METHOD FOR FORMING A SELF-ALIGNED ISOLATION STRUCTURE UTILIZING SIDEWALL SPACERS AS AN ETCH MASK AND REMAINING AS A PORTION OF THE ISOLATION STRUCTURE - diagram, schematic, and image 10
Back to METHOD FOR FORMING A SELF-ALIGNED ISOLATION STRUCTURE UTILIZING SIDEWALL SPACERS AS AN ETCH MASK AND REMAINING AS A PORTION OF THE ISOLATION STRUCTURE , All Patents .