Patent application number | Description | Published |
20090119030 | FORCE FEEDBACK AND INTERACTIVE SYSTEM - A force feedback and interactive system is provided in the present invention, wherein the force feedback and interactive system utilizes a mechanism for detecting weight or center of gravity and reacted force from an operator on a multi-axis motion platform, and a main controller which is a kernel of data processing and motion simulating of the multi-axis motion platform. Besides having complete mathematical simulation model for calculating reaction force variation according to the received operating command, force status and weight of the operator and having algorithm for simulating the motion of multi-axis motion platform so as to calculate the motion and instantaneous position of the multi-axis motion platform in space, the system can also provide function of force feedback for enhancing the virtual reality while being applied in various Human-Machine Interaction simulating field. | 05-07-2009 |
20120273644 | ELECTRONIC DEVICE HOLDER - An electronic device holder is revealed. The electronic device holder includes a base, a top cover and a support member. In use, a control member of the support member is pressed so that a locking shaft is moved inwards to push a shaft part moving into a pivot hole of an assembly block of the base. And a teeth part around the shaft part is released from teeth of a locking hole. Thus the support member can be rotated to the required position. Without any force applied to the control member, the teeth part of the shaft part is engaged with the teeth of the locking hole again due to the elastic member. Thus the support member is locked, the support block is then rotated to the required position and an electronic device is leaning against the support member. Therefore users can use electronics conveniently, without holding them in hands. | 11-01-2012 |
20130295494 | METHOD FOR REPAIRING PHOTOMASK - A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask. | 11-07-2013 |
20140145752 | ANTI-DISASSEMBLING DEVICE FOR ELECTRONIC PRODUCTS - An anti-disassembling device for an electronic product includes a case, a linear movement device, a circular movement device and an optical encoder. At least one retractable transmission member is connected to the case. The circular movement device is located in the case and has an encoding disk, which has multiple slots defined therethrough and teeth are defined in the periphery thereof. The at least one retractable transmission member is engaged with the teeth to rotate the encoding disk. The optical encoder has a lighting module which emits light beams through the slots of the encoding disk and a photosensitive module receives the light beams and sends a signal to the storage unit of the electronic product. The retractable device rotates when the electronic product is disassembled. | 05-29-2014 |
20140186750 | Lithography Mask Repairing Process - A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography mask, a radiation source configured to generate a radiation on the lithography mask, and a process gas source configured to release a process gas onto the lithography mask. The process as reacts with a surface portion of the lithography mask to repair the lithography mask. With the radiation treatment, residue process gas on the lithography mask is removed. | 07-03-2014 |
20140255826 | Endpoint Detection for Photolithography Mask Repair - A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached. | 09-11-2014 |
20150146186 | Lithography Mask Repairing Process - A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography mask, a radiation source configured to generate a radiation on the lithography mask, and a process gas source configured to release a process gas onto the lithography mask. The process as reacts with a surface portion of the lithography mask to repair the lithography mask. With the radiation treatment, residue process gas on the lithography mask is removed. | 05-28-2015 |