Patent application number | Description | Published |
20090262417 | 193nm Immersion Microscope - New and useful concepts are provided for the objective portion of a liquid or solid immersion microscope are provided, that uses 193 nm light for illumination and imaging of a sample, and includes a liquid or solid immersion lens configuration. The illumination and imaging can be provided, e.g. with (a) a liquid immersion lens with a final objective lens element that comprises a lutetium aluminum garnet (LuAg) lens element, a barium lithium fluoride (BaLiF) lens element, or a fused silica lens element, and a liquid immersion layer that has an index of refraction that is equal to or greater than the index of refraction of water at a wavelength of approximately 193 nm, or (b) a solid immersion lens with a final objective lens element that has an index of refraction greater than or equal to the index of refraction of fused silica at a wavelength of approximately 193 nm. | 10-22-2009 |
20100091257 | Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location - A catadioptric optical imaging system and method is provided, in which up to four (4) reticles are imaged to a single imaging location (e.g. for imaging substrates), in a manner designed to provide high throughput, with a relatively high resolution, and with substrates whose size may approach 450 mm. | 04-15-2010 |
20100149669 | Method and Apparatus for Combining EUV Sources - An apparatus and method is provided, for combining two or more EUV (extreme ultra violet) sources for illumination of a reticle. According to the principles of the present invention two or more EUV sources are combined in a single illumination system, using multiple first mirror arrays, each of which is associated with a respective EUV source, and a single second mirror array defining a pupil, and configured to receive reflected EUV radiation from the plurality of first mirror arrays, and to illuminate the reticle. Preferably, the first mirror array associated with each EUV source has a fly's eye configuration, the single second mirror array has a fly's eye configuration, and a condenser is positioned between the single second mirror array and the reticle. The number of mirror elements in the second mirror array is equal to or greater than the total number of mirror elements in the first mirror array. | 06-17-2010 |
20110299056 | System and Method Configured to Provide Predetermined Depth Of Focus and to Control Irradiance Distribution - A system and method for illuminating an imaging optical system are provided, designed to spread the irradiance distribution at a pupil located at a mirror, to decrease the maximum irradiance on the mirror in the pupil, while maintaining a predetermined depth of focus of the imaging optical system (i.e. a depth of focus that is predetermined to be acceptable for the particular imaging optical application). | 12-08-2011 |
20110299184 | High NA Annular Field Catoptric Projection Optics using Zernike Polynomial Mirror Surfaces - Optical structure and design concepts are provided, using a Y-Zernike polynomial, and by which optical components, optical components and optical structures, can be designed and produced, to image at extreme ultraviolet (EUV) wavelengths, at a relatively high NA (e.g. 0.35), with a relatively large field of view (e.g. 26×2 mm). Moreover, an optical structure produced according to the principles of the present invention has a small amount of asymmetry, which enables the components of the optical structure to be manufactured with current manufacturing techniques. | 12-08-2011 |
20130194563 | OPTICAL ASSEMBLY FOR LASER RADAR - A compact optical assembly for a laser radar system is provided, that is configured to move as a unit with a laser radar system as the laser radar system is pointed at a target and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the laser radar. The optical assembly comprises a light source, a lens, a scanning reflector and a fixed reflector that are oriented relative to each other such that: (i) a beam from the light source is reflected by the scanning reflector to the fixed reflector; (ii) reflected light from the fixed reflector is reflected again by the scanning reflector and directed along A line of sight through the lens; and (iii) the scanning reflector is moveable relative to the source, the lens and the fixed reflector, to adjust the focus of the beam along the line of sight. | 08-01-2013 |
20130241761 | BEAM STEERING FOR LASER RADAR AND OTHER USES - Optical systems suitable for use as or in laser radar systems and other uses include a beam-forming unit, a beam-scan unit, and a controller. The beam-forming unit includes a first optical element, and the beam-scan unit includes a second optical element. The first optical element is movable to shape and direct a substantially collimated optical beam along a nominal propagation axis to a target, and the second optical element includes at least one movable beam deflector that moves the optical beam in a scanning manner relative to the nominal propagation axis. The controller is coupled to the beam-forming unit and beam-scan unit, and is configured to induce movement of the first optical element required for shaping and directing the optical beam along the nominal propagation axis and to induce independent motion of the beam deflector of the second optical element as required to scan the optical beam relative to the nominal propagation axis. The beam deflector can be refractive or reflective. | 09-19-2013 |
20130241762 | LIGHT-BEAM SCANNING FOR LASER RADAR AND OTHER USES - A light beam is scanned, for use in laser radar and other uses, by an optical system of which an example includes a beam-shaping optical system that includes a first movable optical element and a second movable optical element. The first optical element forms and directs an optical beam along a nominal propagation axis from the beam-shaping optical system to a target, and the second optical element includes a respective actuator by which the second optical element is movable relative to the first optical element. A controller is coupled at least to the actuator of the second optical element and is configured to induce motion, by the actuator, of the second optical element to move the optical beam, as incident on the target, relative to the nominal propagation axis. | 09-19-2013 |
20130293900 | METHODS AND DEVICES FOR REDUCING ERRORS IN GOOS-HANCHEN CORRECTIONS OF DISPLACEMENT DATA - An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect. | 11-07-2013 |
20130308140 | METHOD FOR SPATIALLY MULTIPLEXING TWO OR MORE FRINGE PROJECTION SIGNALS ON A SINGLE DETECTOR - Fringe patterns at first and second spatial frequencies are projected onto a work piece surface and a reference surface, respectively. An image of the projected fringe patterns is obtained and a measurement signal associated with work piece displacements and a reference signal are obtained based on the first and second spatial frequencies. The image of the projected fringe patterns can exhibit substantial or complete overlap of the fringe patterns at the first and second spatial frequencies, and the overlapping patterns can be separated based on the spatial frequencies. Fringe pattern shifts at one or both of the first and second spatial frequencies can be used to adjust a pattern transfer system to permit accurate pattern transfer. | 11-21-2013 |
20140049761 | DESIGN RULES FOR REDUCING THE SENSITIVITY OF FRINGE PROJECTION AUTOFOCUS TO AIR TEMPERATURE CHANGES - Fringe projection autofocus systems are provided with variable pitch diffraction gratings or multiple diffraction gratings so that a reference beam and a measurement beam propagate along a common path. Alternatively, an input beam can be directed to a diffraction grating so that the selected diffraction orders propagate along a common path. In some examples, distinct spectral bands are used for reference and measurement beams. | 02-20-2014 |
20140063481 | COMPACT LASER RADAR CORNER CUBE - Focus assemblies for laser radar are situated to receive a measurement beam that is focused at or in the focus assemblies. In some examples, focus assemblies include a corner cube and a return reflector, and the measurement beam is focused on, at, or within the corner cube or return reflector. A polarizing beam splitter and a quarter wave plate can be situated so that an input measurement beam and an output measurement beam can be separated. | 03-06-2014 |
20140063491 | BORESIGHT ERROR MONITOR FOR LASER RADAR INTEGRATED OPTICAL ASSEMBLY - Boresight and other pointing errors are detected based on a monitor beam formed by diverting a portion of a probe beam. The monitor beam is directed to a position sensitive photodetector, and the optical power received at the position sensitive photodetector is used to estimate or correct such pointing errors. | 03-06-2014 |
20140211186 | FAST ILLUMINATION SIMULATOR BASED ON A CALIBRATED FLEXIBLE POINT- SPREAD FUNCTION - A way of predicting distribution of light in an illumination pupil, comprising:
| 07-31-2014 |
20150015896 | METHODS AND DEVICES FOR REDUCING ERRORS IN GOOS-HANCHEN CORRECTIONS OF DISPLACEMENT DATA - An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect. | 01-15-2015 |