Ching-Hai
Ching-Hai Hung, Yonghe City TW
Patent application number | Description | Published |
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20090313617 | Method for Updating Control Program of Physical Storage Device in Storage Virtualization System and Storage Virtualization Controller and System Thereof - Method for updating control program of physical storage devices including the steps of: selecting PSD(s) to be updated with the control program; making the PSD(s) in an off-line state; and updating the control program of the PSD(s), wherein if it needs to issue a write request to the selected PSD(s) before completion of updating the control program, unmodified data segment(s) corresponding to the write request is marked as modified data segment(s). the selected PSD(s) performs partial rebuilding after completion of updating the control program, and if it needs to read out from or write to an unmodified data segment of the selected PSD(s) before completion of the partial rebuilding, a R/W request can be issued to the PSD directly without waiting for completion of the partial rebuilding of the PSD. Multiple parity data chunks can also be provided in the same data stripe in another embodiment. | 12-17-2009 |
Ching-Hai Wang, Hsinchu TW
Patent application number | Description | Published |
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20090304440 | Aluminum window structure - The present invention is a kind of joint structure in the aluminum window, and in particular is designed for the awning typed aluminum window. It is mainly to design an internally laid joint plate with a simple structure to joint the window frames together directly. It is different from the prior art that needs to add an additional externally laid and large sized joint plate to joint the adjacent window frames. It is not only achieve the purposes of the large scaled material saving and also have the outside appearance of the whole aluminum window become more concise and not too disordered. | 12-10-2009 |
Ching-Hai Yang, Taipei City TW
Patent application number | Description | Published |
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20140078478 | METHOD OF OPTIMIZING LITHOGRAPHY TOOLS UTILIZATION - A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography cell and the second lithography cell. The first lithography cell includes a first track and a first exposing tool and a second lithography cell includes a second track and a second exposing tool. The interface station includes a first interface buffer configured to couple the first track, a second interface buffer configured to couple the second track, a conveyor configured to couple the first interface buffer and the second interface buffer, and a robot configure to move along the conveyor, where in the robot transfers a substrate between functions of multiple functions within the first lithography cell, the second lithography cell, or between the first lithography cell and the second lithography cell. | 03-20-2014 |