Patent application number | Description | Published |
20080223430 | Buffer layer for front electrode structure in photovoltaic device or the like - Certain example embodiments of this invention relate to an electrode structure (e.g., front electrode structure) for use in a photovoltaic device or the like. In certain example embodiments, a buffer layer (e.g., of or including tin oxide) is provided between the front electrode and the semiconductor absorber film in a photovoltaic device. The buffer layer may be deposited via sputtering, and may or may not be doped in certain example instances. In an example context of use in CdS/CdTe photovoltaic devices, the buffer layer is advantageous in that it (one or more of): (a) provides a good work-function match to a possible CdS/CdTe film and the front electrode; (b) provides good durability in that it is better able to withstand attacks of sulfur vapors at elevated temperatures during possible CdS/CdTe processing; (c) may be at least partially conductive; and/or (d) provides good mechanical durability. | 09-18-2008 |
20080308145 | Front electrode including transparent conductive coating on etched glass substrate for use in photovoltaic device and method of making same - Certain example embodiments of this invention relate to a front electrode provided on an etched/patterned front glass substrate for use in a photovoltaic device or the like. The glass is a low-iron soda-lime-silica based glass. Etching of the glass may include immersing the soda-lime-silica based glass in an acid inclusive solution such as hydrofluoric acid (e.g., HF in aqueous solution) and/or hydrofluoric acid with a buffer, in order to selectively dissolve some of the glass thereby producing at least one textured/patterned substantially transparent surface of the glass substrate. A front electrode (single or multi-layered) is then formed (e.g., via sputter-deposition) on the textured surface of the front glass substrate, and may be used in a photovoltaic device or the like. | 12-18-2008 |
20080308146 | Front electrode including pyrolytic transparent conductive coating on textured glass substrate for use in photovoltaic device and method of making same - A photovoltaic device includes a front electrode on a textured front glass substrate. In certain example embodiments, the glass substrate is textured via roller(s) and/or etching to form a textured surface. Thereafter, a front electrode is formed on the textured surface of the glass substrate via pyrolysis. The front electrode may be of or include a transparent conductive oxide (TCO) such as tin oxide and/or fluorinated tin oxide in certain example embodiments. In certain example instances, this is advantageous in that efficiency of the photovoltaic device can be improved by increasing light absorption by the active semiconductor via both increasing light intensity passing through the front glass substrate and front electrode, and increasing the light path in the semiconductor photovoltaic conversion layer. | 12-18-2008 |
20090020157 | Rear electrode structure for use in photovoltaic device such as CIGS/CIS photovoltaic device and method of making same - A photovoltaic device including a rear electrode which may also function as a rear reflector. In certain example embodiments of this invention, the rear electrode includes a metallic based reflective film that is oxidation graded, so as to be more oxided closer to a rear substrate (e.g., glass substrate) supporting the electrode than at a location further from the rear substrate. In other words, the rear electrode is oxidation graded so as to be less oxided closer to a semiconductor absorber of the photovoltaic device than at a location further from the semiconductor absorber in certain example embodiments. In certain example embodiments, the interior surface of the rear substrate may optionally be textured so that the rear electrode deposited thereon is also textured so as to provide desirable electrical and reflective characteristics. In certain example embodiments, the rear electrode may be of or include Mo and/or MoO | 01-22-2009 |
20090126791 | Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index - Certain example embodiments of this invention relate to an electrode (e.g., front electrode) for use in a photovoltaic device or the like. In certain example embodiments, a transparent conductive oxide (TCO) of the front electrode for use in a photovoltaic device is of or includes titanium oxide doped with one or more of Nb, Zn and/or Al. Additional layers may also be provided in the front electrode in certain example embodiments. It has been found that the use of transparent conductive TiO | 05-21-2009 |
20090194155 | Front electrode having etched surface for use in photovoltaic device and method of making same - Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. In certain example embodiments, the front electrode is formed on a flat or substantially flat (non-textured) surface of a glass substrate (e.g., via sputtering), and the surface of the front electrode is textured (e.g., via etching). In completing manufacture of the PV device, the etched surface of the front electrode faces the active semiconductor film of the PV device. | 08-06-2009 |
20090194157 | Front electrode having etched surface for use in photovoltaic device and method of making same - Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. In certain example embodiments, the front electrode is formed on a flat or substantially flat (non-textured) surface of a glass substrate (e.g., via sputtering), and the surface of the front electrode is textured (e.g., via etching). In certain example embodiments, a combination of two or more different etchants can be used in order to provide the front electrode with a textured surface having at least two different feature sizes. In completing manufacture of the PV device, the etched surface of the front electrode faces the active semiconductor film of the PV device. | 08-06-2009 |
20100040892 | Coated article with transparent conductive oxide film doped to adjust Fermi level, and method of making same - A transparent conductive oxide (TCO) based film is formed on a substrate. The film may be formed by sputter-depositing, so as to include both a primary dopant (e.g., Al) and a co-dopant (e.g., Ag). The benefit of using the co-dopant in depositing the TCO inclusive film may be two-fold: (a) it may prevent or reduce self-compensation of the primary dopant by a more proper positioning of the Fermi level, and/or (b) it may promote declustering of the primary dopant, thereby freeing up space in the metal sublattice and permitting more primary dopant to create electrically active centers so as to improve conductivity of the film. Accordingly, the use of the co-dopant permits the primary dopant to be more effective in enhancing conductivity of the TCO inclusive film, without significantly sacrificing visible transmission characteristics. An example TCO in certain embodiments is ZnAlO | 02-18-2010 |
20100089444 | Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device - Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. The front electrode has a transparent conductive oxide (TCO) film having first and second layers (continuous or discontinuous) of the same material (e.g., zinc oxide, zinc aluminum oxide, indium-tin-oxide, or tin oxide), where the first TCO layer is sputter-deposited using a ceramic sputtering target(s) and the second TCO layer of the same material is sputter-deposited using a metallic or substantially metallic sputtering target(s). This allows the better quality TCO of the film, deposited more slowly via the ceramic target(s), to be formed using the ceramic target and the lesser quality TCO of the film to be deposited more quickly and cost effectively via the metallic target(s). After the etching, most or all of the better quality ceramic-deposited TCO remains whereas much of the lesser quality metallic-deposited TCO of the film was removed during the etching process. | 04-15-2010 |
20100122900 | ITO-coated article for use with touch panel display assemblies, and/or method of making the same - Certain example embodiments of this invention relate to techniques for making a coated article including a transparent conductive indium-tin-oxide (ITO) film supported by a heat treated glass substrate. A substantially sub-oxidized ITO or metallic indium-tin (InSn) film is sputter-deposited onto a glass substrate at room temperature. The glass substrate with the as-deposited film thereon is subjected to elevated temperatures. Thermal tempering or heat strengthening causes the as-deposited film to be transformed into a crystalline transparent conductive ITO film. Advantageously, this may reduce the cost of touch panel assemblies, e.g., because of the higher rates of the ITO deposition in the metallic mode. The cost of touch-panel assemblies may be further reduced through the use of float glass. | 05-20-2010 |
20100175988 | Apparatus and method for making sputtered films with reduced stress asymmetry - Certain example embodiments of this invention relate to techniques for reducing stress asymmetry in sputtered polycrystalline films. In certain example embodiments, sputtering apparatuses that include one or more substantially vertical, non-conductive shield(s) are provided, with such shield(s) helping to reduce the oblique component of sputter material flux, thereby promoting the growth of more symmetrical crystallites. In certain example embodiments, the difference between the travel direction tensile stress and the cross-coater tensile stress of the sputtered film preferably is less than about 15%, more preferably less than about 10%, and still more preferably less than about 5%. | 07-15-2010 |
20110094580 | Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index - Certain example embodiments of this invention relate to an electrode (e.g., front electrode) for use in a photovoltaic device or the like. In certain example embodiments, a transparent conductive oxide (TCO) of the front electrode for use in a photovoltaic device is of or includes titanium oxide doped with one or more of Nb, Zn and/or Al. Additional layers may also be provided in the front electrode in certain example embodiments. It has been found that the use of transparent conductive TiO | 04-28-2011 |
20110097841 | Rear electrode structure for use in photovoltaic device such as CIGS/CIS photovoltaic device and method of making same - A photovoltaic device including a rear electrode which may also function as a rear reflector. In certain example embodiments of this invention, the rear electrode includes a metallic based reflective film that is oxidation graded, so as to be more oxided closer to a rear substrate (e.g., glass substrate) supporting the electrode than at a location further from the rear substrate. In other words, the rear electrode is oxidation graded so as to be less oxided closer to a semiconductor absorber of the photovoltaic device than at a location further from the semiconductor absorber in certain example embodiments. In certain example embodiments, the interior surface of the rear substrate may optionally be textured so that the rear electrode deposited thereon is also textured so as to provide desirable electrical and reflective characteristics. In certain example embodiments, the rear electrode may be of or include Mo and/or MoO | 04-28-2011 |
20110100445 | High haze transparent contact including insertion layer for solar cells, and/or method of making the same - Certain example embodiments of this invention relate to a front transparent conductive electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments enable high haze to be realized in the top layer of the thin film stack. In certain example embodiments, an insertion layer comprising ITO or AZO is provided between a layer of AZO and a layer of ITO. The AZO may be deposited at room temperature. The insertion layer is provided with an oxygen content selected so that the insertion layer sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. In certain example embodiments, the layer of ITO may be ion-beam treated so as to roughen a surface thereof. The ion beam treating may be performed a voltage sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. | 05-05-2011 |
20110100446 | High haze transparent contact including ion-beam treated layer for solar cells, and/or method of making the same - Certain example embodiments of this invention relate to a front transparent conductive electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments enable high haze to be realized in the top layer of the thin film stack. In certain example embodiments, an insertion layer comprising ITO or AZO is provided between a layer of AZO and a layer of ITO. The AZO may be deposited at room temperature. The insertion layer is provided with an oxygen content selected so that the insertion layer sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. In certain example embodiments, the layer of ITO may be ion-beam treated so as to roughen a surface thereof. The ion beam treating may be performed a voltage sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. | 05-05-2011 |
20110168252 | Textured coating with etching-blocking layer for thin-film solar cells and/or methods of making the same - Certain example embodiments of this invention relate to a front electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments include a layer that acts as an etch-stop layer. In certain example embodiments, the blocking layer is provided between a transparent conductive oxide layer including AZO and a conductive layer. In certain example embodiments, a weak acid may be used to texture the layer including AZO. A semiconductor may be provided over the textured layer including AZO. The blocking layer provided between the layer of AZO and the IR reflecting layer may be more resistant to etching by weak acids than the layer based on AZO. Therefore, in certain example embodiments, the blocking layer may substantially reduce the risk of the semiconductor coming into contact with the conductive layer (which may be based on Ag). | 07-14-2011 |
20110180130 | Highly-conductive and textured front transparent electrode for a-si thin-film solar cells, and/or method of making the same - Certain example embodiments incorporate a “hybrid” design for the front electrode of solar cells, which advantageously combines naturally textured pyrolytic tin oxide and highly-conductive sputtered indium tin oxide (ITO). In certain example embodiments of this invention, a method of making a front electrode superstrate for a solar cell is provided. A glass substrate is provided. A layer of tin oxide is pyrolytically deposited on the glass substrate, with the layer of tin oxide being textured as a result of the pyrolytic deposition and with the layer of tin oxide being haze producing. A layer of indium tin oxide (ITO) is sputter-deposited on the layer of tin oxide, with the layer of ITO being generally conformal with respect to the layer of tin oxide. An amorphous silicon (a-Si) thin film layer stack is formed on the layer of ITO in making the front electrode superstrate. | 07-28-2011 |
20110186120 | Textured coating with various feature sizes made by using multiple-agent etchant for thin-film solar cells and/or methods of making the same - Certain example embodiments of this invention relate to solar cell devices, and/or methods of making the same. More particularly, certain example embodiments relate to a front transparent conductive electrode for solar cell devices (e.g., micro-morph silicon thin-film solar cells), and/or methods of making the same. The electrode of certain example embodiments may include a textured transparent conductive oxide (TCO) layer. The textured layer and/or coating may include at least two feature sizes, wherein at least one type of feature is comparable in size to the wavelength of solar light absorbed by the amorphous portion of the micro-morph silicon solar cell, and the other feature size being comparable to that of micro-crystalline portion. Double-agent etchants may be used to produce such different features sizes. Using a textured TCO-based layer having different feature sizes may improve the efficiency of the solar cell. | 08-04-2011 |
20110259394 | Patterned glass cylindrical lens arrays for concentrated photovoltaic systems, and/or methods of making the same - Certain example embodiments of this invention relate to patterned glass that can be used as a cylindrical lens array in a concentrated photovoltaic application, and/or methods of making the same. In certain example embodiments, the lens arrays may be used in combination with strip solar cells and/or single-axis tracking systems. That is, in certain example embodiments, lenses in the lens array may be arranged so as to concentrate incident light onto respective strip solar cells, and the entire assembly may be connected to a single-axis tracking system that is programmed to follow the East-West movement of the sun. A low-iron glass may be used in connection with certain example embodiments. Such techniques may advantageously help to reduce cost per watt related, in part, to the potentially reduced amount of semiconductor material to be used for such example embodiments. | 10-27-2011 |
20110263066 | Patterned glass cylindrical lens arrays for concentrated photovoltaic systems, and/or methods of making the same - Certain example embodiments of this invention relate to patterned glass that can be used as a cylindrical lens array in a concentrated photovoltaic application, and/or methods of making the same. In certain example embodiments, the lens arrays may be used in combination with strip solar cells and/or single-axis tracking systems. That is, in certain example embodiments, lenses in the lens array may be arranged so as to concentrate incident light onto respective strip solar cells, and the entire assembly may be connected to a single-axis tracking system that is programmed to follow the East-West movement of the sun. A low-iron glass may be used in connection with certain example embodiments. Such techniques may advantageously help to reduce cost per watt related, in part, to the potentially reduced amount of semiconductor material to be used for such example embodiments. | 10-27-2011 |
20120064234 | ITO-COATED ARTICLE FOR USE WITH TOUCH PANEL DISPLAY ASSEMBLIES, AND/OR METHOD OF MAKING THE SAME - Certain example embodiments of this invention relate to techniques for making a coated article including a transparent conductive indium-tin-oxide (ITO) film supported by a heat treated glass substrate. A substantially sub-oxidized ITO or metallic indium-tin (InSn) film is sputter-deposited onto a glass substrate at room temperature. The glass substrate with the as-deposited film thereon is subjected to elevated temperatures. Thermal tempering or heat strengthening causes the as-deposited film to be transformed into a crystalline transparent conductive ITO film. Advantageously, this may reduce the cost of touch panel assemblies, e.g., because of the higher rates of the ITO deposition in the metallic mode. The cost of touch-panel assemblies may be further reduced through the use of float glass. | 03-15-2012 |
20120070652 | Coated article having zinc oxide seed layer with reduced stress under functional layer and method of making the same - A coated article is provided with at least one functional layer, such as an infrared (IR) reflecting layer of or including silver and/or gold. A dielectric and substantially transparent seed layer is provided under and directly contacting the functional layer. In certain example embodiments, the seed layer includes an oxide of zinc and gallium for lowering the stress of the layer and thus improving durability of the overall coating. | 03-22-2012 |
20120167971 | Textured coating for thin-film solar cells and/or methods of making the same - Certain example embodiments of this invention relate to a front electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments include a front contact including a transparent conductive oxide layer of aluminum-doped zinc oxide. In certain example embodiments, the AZO-based layer is ion beam treated post-deposition in order to increase its surface energy and/or decrease its contact layer so as to make the layer less hydrophobic. In certain example embodiments, after ion beam treatment, a weak acid may be used to texture the layer of AZO. The reduced contact angle of the layer of AZO may improve its ability to be textured. A semiconductor may be provided over the textured layer of AZO. In certain example embodiments, the textured, ion beam-treated AZO may result in an improved front contact. | 07-05-2012 |
20120196133 | Heat treatable four layer anti-reflection coating - A coated article includes a heat treatable (e.g., temperable) antireflection (AR) coating having four layers. The AR coating includes a layer adjacent the glass substrate having an index of refraction substantially matching that of the glass substrate, and having a compressive residual stress. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: stress-reducing layer/medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the stress-reducing layer of the AR coating is selected to cause a net compressive residual stress and thus improve the overall performance of the antireflection coating when the coated article is heat treated. | 08-02-2012 |
20120200816 | ELECTRONIC DEVICES HAVING REDUCED SUSCEPTIBILITY TO NEWTON RINGS, AND/OR METHODS OF MAKING THE SAME - Certain example embodiments relate to electronic devices (e.g., LCD or other display devices) having reduced susceptibility to Newton Rings, and/or methods of making the same. In certain example embodiments, the electronic device includes at least first and second glass substrates. An Anti-Newton Ring (ANR)/antireflective (AR) coating is provided on the second and/or third surface of the electronic device (e.g., on an inner surface of the cover glass and/or on an outer surface of the color filter substrate of an LCD device) so as to help reduce the formation of Newton Rings caused by the air pockets that surround one or more points of unintentional glass deformation. This may be made possible in certain example embodiments because the ANR coating is optically matched to reduce reflections of light between the first and second substrates. | 08-09-2012 |
20120251773 | Light scattering coating for greenhouse applications, and/or coated article including the same - Certain example embodiments relate to a sunlight-scattering thin-film coating disposed on a substrate for greenhouse applications. The surface morphology of the coating promotes a better and more uniform light distribution. For instance, at least one thin-film layer disposed on a substrate may be textured so as to create surface features on the order of 0.1-5 microns, with the surface features being sized to cause (a) light having a wavelength of greater than or equal to about 800 nm incident thereon to primarily scatter to angles less than 30 degrees relative to a major surface of the substrate and (b) light having a wavelength of less than or equal to about 700 nm incident thereon to primarily scatter to angles greater than 20 degrees relative to the major surface of the substrate. This arrangement may advantageously direct beneficial light towards plant life while directing parasitic light away from the plant life. | 10-04-2012 |
20130004678 | PLANAR PATTERNED TRANSPARENT CONTACT, DEVICES WITH PLANAR PATTERNED TRANSPARENT CONTACTS, AND/OR METHODS OF MAKING THE SAME - Certain examples relate to improved methods for making patterned substantially transparent contact films, and contact films made by such methods. In certain cases, the contact films may be patterned and substantially planar. Thus, the contact films may be patterned without intentionally removing any material from the layers and/or film, such as may be required by photolithography. In certain example embodiments, an oxygen exchanging system comprising at least two layers may be deposited on a substrate, and the layers may be selectively exposed to heat and/or energy to facilitate the transfer of oxygen ions or atoms from the layer with a higher enthalpy of formation to a layer with a lower enthalpy of formation. In certain cases, the oxygen transfer may permit the conductivity of selective portions of the film to be changed. This advantageously may result in a planar contact film that is patterned with respect to conductivity and/or resistivity. | 01-03-2013 |
20130005135 | PLANAR PATTERNED TRANSPARENT CONTACT, DEVICES WITH PLANAR PATTERNED TRANSPARENT CONTACTS, AND/OR METHODS OF MAKING THE SAME - Certain examples relate to improved methods for making patterned substantially transparent contact films, and contact films made by such methods. In certain cases, the contact films may be patterned and substantially planar. Thus, the contact films may be patterned without intentionally removing any material from the layers and/or film, such as may be required by photolithography. In certain example embodiments, an oxygen exchanging system comprising at least two layers may be deposited on a substrate, and the layers may be selectively exposed to heat and/or energy to facilitate the transfer of oxygen ions or atoms from the layer with a higher enthalpy of formation to a layer with a lower enthalpy of formation. In certain cases, the oxygen transfer may permit the conductivity of selective portions of the film to be changed. This advantageously may result in a planar contact film that is patterned with respect to conductivity and/or resistivity. | 01-03-2013 |
20130005139 | TECHNIQUES FOR MANUFACTURING PLANAR PATTERNED TRANSPARENT CONTACT AND/OR ELECTRONIC DEVICES INCLUDING SAME - Certain examples relate to improved methods for making patterned substantially transparent contact films, and contact films made by such methods. In certain cases, the contact films may be patterned and substantially planar. Thus, the contact films may be patterned without intentionally removing any material from the layers and/or film, such as may be required by photolithography. In certain example embodiments, an oxygen exchanging system comprising at least two layers may be deposited on a substrate, and the layers may be selectively exposed to heat and/or energy to facilitate the transfer of oxygen ions or atoms from the layer with a higher enthalpy of formation to a layer with a lower enthalpy of formation. In certain cases, the oxygen transfer may permit the conductivity of selective portions of the film to be changed. This advantageously may result in a planar contact film that is patterned with respect to conductivity and/or resistivity. | 01-03-2013 |
20130019940 | ELECTRODE STRUCTURE FOR USE IN ELECTRONIC DEVICE AND METHOD OF MAKING SAME - An electrode structure is provided for use in an electronic device. In certain example embodiments, an electrode structure includes a supporting glass substrate (e.g., soda-lime silica based float glass), a buffer layer (e.g., Si | 01-24-2013 |
20130059065 | ITO-COATED ARTICLE FOR USE WITH TOUCH PANEL DISPLAY ASSEMBLIES, AND/OR METHOD OF MAKING THE SAME - Certain example embodiments of this invention relate to techniques for making a coated article including a transparent conductive indium-tin-oxide (ITO) film supported by a heat treated glass substrate. A substantially sub-oxidized ITO or metallic indium-tin (InSn) film is sputter-deposited onto a glass substrate at room temperature. The glass substrate with the as-deposited film thereon is subjected to elevated temperatures. Thermal tempering or heat strengthening causes the as-deposited film to be transformed into a crystalline transparent conductive ITO film. Advantageously, this may reduce the cost of touch panel assemblies, e.g., because of the higher rates of the ITO deposition in the metallic mode. The cost of touch-panel assemblies may be further reduced through the use of float glass. | 03-07-2013 |
20130074922 | ZINC OXIDE BASED FRONT ELECTRODE DOPED WITH YTTRIUM FOR USE IN PHOTOVOLTAIC DEVICE OR THE LIKE - Certain example embodiments of this invention relate to an electrode (e.g., front electrode) for use in a photovoltaic device or the like. In certain example embodiments, a transparent conductive oxide (TCO) based front electrode for use in a photovoltaic device is of or includes zinc oxide, or zinc aluminum oxide, doped with yttrium (Y). In certain example embodiments, the addition of the yttrium (Y) to the conductive zinc oxide or zinc aluminum oxide is advantageous in that potential conductivity loss of the electrode can be reduced or prevented. In other example embodiments, a low-E coating may include a layer of or including zinc oxide, or zinc aluminum oxide, doped with yttrium (Y). | 03-28-2013 |
20130112245 | PHOTOVOLTAIC SYSTEMS AND ASSOCIATED COMPONENTS THAT ARE USED ON BUILDINGS AND/OR ASSOCIATED METHODS - Certain example embodiments relate to building integrated photovoltaic (BIPV) or building adapted photovoltaic (BAPV) systems and components thereof. In certain example embodiments a component includes an asymmetric glass substrate that includes at least first, second, and third surfaces. The third surface can be laminated to a photovoltaic sub-assembly. The first surface can structured to be angled away from a vertical plane of a building at an angle of between 5 and 40 degrees. The first surface may be longer than the second surface. | 05-09-2013 |
20130180580 | PHOTOVOLTAIC MODULE INCLUDING HIGH CONTACT ANGLE COATING ON ONE OR MORE OUTER SURFACES THEREOF, AND/OR METHODS OF MAKING THE SAME - Certain example embodiments of this invention relate to photovoltaic modules that include high contact angle coatings on one or more outermost major surfaces thereof, and/or associated methods. In certain example embodiments, the high contact angle coatings advantageously reduce the likelihood of electrical losses through parasitic leakage of the electrical current caused by moisture on surfaces of the photovoltaic modules, thereby potentially improving the efficiency of the photovoltaic devices. In certain example embodiments, the high contact angle coatings may be nitrides and/or oxides of or including Si, Ti, Ta, TaCr, NiCr, and/or Cr; hydrophobic DLC; and/or polymer-based coatings. The photovoltaic modules may be substrate-type modules or superstrate-type modules in different example embodiments. | 07-18-2013 |
20130208375 | MIRROR AND METHODS OF MAKING THE SAME - Certain example embodiments of this invention relate to sputtered aluminum second surface mirrors with permanent protective coatings optionally provided thereto, and/or methods of making the same. A mirror coating supported by a substrate may include, for example, first and second dielectric layers sandwiching a metallic or substantially metallic layer including aluminum, and an optional layer including Ni and/or Cr in direct contact with the metallic or substantially metallic layer comprising aluminum. A protective film may be disposed directly over and contacting an outermost layer of the mirror coating, with the protective film having a peel strength of 200-500 cN/20 mm wide strip. | 08-15-2013 |
20130284246 | BACK ELECTRODE CONFIGURATION FOR ELECTROPLATED CIGS PHOTOVOLTAIC DEVICES AND METHODS OF MAKING SAME - A back contact configuration for a CIGS-type photovoltaic device is provided. The back contact configuration includes an interfacial seed layer, made up of one or more layers/sublayers, disposed between a Mo based rear contact/electrode and a CIGS inclusive semiconductor absorber. The interfacial seed layer may be of or include one or more element(s) that make up, or help make up, the CIGS inclusive semiconductor absorber. Various methods and compositions of the interfacial seed layer are disclosed, including a seed layer comprising metallic and/or substantially metallic Cu—In—Ga, CIGS, and/or a stack of alternating layers of or including Cu, In and Ga. Methods for making the back contact configuration, including an interfacial seed layer, are also provided. | 10-31-2013 |
20130284251 | BACK CONTACT FOR PHOTOVOLTAIC DEVICES SUCH AS COPPER-INDIUM-DISELENIDE SOLAR CELLS - A photovoltaic device (e.g., solar cell) includes: a front substrate (e.g., glass substrate); a semiconductor absorber film; a back contact including a first conductive layer of or including copper (Cu) and a second conductive layer of or including molybdenum (Mo); and a rear substrate (e.g., glass substrate). The first conductive layer of or including copper is located between at least the rear substrate and the second conductive layer of or including molybdenum, and wherein the semiconductor absorber film is located between at least the back contact and the front substrate. | 10-31-2013 |
20130284252 | BACK CONTACT STRUCTURE FOR PHOTOVOLTAIC DEVICES SUCH AS COPPER-INDIUM-DISELENIDE SOLAR CELLS - A back contact configuration for a CIGS-type photovoltaic device is provided. According to certain examples, the back contact configuration includes an optical matching layer and/or portion of or including MoSe | 10-31-2013 |
20130284253 | HIGH-REFLECTIVITY BACK CONTACT FOR PHOTOVOLTAIC DEVICES SUCH AS COPPER-INDIUM-DISELENIDE SOLAR CELLS - A photovoltaic device (e.g., solar cell) includes: a front substrate (e.g., glass substrate); a semiconductor absorber film; a back contact including a first conductive layer of or including an alloy of molybdenum (Mo) and copper (Cu) and optionally a second conductive layer of or including either molybdenum (Mo) or Cu; and a rear substrate (e.g., glass substrate). The first conductive layer of or including molybdenum and copper is located between at least the rear substrate and a semiconductor absorber film that is located between at least the back contact and the front substrate. | 10-31-2013 |
20130320241 | WINDOW WITH UV-TREATED LOW-E COATING AND METHOD OF MAKING SAME - A coated article includes a low-emissivity (low-E) coating supported by a substrate (e.g., glass substrate) for use in a window, where the low-E coating is exposed to ultraviolet (UV) radiation in order to improve the coating's and thus the coated article's electrical, optical and/or thermal blocking properties. Exposing the low-E coating to UV radiation, e.g., emitted from a UV lamp(s) and/or UV laser(s), allows for selective heating of a contact/seed layer which transfers energy to the adjacent IR reflecting layer. | 12-05-2013 |
20130323442 | WINDOW WITH SELECTIVELY WRITABLE IMAGE(S) AND METHOD OF MAKING SAME - A writable window (e.g., IG window unit) is provided where images (e.g., advertisements, logos, designs, pictures and/or words) can be selectively written into the window. A substrate supports a solar coating such as a low emissivity (low-E) coating which may include at least one infrared (IR) reflecting layer (e.g., silver) and a contact/seed layer (e.g., zinc oxide and/or zinc stannate). A radiation source (e.g., laser(s) and/or lamp(s)) selectively exposes certain areas of the coating to radiation (e.g., UV radiation). Exposed area(s) of the coating, after exposure/heating, have different optical characteristic(s) than non-exposed areas, so that exposed area(s) form an image(s) designed to be viewed by humans and/or animals. | 12-05-2013 |
20140048775 | ORGANIC LIGHT EMITTING DIODE WITH TRANSPARENT ELECTRODE AND METHOD OF MAKING SAME - A transparent electrode is provided for an organic light emitting diode (OLED) device. The electrode may be made according to a method including: sputter-depositing a first layer of or including indium tin oxide (ITO) on a substrate; sputter-depositing a thin second metallic or substantially metallic layer on the glass substrate over the first layer to form an electrode structure, and heat treating the electrode structure at temperature(s) of at least about 400 degrees C. in order to thermally activate at least the first layer of or including ITO. The electrode structure may then be provided in an OLED device on the light-emitting side of the organic light emitting semiconductor layer. | 02-20-2014 |
20140055857 | MIRROR FOR USE IN HUMID ENVIRONMENTS, AND/OR METHOD OF MAKING THE SAME - Certain example embodiments of this invention relate to sputtered aluminum second surface mirrors with tapes optionally provided thereto, and/or methods of making the same. The tape replaces the paint backing that conventionally is used in the mirror industry to help protect the reflecting member of the mirror from the ingress of moisture. The final layer of the thin film layer stack is selected so as to help make its interface with the tape less sensitive to moisture. Because the safety tape can remain adhered to the layer stack even in high humidity environments, such minors may be used in a potentially broader array of applications and/or environments such as, for example, bathrooms, interior and/or exterior applications in areas where there are humid climates, etc. In one of the example embodiments, the tape is a safety tape. | 02-27-2014 |
20140069143 | PATTERNED GLASS CYLINDRICAL LENS ARRAYS FOR CONCENTRATED PHOTOVOLTAIC SYSTEMS, AND/OR METHODS OF MAKING THE SAME - Certain example embodiments of this invention relate to patterned glass that can be used as a cylindrical lens array in a concentrated photovoltaic application, and/or methods of making the same. In certain example embodiments, the lens arrays may be used in combination with strip solar cells and/or single-axis tracking systems. That is, in certain example embodiments, lenses in the lens array may be arranged so as to concentrate incident light onto respective strip solar cells, and the entire assembly may be connected to a single-axis tracking system that is programmed to follow the East-West movement of the sun. A low-iron glass may be used in connection with certain example embodiments. Such techniques may advantageously help to reduce cost per watt related, in part, to the potentially reduced amount of semiconductor material to be used for such example embodiments. | 03-13-2014 |
20140145999 | PROJECTED CAPACITIVE TOUCH PANEL WITH A SILVER-INCLUSIVE TRANSPARENT CONDUCTING LAYER(S) - A projected capacitive touch panel, including a substrate, a silver-inclusive transparent conductive coating which forms a plurality of row electrodes, a plurality of column electrodes, and a plurality of conductive traces, and a signal processor which sequentially measures a capacitance between each of row electrodes and an adjacent column electrode. The row electrodes, the plurality of column electrodes, and the plurality of traces are on a plane substantially parallel to the substrate. Each of the row electrodes is electrically connected to the signal processor by one of the plurality of conductive traces. The plurality of traces are at least partially substantially parallel to the column electrodes. | 05-29-2014 |
20140147582 | HEAT TREATABLE FOUR LAYER ANTI-REFLECTION COATING - A coated article includes a heat treatable (e.g., temperable) antireflection (AR) coating having four layers. The AR coating includes a layer adjacent the glass substrate having an index of refraction substantially matching that of the glass substrate, and having a compressive residual stress. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: stress-reducing layer/medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the stress-reducing layer of the AR coating is selected to cause a net compressive residual stress and thus improve the overall performance of the antireflection coating when the coated article is heat treated. | 05-29-2014 |
20140182671 | BACK CONTACT HAVING SELENIUM BLOCKING LAYER FOR PHOTOVOLTAIC DEVICES SUCH AS COPPER-INDIUM-DISELENIDE SOLAR CELLS - A photovoltaic device (e.g., solar cell) includes: a front substrate (e.g., glass substrate); a semiconductor absorber film; a back contact including a first conductive layer of or including copper (Cu) and a second conductive layer of or including molybdenum (Mo); and a rear substrate (e.g., glass substrate). A selenium blocking layer is provided between at least the Cu inclusive layer and the Mo inclusive layer. | 07-03-2014 |
20140211332 | MIRROR - Mirrors having at least one of: (a) a reflective film including a first layer of or including aluminum and a second layer of or including silver or the like, and/or (b) a color tuning layer between first and second layers. The mirrors may be second surface mirrors in certain example embodiments. The mirrors may be flat or bent in different instances, and may or may not be heat treated (e.g., thermally tempered and/or thermally bent). | 07-31-2014 |
20140233119 | MIRROR HAVING REFLECTIVE LAYER OF OR INCLUDING SILICON ALUMINUM - Embodiments relate to mirrors having a reflective layer of or including silicon aluminum (e.g., SiAl). The mirrors may be first surface mirrors, or second surface mirrors. The mirrors may be flat or bent in different instances, and may or may not be heat treated. In certain example instances, such mirrors may be used in interior residential, commercial, appliance, and/or other applications. | 08-21-2014 |
20140233120 | MIRROR HAVING REFLECTIVE LAYER OF OR INCLUDING SILICON ALUMINUM - Embodiments relate to mirrors having a reflective layer of or including silicon aluminum (e.g., SiAl). The mirrors may be first surface mirrors, or second surface mirrors. The SiAl layer may be provided between dielectric layers. The mirrors may be flat or bent in different instances, and may or may not be heat treated. In certain example instances, such mirrors may be used in interior residential, commercial, appliance, and/or other applications. | 08-21-2014 |
20140252335 | ORGANIC LIGHT EMITTING DIODE WITH TRANSPARENT ELECTRODE AND METHOD OF MAKING SAME - A transparent electrode is provided for an organic light emitting diode (OLED) device. The electrode may be made according to a method including: sputter-depositing a first layer of or including indium tin oxide (ITO) on a substrate; sputter-depositing a thin second metallic or substantially metallic layer on the glass substrate over the first layer to form an electrode structure, and heat treating the electrode structure at temperature(s) of at least about 400 degrees C. in order to thermally activate at least the first layer of or including ITO. The electrode structure may then be provided in an OLED device on the light-emitting side of the organic light emitting semiconductor layer. | 09-11-2014 |