AND-PLACE MACHINE - A pick-and-place machine, comprising: a pick station; a place station; a pick/place head for transporting a die from the pick station along a transport path to the place station; wherein the machine further comprises a die-face processing means, comprising an inspection unit and/or a cleaning unit, operable to process a face of the die on the transport path. | 09-29-2011 |
20120307222 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam. | 12-06-2012 |
20120307223 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion. | 12-06-2012 |
20120314194 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns. | 12-13-2012 |
20120320359 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a substrate table constructed to hold a substrate and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may include a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may be provided with an actuator to move the optical column or part thereof with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system. | 12-20-2012 |
20130004269 | System and Method for Picking and Placement of Chip Dies - According to an aspect of the invention, there is provided a chip die | 01-03-2013 |
20130043212 | CONTINUOUS PATTERNED LAYER DEPOSITION - A method of manufacturing a substrate with a patterned layer of deposited material, the patterned layer being deposited from a processing head, the method comprising
| 02-21-2013 |
20130242277 | METHOD OF CONTROLLING A PATTERNING DEVICE IN A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS - A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device. | 09-19-2013 |
20130250267 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate. | 09-26-2013 |
20140055764 | LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD - In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area. | 02-27-2014 |
20140347641 | DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD - A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation. | 11-27-2014 |