Patent application number | Description | Published |
20100294954 | METHOD FOR MAKING STRUCTURES WITH IMPROVED EDGE DEFINITION - A method includes scanning a radiation beam with respect to a multi-photon curable photoreactive composition. The radiation beam includes a power sufficient to at least partially cure a volume of the multiphoton curable photoreactive composition. The method further includes modifying a characteristic of the radiation beam as the radiation beam is scanned. | 11-25-2010 |
20100296106 | CHROMATIC CONFOCAL SENSOR - A system comprising a substrate having thereon a multiphoton curable photoreactive composition, a light source that emits a light beam comprising a plurality of wavelengths onto at least one region of the composition on the substrate, and a detector that detects a portion of light reflected from the composition to obtain a location signal with respect to the substrate, wherein the location signal is based at least on a wavelength of the reflected light. | 11-25-2010 |
20100316959 | METHODS FOR FORMING SHEETING WITH A COMPOSITE IMAGE THAT FLOATS AND A MASTER TOOLING - A sheeting and a method of forming a sheeting from a master tool are described where the sheeting has a composite image that floats above or below the sheeting. The method includes providing a first sheeting comprising a first array of microlenses and a photopolymerizable first material layer adjacent to the first array of microlenses. Another step is exposing the first sheeting to a radiation source to form a master tool comprising a plurality of polymerized first structured areas in the first material layer, wherein at least some of the first structured areas include a portion shape in common with at least some of the first structured areas and wherein each first structured area is associated with one of the first array of microlenses. Yet another step is replicating the plurality of first structured areas using a substance that conforms to the plurality of structured areas to form a second material layer having a plurality of replicated structured areas. | 12-16-2010 |
20110001950 | MULTI-PHOTON EXPOSURE SYSTEM - An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor. | 01-06-2011 |
20110109965 | OPTICAL ELEMENTS FOR SHOWING VIRTUAL IMAGES - A virtual image display device has a lens array and a virtual image substrate disposed behind the lens array. The virtual image substrate is provided with a virtual image pattern registered to lenses of the lens array. In some embodiments the virtual image pattern can include grey scale information, where the grey scale information includes information in at least one of color and shape. In a static virtual image substrate, the virtual image information can include pixels of at least two different colors. An optical mask can have a virtual image pattern arranged so that a virtual image of an object appears to a viewer when a lens array is applied to the mask. In other embodiments, an optical mask can include an intermediate virtual image pattern containing information for manufacturing a virtual image substrate. | 05-12-2011 |
20110179631 | Processes for Producing Optical Elements Showing Virtual Images - A virtual image (VI) device displays an image that appears to lie above or below the plane of the device. A method of manufacturing a VI display device includes calculating an initial VI flux pattern based on an object and then fabricating a substrate having a VI array pattern based on the initial VI flux pattern. A plurality of lenses may then be applied over the VI array pattern. The VI substrate may be static or dynamic, and may show grey scale information. A photomask may be used as an intermediate element in the manufacture of the VI substrate, or may act as the VI substrate itself. A method of producing the initial VI flux pattern includes virtually tracing rays generated by different points of the object to an image plane and ii) summing the rays from the different points. The rays may be traced through a lens array. | 07-28-2011 |
20140092372 | MULTI-PHOTON EXPOSURE SYSTEM - An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor. | 04-03-2014 |
20150030985 | Multiphoton Curing Methods Using Negative Contrast Compositions - The present disclosure relates to multiphoton absorption methods for curing a photocurable composition under conditions wherein negative contrast occurs. The photocurable composition includes a free-radically polymerizable compound. The method is applicable to fabrication of structures with micron-scale dimensions or less. | 01-29-2015 |