Class / Patent application number | Description | Number of patent applications / Date published |
257065000 | Non-single crystal, or recrystallized, material containing non-dopant additive, or alloy of semiconductor materials (e.g., Ge x Si 1- x, polycrystalline silicon with dangling bond modifier) | 10 |
20080303026 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE DEVICE - A semiconductor device and a method for manufacturing the same that includes forming a gate insulating film on a semiconductor substrate; and then forming a doped polysilicon layer on the gate insulating film; and then forming a first metal layer on the doped polysilicon layer; and then forming a metal silicide layer on the first metal layer. Therefore, current leakage can be reduced and generation of boron penetration can be prevented. Forming the doped polysilicon layer on the gate insulating film enables control of a work function while forming a silicide layer having a uniform surface interface is possible by depositing nickel (Ni) and polysilicon on the platinum first metal layer. | 12-11-2008 |
20090026459 | EPITAXIAL AND POLYCRYSTALLINE GROWTH OF SI1-X-YGEXCY AND SI1-YCY ALLOY LAYERS ON SI BY UHV-CVD - A method and apparatus for depositing single crystal, epitaxial films of silicon carbon and silicon germanium carbon on a plurality of substrates in a hot wall, isothermal UHV-CVD system is described. In particular, a multiple wafer low temperature growth technique in the range from 350° C. to 750° C. is described for incorporating carbon epitaxially in Si and SiGe films with very abrupt and well defined junctions, but without any associated oxygen background contamination. Preferably, these epitaxial SiC and SiGeC films are in-situ doped p- or n-type and with the presence of low concentration of carbon <10 | 01-29-2009 |
20090101909 | SEMICONDUCTOR PHOTODETECTORS - In one aspect, a method includes forming a pit in a top surface of a substrate by removing a portion of the substrate and growing a semiconductor material with a bottom surface on the pit, the semiconductor material different than the material of the substrate. The pit has a base recessed in the top surface of the substrate. In another aspect, a structure includes a substrate having a top surface, the substrate including at least one pit having a base lower than the top surface of the substrate, and a semiconductor material having a bottom surface formed on the base of the pit. | 04-23-2009 |
20110024762 | Method of Forming a Thin Film Transistor - A method of forming a thin film transistor relative to a substrate includes, a) providing a thin film transistor layer of polycrystalline material on a substrate, the polycrystalline material comprising grain boundaries; b) providing a fluorine containing layer adjacent the polycrystalline thin film layer; c) annealing the fluorine containing layer at a temperature and for a time period which in combination are effective to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries; and d) providing a transistor gate operatively adjacent the thin film transistor layer. The thin film transistor can be fabricated to be bottom gated or top gated. A buffering layer can be provided intermediate the thin film transistor layer and the fluorine containing layer, with the buffering layer being transmissive of fluorine from the fluorine containing layer during the annealing. Preferably, the annealing temperature is both sufficiently high to drive fluorine from the fluorine containing layer into the polycrystalline thin film layer and incorporate fluorine within the grain boundaries to passivate said grain boundaries, but sufficiently low to prevent chemical reaction of the fluorine containing layer with the polycrystalline thin film layer. | 02-03-2011 |
20110215333 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a method for manufacturing a semiconductor device, wherein an amorphous semiconductor film comprising a microcrystal is annealed using a microwave, to crystallize the amorphous semiconductor film comprising the microcrystal using the microcrystal as a nucleus. | 09-08-2011 |
20110248276 | THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ACTIVE LAYERS OF THE THIN FILM TRANSISTOR, AND DISPLAY DEVICE - A thin film transistor including a first polycrystalline semiconductor layer disposed on a substrate, a second polycrystalline semiconductor layer disposed on the first polycrystalline semiconductor layer, and metal catalysts configured to adjoin the first polycrystalline semiconductor layer and spaced apart from one another at specific intervals. | 10-13-2011 |
20120025195 | Confined Lateral Growth of Crystalline Material - In a structure for crystalline material growth, there is provided a lower growth confinement layer and an upper growth confinement layer that is disposed above and vertically separated from the lower growth confinement layer. A lateral growth channel is provided between the upper and lower growth confinement layers, and is characterized by a height that is defined by the vertical separation between the upper and lower growth confinement layers. A growth seed is disposed at a site in the lateral growth channel for initiating crystalline material growth in the channel. A growth channel outlet is included for providing formed crystalline material from the growth channel. With this growth confinement structure, crystalline material can be grown from the growth seed to the lateral growth channel outlet. | 02-02-2012 |
20120037914 | HETEROJUNCTION BIOPOLAR TRANSISTOR AND MANUFACTURING METHOD - A method of manufacturing a heterojunction bipolar transistor, including providing a substrate comprising an active region bordered by shallow trench insulation regions; depositing a stack of a dielectric layer and a polysilicon layer over the substrate; forming a base window in the stack, the base window extending over the active region and part of the shallow trench insulation regions, the base window having a trench extending vertically between the active region and one of the shallow trench insulation regions; growing an epitaxial base material inside the base window; forming a spacer on the exposed side walls of the base material; and filling the base window with an emitter material. A HBT manufactured in this manner and an IC including such an HBT. | 02-16-2012 |
20120235151 | HORIZONTAL POLYSILICON-GERMANIUM HETEROJUNCTION BIPOLAR TRANSISTOR - A horizontal heterojunction bipolar transistor (HBT) includes doped single crystalline Ge having a doping of the first conductivity type as the base having an energy bandgap of about 0.66 eV, and doped polysilicon having a doping of a second conductivity type as a wide-gap-emitter having an energy bandgap of about 1.12 eV. In one embodiment, doped polysilicon having a doping of the second conductivity type is employed as the collector. In other embodiments, a single crystalline Ge having a doping of the second conductivity type is employed as the collector. In such embodiments, because the base and the collector include the same semiconductor material, i.e., Ge, having the same lattice constant, there is no lattice mismatch issue between the collector and the base. In both embodiments, because the emitter is polycrystalline and the base is single crystalline, there is no lattice mismatch issue between the base and the emitter. | 09-20-2012 |
20140110717 | STRUCTURE INCLUDING GALLIUM NITRIDE SUBSTRATE AND METHOD OF MANUFACTURING THE GALLIUM NITRIDE SUBSTRATE - A structure includes a silicon substrate, a plurality of silicon rods on the silicon substrate, a silicon layer on the plurality of silicon rods, and a GaN substrate on the silicon layer. | 04-24-2014 |