Patent application number | Description | Published |
20080210290 | Plasma inside vapor deposition apparatus and method for making multi-junction silicon thin film solar cell modules and panels - A plasma inside vapor deposition apparatus for making silicon thin film solar cell modules including means for supporting a substrate, the substrate having an outer surface and an inner surface; plasma torch means located proximal to the inner surface for depositing at least one thin film layer on the inner surface of the substrate, the plasma torch means located a distance from the substrate; and means for supplying reagent chemicals to the plasma torch means, wherein the at least one thin film layer form the silicon thin film solar cell modules. | 09-04-2008 |
20090209093 | PLASMA DEPOSITION APPARATUS AND METHOD FOR MAKING POLYCRYSTALLINE SILICON - A plasma deposition apparatus for making polycrystalline silicon including a chamber for depositing said polycrystalline silicon, the chamber having an exhaust system for recovering un-deposited gases; a support located within the deposition chamber for holding a target substrate having a deposition surface, the deposition surface defining a deposition zone; at least one induction coupled plasma torch located within the deposition chamber and spaced apart from the support, the at least one induction coupled plasma torch producing a plasma flame that is substantially perpendicular to the deposition surface, the plasma flame defining a reaction zone for reacting at least one precursor gas source to produce the polycrystalline silicon for depositing a layer of the polycrystalline silicon the deposition surface. | 08-20-2009 |
20100184251 | PLASMA INSIDE VAPOR DEPOSITION APPARATUS AND METHOD FOR MAKING MULTI-JUNCTION SILICON THIN FILM SOLAR CELL MODULES AND PANELS - A plasma inside vapor deposition apparatus for making silicon thin film solar cell modules including means for supporting a substrate, the substrate having an outer surface and an inner surface; plasma torch means located proximal to the inner surface for depositing at least one thin film layer on the inner surface of the substrate, the plasma torch means located a distance from the substrate; and means for supplying reagent chemicals to the plasma torch means, wherein the at least one thin film layer form the silicon thin film solar cell modules. | 07-22-2010 |
20100189926 | PLASMA DEPOSITION APPARATUS AND METHOD FOR MAKING HIGH PURITY SILICON - A plasma deposition apparatus for making high purity silicon, including a chamber for depositing said high purity silicon, the chamber including a top defining substantially an upper end of the chamber; one or more sides having an upper end and a lower end, the top substantially sealingly joining the upper end of the one or more sides; a base defining substantially a lower end of the chamber, the base substantially sealingly joining the lower end of the one or more sides; and at least one induction coupled plasma torch disposed in the top, the at least one induction coupled plasma torch oriented in a substantially vertical position producing a plasma flame downward from the top towards the base, the plasma flame defining a reaction zone for reacting one or more reactants to produce the high purity. | 07-29-2010 |
20110006398 | PROCESS, APPARATUS, AND MATERIAL FOR MAKING SILICON GERMANIUM CORE FIBER - A process and apparatus for making silicon or silicon/germanium core fiber is described, which uses a plasma process with reducing agent to make preform. The process also makes the recommendations in selecting the adequate cladding tube for better fiber properties. An improved fiber drawing apparatus is also disclosed in order to draw this new type of preforms. | 01-13-2011 |
20110232332 | RING PLASMA JET METHOD AND APPARATUS FOR MAKING AN OPTICAL FIBER PREFORM - A method and apparatus for making an optical fiber preform, including injecting a plasma gas source into the first end of a tubular member; generating a ring plasma flame with the plasma gas source flowing through a plasma gas feeder nozzle, the plasma gas feeder nozzle including: an inner tube, an outer tube, wherein the plasma gas source is injected between the inner tube and the outer tube to produce the ring plasma flame, such that at least a portion of the ring plasma flame is directed radially toward the inner surface of the tubular member; traversing the tubular member along the longitudinal axis relative to the plasma flame; depositing at least one soot layer on the interior surface of the tubular member by introducing reagent chemicals into the plasma flame; and fusing all of the soot layers into a glass material on the interior surface of the tubular member. | 09-29-2011 |
20110256251 | PROCESS, APPARATUS, AND MATERIAL FOR MAKING SILICON GERMANIUM CORE FIBER - A process and apparatus for making silicon or silicon/germanium core fiber is described, which uses a plasma process with reducing agent to make preform. The process also makes the recommendations in selecting the adequate cladding tube for better fiber properties. An improved fiber drawing apparatus is also disclosed in order to draw this new type of preforms. | 10-20-2011 |
20130022329 | Silicon Germanium Core Fiber - A process and apparatus for making silicon or silicon/germanium core fiber is described, which uses a plasma process with reducing agent to make a preform. The process also makes the recommendations in selecting the adequate cladding tube for better fiber properties. An improved fiber drawing apparatus is also disclosed in order to draw this new type of preform. | 01-24-2013 |