Akira Murata
Akira Murata, Koshi City JP
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20100050867 | GAS TREATMENT APPARATUS, GAS TREATMENT METHOD, AND STORAGE MEDIUM - Disclosed is a gas treatment apparatus which can reduce the useless liquid quantity without using an expensive device, such as the evaporator or the mass flowmeter. The control mechanism performs control for exhausting the raw material storage container to make the raw material storage container have a predetermined vacuum pressure, stopping exhaustion to make the raw material storage container be in a sealed state, making the inside of the raw material storage container have the treatment gas atmosphere formed by gasifying the liquid raw material by the vacuum pressure within the raw material storage container, exhausting the chamber to make the chamber have a predetermined vacuum pressure in a state where the target substrate is received in the chamber, stopping the exhaustion to make the inside of the chamber be in a sealed state, opening the opening/closing valve to introduce the treatment gas from the raw material storage container to the chamber, and closing the opening/closing valve when the inside pressure of the chamber reaches a treatment pressure that is higher than the vacuum pressure and lower than a vapor pressure of the liquid raw material to make the chamber have the treatment gas atmosphere of the treatment pressure. | 03-04-2010 |
20140234058 | SUBSTRATE TRANSFER DEVICE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE ACCOMMODATION METHOD - A substrate can be appropriately accommodated in a cassette. A substrate transfer device includes a substrate transfer unit that delivers the substrate with respect to the cassette configured to accommodate the substrate; a detection unit that detects the substrate accommodated in the cassette; and a control device than controls the substrate transfer unit. Further, the control device includes a transfer control unit configured to control the substrate transfer unit to accommodate the substrate at a predetermined target accommodation position; a determination unit configured to determine an actual accommodation position for the substrate based on a detection result of the detection unit after the detection unit detects the substrate accommodated in the cassette; and a correction unit configured to correct a predetermined target accommodation position as an accommodation position for another substrate based on a difference between the actual accommodation position and the target accommodation position for the substrate. | 08-21-2014 |
Akira Murata, Koshi JP
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20110311340 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM - A substrate processing apparatus includes a substrate transit table configured to mount thereon a plurality of substrates; a substrate processing chamber configured to process the substrate one by one; a substrate transfer device capable of loading the substrate into the substrate processing chamber from the substrate transit table and unloading the substrate from the substrate processing chamber to the substrate transit table; and N number of (N is an integer equal to or larger than 3) substrate holding devices provided at the substrate transfer device and configured to hold the substrates one by one. Here, a multiplicity of (2 to N−1 number of) substrates are concurrently held by 2 to N−1 number of substrate holding devices among the N number of substrate holding devices and one substrate is loaded into the substrate processing chamber. | 12-22-2011 |
Akira Murata, Koshi-Shi JP
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20120148378 | SUBSTRATE TRANSFER APPARATUS, SUBSTRATE PROCESS SYSTEM, AND SUBSTRATE TRANSFER METHOD - A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount. | 06-14-2012 |
Akira Murata, Hitachi-Shi, Ibaraki JP
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20130182811 | Method of Monitoring Reactor Bottom Area, Reactor Bottom Area Monitoring Apparatus and Nuclear Reactor - An ultrasonic sensor has a piezo-electric element attached at an end surface outside a reactor pressure vessel (RPV) of a sensor leading edge portion. The sensor leading edge portion passes through a bottom head of the RPV and is installed on the bottom head. Ultrasonic waves generated by the piezo-electric element are propagated to the sensor leading edge portion and are propagated to reactor water in the RPV from the sensor leading edge portion. When water surface of the reactor water in the RPV exists below a core support plate, the ultrasonic waves propagated inside the reactor water are reflected on the water surface. Ultrasonic waves reflected on the water surface are propagated into the reactor water, enter the sensor leading edge portion, and are received by the piezo-electric element. Using the ultrasonic waves received by the piezo-electric element, the water level in the RPV is obtained. | 07-18-2013 |
Akira Murata, Hitachi JP
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20130174637 | Ultrasonic Reactor Water Level Measuring Device and Evaluation Method - An ultrasonic reactor water level measuring device and an evaluation method are provided and prevent a reduction in the measurement accuracy of a water level that is in a wide measurement range. The ultrasonic reactor water level measuring device includes an upper tube extending from a gas phase portion in a reactor, a lower tube extending from a liquid phase portion in the reactor, measurement tubes connected to each other and arranged at multiple stages between the upper tube and the lower tube, and units for generating and receiving ultrasonic waves, the units being arranged at bottom portions of the measurement tubes. The ultrasonic reactor water level measuring device measures levels of water within the measurement tubes and calculates a water level within the reactor from the sum of the measured water levels, the sum excluding an overlapped part of the measurement tubes. | 07-11-2013 |
20130177122 | Reactor Water-Level/Temperature Measurement Apparatus - A reactor water-level/temperature measurement apparatus is disclosed that includes an in-core instrumentation tube inserted into an in-core instrumentation housing and an in-core instrumentation guide tube, a plurality of water-level/temperature detection sensors provided in the tube, a temperature measurement device measuring the temperature of a thermocouple included in each of the sensors, a heater control device for controlling a current flowing to a heater wire included in each of the sensors, a storage device used for storing a threshold-value table, and a water atmosphere and a sensor failure and a water-level/temperature/failure determination device. | 07-11-2013 |
Akira Murata, Sakura-Shi JP
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20130084051 | OPTICAL FIBER CORE - An optical fiber core having a primary layer and a secondary layer, which are laminated on a bare optical fiber. The primary layer is formed by curing an ultraviolet-curable resin composition containing a first silane coupling agent, which can be incorporated into a resin skeleton, and a second silane coupling agent, which cannot be incorporated into a resin skeleton. The first silane coupling agent contains a compound having a methoxy group, and the second silane coupling agent contains a compound having an ethoxy group. | 04-04-2013 |
Akira Murata, Tokyo JP
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20140271228 | TURBINE BLADE - A turbine blade has hollowness, and is provided with a back-side wall of which a portion of the inner wall surface is exposed at the rear edge portion, with cooling air flown along the inner wall surface at the exposed region; and a recess provided in the inner wall surface at the exposed region. The contour of the recess ( | 09-18-2014 |