Patent application number | Description | Published |
20140167298 | ALIGNMENT APPARATUS, EXPOSING APPRATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE - Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate. | 06-19-2014 |
20140176847 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a display device includes: providing an outline frame on a first substrate; and providing a thin film by dropping a thin film material inside a boundary defined by the outline frame. The outline frame limits a boundary of the thin film, and the frame material of the outline frame includes a material having a surface energy that is less than a surface energy of the thin film material of the thin film. | 06-26-2014 |
20140186595 | METHOD OF FABRICATING DISPLAY DEVICE USING MASKLESS EXPOSURE APPARATUS AND DISPLAY DEVICE - The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region. | 07-03-2014 |
20140198290 | Display Device and a Method of Manufacturing the Same - The present invention relates to a display device and a method of manufacturing the display device. The display device according to an exemplary embodiment of the present invention includes a substrate. A pixel electrode is formed on the substrate. A roof layer is formed on the pixel electrode. A first micro-cavity and a second micro-cavity are disposed between the pixel electrode and the roof layer. A liquid crystal fills the first and second micro-cavities. The first and second micro-cavities are connected to each other by a path. The path penetrates the roof layer. | 07-17-2014 |
20140204392 | STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF - A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage. | 07-24-2014 |
20140211117 | THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE HAVING THE SAME - A thin film transistor substrate is provided. The thin film transistor substrate includes a display area including a plurality of pixels, wherein the pixels are connected to gate lines and data lines, a gate driver connected to the gate lines, a plurality of data pads connected to the data lines, a plurality of dummy pattern parts formed of a same layer as the gate lines, and a non-display area in which the gate driver, data pads, and dummy pattern parts are disposed, and the dummy pattern parts are disposed in an area within the non-display area where the gate driver is not disposed, and one of the dummy pattern parts is disposed overlapping with the data pads. | 07-31-2014 |
20150015859 | DIGITAL EXPOSURE DEVICE USING DIGITAL MICRO-MIRROR DEVICE AND A METHOD FOR CONTROLLING THE SAME - Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head. | 01-15-2015 |
20150025665 | DIGITAL EXPOSURE DEVICE - A digital exposure device includes: a stage having a substrate seated thereon where a pattern is to be formed and moving in a scan direction; a data modification unit receiving design data and generating modified data by extending the design data; and a digital exposure unit receiving the design data and projecting a light controlled according to the design data on the substrate, wherein the modified data includes intermedial data corresponding to the size difference between an image of the design data and an image of the modified data and some of unit data forming the intermedial data are data obtained when unit data of the design data are shifted in any expansion direction. | 01-22-2015 |
20150049316 | EXPOSURE APPARATUS AND METHOD THEREOF - An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions. | 02-19-2015 |