Class / Patent application number | Description | Number of patent applications / Date published |
315108000 | CONFINED GAS OR VAPOR-TYPE LOAD DEVICE WITH PRESSURE REGULATING MEANS | 6 |
20120161631 | PLASMA LIGHT SOURCE SYSTEM - A plasma light source system includes a plurality of plasma light source | 06-28-2012 |
20130169156 | Field emission device - A field emission device is configured as a heat engine. | 07-04-2013 |
20150123539 | SYSTEMS AND METHODS FOR REGULATING PRESSURE OF A FILLED-IN GAS - A system for regulating a pressure of a filled-in gas is presented. The system includes a reservoir that stores a reservoir gas adsorbed in a sorbent material at a storage temperature, a gas-filled tube containing the filled-in gas, a controller configured to determine a pressure change required in the filled-in gas based upon signals representative of a pressure of the filled-in gas inside the gas-filled tube and a required pressure threshold, determine an updated temperature of the sorbent material based upon the pressure change required in the filled-in gas, and regulate the pressure of the filled-in gas by controlling the reservoir to change the storage temperature of the sorbent material to reach the updated temperature of the sorbent material. | 05-07-2015 |
20160126050 | VACUUM SWITCHING ASSEMBLY - There is provided a vacuum switching assembly for switching an AC or DC current. The vacuum switching assembly comprises a vacuum switch. The vacuum switch includes: first and second electrodes ( | 05-05-2016 |
315110000 | Valve controlled | 2 |
20130175927 | PLASMA TREATMENT APPARATUS USING LEAKAGE CURRENT TRANSFORMER - Provided is a plasma treatment apparatus using a leakage current transformer, the apparatus, including: a chamber which provides a closed space in which plasma is formed, and receives a treated sample in an inner part thereof; an exhaust unit for forming the inner part of the chamber in a vacuum state; plasma generation electrodes fixed in the chamber, positive and negative poles of which are installed to be opposed to each other; a variable power supply which is installed in an outer part of the chamber and supplies a power source to the plasma generation electrodes; and a leakage current transformer which is installed between the variable power supply and the plasma generation electrodes and adjusts voltage and current applied to the plasma generation electrodes. | 07-11-2013 |
20150145413 | PROCESS CHAMBER APPARATUS, SYSTEMS, AND METHODS FOR CONTROLLING A GAS FLOW PATTERN - Process chamber gas flow control apparatus may include, or be included in, a process chamber configured to process a substrate therein. The gas flow control apparatus may include a valve configured to seal an exhaust port in the process chamber. The valve may be moveable in the X, Y, and Z directions relative to the exhaust port to adjust a gas flow pattern (including, e.g., flow rate and/or flow uniformity) within the process chamber. Methods of adjusting a flow of a process gas within a process chamber are also provided, as are other aspects. | 05-28-2015 |