Patent application number | Description | Published |
20090274977 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner. | 11-05-2009 |
20090280433 | RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN - A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent. | 11-12-2009 |
20090311622 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM - A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated. | 12-17-2009 |
20100087559 | Hydrogenated Block Copolymers and Crosslinking Compositions Containing the Same - A hydrogenated block copolymer obtained by selective hydrogenation of a block copolymer comprising at least two polymer blocks (A) which each comprise vinyl aromatic monomer units as the main component and may be the same or different from each other, at least two polymer blocks (B) which each comprise monomer units derived from a conjugated diene of 5 or more carbon atoms as the main component and may be the same or different from each other, and one or more polymer blocks (C) which each comprise monomer units derived from a conjugated diene of 4 or more carbon atoms as the main component and may be the same or different from each other and/or one or more random copolymer blocks (D) which each comprise monomer units (d-1) derived from a conjugated diene of 4 or more carbon atoms and vinyl aromatic monomer units (d-2) as the main components, wherein the degree of hydrogenation of olefinically unsaturated double bonds of the blocks (B) is 50% or below; the degrees of hydrogenation of olefinically unsaturated double bonds of the blocks (C) and (D) are 80% or above; the content of vinyl aromatic monomer units in the block copolymer is 10 to 85% by weight; the contents of A, B, C and D in the block copolymer are 10 to 70% by weight, 1 to 15% by weight, 0 to 85% by weight and 0 to 85% by weight respectively with the proviso that the sum of C and D is 25 to 85% by weight and the sum total of A, B, C and D is 100% by weight; and the weight-average molecular weight (M) of A satisfies the relationship: M≧20000/[l+{content (%) of (d-2)}/20]. | 04-08-2010 |
20100233635 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN - A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion. | 09-16-2010 |
20100331440 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER - A polymer includes a repeating unit shown by a general formula (1) in which R | 12-30-2010 |
20110003928 | THERMOPLASTIC ELASTOMER COMPOSITION AND METHOD FOR PRODUCING THE SAME - The present invention provides a thermoplastic elastomer composition obtained by dynamically crosslinking, under a melting condition, 100 parts by mass of a block copolymer (I), 1 to 1,000 parts by mass of a polar resin (II), 1 to 500 parts by mass of a modified polymer (III), and 0.01 to 50 parts by mass of a crosslinking agent (IV), wherein the block copolymer (I) comprises at least one polymer block (A) comprising as a main component an alkylene unit, and/or at least one copolymer block (B) comprising as main components an alkylene unit (b- | 01-06-2011 |
20110117489 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1). | 05-19-2011 |
20110275731 | CROSSLINKABLE AND FOAMABLE COMPOSITION, CROSSLINKED FOAM, AND SHOE MIDSOLE COMPRISING THE SAME - The present invention provides a crosslinked foam having an excellent balance of various physical properties in terms of lightness, flexibility, permanent compression set, tear strength, impact resilience, and molding stability; a shoe midsole; and a crosslinkable and foamable composition that provides the crosslinked foam and shoe midsole. A crosslinkable and foamable composition comprising (A) an ethylene-based copolymer; (B) a copolymer comprising a vinyl aromatic monomer unit and an unsaturated bond-containing a conjugated diene monomer unit; (C) an organic peroxide; and (D) a foaming agent; a mass ratio of the component (A) to the component (B), (NB), being from 97/3 to 50/50; and the component (B) comprising 5 mass % or more and 80 mass % or less of the vinyl aromatic monomer unit, and 5 mass % or more and 55 mass % or less of the conjugated diene monomer unit. | 11-10-2011 |
20120058429 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). | 03-08-2012 |
20120122036 | PATTERN FORMING METHOD - A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed. | 05-17-2012 |
20130108962 | RADIATION-SENSITIVE COMPOSITION | 05-02-2013 |