Entries |
Document | Title | Date |
20080203054 | PLANARIZATION OF A LAYER OVER A CAVITY - A method for fabricating a micro structure includes disposing a sacrificial material in a recess formed in a lower layer and forming a layer of compensatory material on the sacrificial material in the recess. The compensatory material is higher than the upper surface of the lower layer. A first portion of the compensatory material is removed to form a substantially flat surface on the sacrificial material. The substantially flat surface is substantially co-planar with the upper surface of the lower layer. An upper layer is formed on the lower layer and the substantially flat surface. | 08-28-2008 |
20080223821 | Slotted guide structure - The invention relates to a method for producing a slotted guide, in which:
| 09-18-2008 |
20080223822 | FIBER COATING PROCESSING AND SLITTING FOR NON-CONFINED LIGHT LEAKAGE - An optical fiber and methods of processing and manufacturing an optical fiber comprising a core, a cladding and a coating covering a segment of the cladding proximate to an end of the optical fiber are presented where patterned apertures are provided in the coating such that a portion of light propagating in the cladding escapes through the patterned apertures of the coating. The patterned apertures allow non-confined light to escape from the cladding in the coating region to provide reduced absorption of the non-confined light by the coating. | 09-18-2008 |
20080251497 | Method of fabricating hollow waveguide having cyclic geometric structure - A waveguide has a hollow center. The waveguide has dielectric tubes which have a geometric arrangement, like a triangle-lattice arrangement. A laser transmitted in the waveguide is confined and is emitted out with a narrow expending angle. Hence, the laser is emitted straightly forwarded and has a low power loss. The present invention is suitable for using in a high-power laser and obtaining a directive microwave. | 10-16-2008 |
20080257860 | METHOD FOR MICROSTRUCTURING FLAT GLASS SUBSTRATES - In the method for microstructuring flat glass substrates a substrate surface of a glass substrate is coated with at least one structured mask layer and subsequently exposed to a chemically reactive ion etching process (RIE) with at least one chemical etching gas. In order to provide the same or a higher quality etching and etching rate even for economical types of glass the chemical etching gas is mixed with at least one noble gas, so that the proportion of sputtering etching in the ion etching process is significantly increased. | 10-23-2008 |
20080283492 | METHOD FOR MANUFACTURING LIGHT REFLECTING METAL WALL - A method for manufacturing a light reflecting metal wall including a step (a) forming a cavity structure on a metal plate on which back surface a substrate is laminated, the cavity structure including on its side wall a light reflecting wall, the step (a) including the steps of (b) forming a first mask on a surface of the metal plate, the first mask having a mask opening portion corresponding to an opening portion of the cavity structure, and (c) forming the light reflecting wall on a side wall of the metal plate by carrying out wet etching with respect to the metal plate with the first mask, in the step (c), in the middle of the wet etching, the first mask being bent by press working along the light reflecting wall formed by the wet etching. As a result, the light reflecting metal wall is stably formed by securing both (i) an area of an LED chip mounting surface and (ii) a thickness of the light reflecting metal wall even if a packaged light-emitting element has a narrow lateral width of its short side. | 11-20-2008 |
20080314869 | Methods for fabricating spatial light modulators with hidden comb actuators - Described are methods for fabricating Micro-Electro-Mechanical Systems (MEMS) actuators with hidden combs and hinges. The ability to hide the combs renders the actuators useful in digital micro-mirror devices. Comb actuators provide increased torque, which facilitates the use of stiffer, less fragile hinge structures. Also important, comb actuators do not require mechanical stops to define stable states, and thus avoid problems associated with physical contact. The actuators are infinitely variable through a range of angles. | 12-25-2008 |
20090039054 | ETCHING APPARATUS OF GLASS SUBSTRATE FOR FLAT PANEL DISPLAY AND METHOD OF ECTCHING GLASS SUBSTRATE FOR FLAT PANEL DISPLAY USING THE SAME - An etching apparatus of a glass substrate for a flat panel display includes an etching chamber configured to receive a jig, glass substrates disposed on the jig, a holding member connected to the jig to hold the glass substrates, a transferring line connected to the jig to transfer the jig into the etching chamber, and a spray member which sprays an etchant onto surfaces of the glass substrates. A spray pressure of the etchant is equal to or greater than approximately 0.1 kg/cm | 02-12-2009 |
20090045163 | METHOD FOR OBTAINING A TRANSPARENT CONDUCTIVE FILM - A method for obtaining a transparent conductive film comprises the steps of providing a transparent substrate, depositing a conductive film, of a thickness not greater than 5 μm, on the transparent substrate, and removing the entire thickness of conductive film from portions of the surface of the substrate in such a way that the residual parts of the conductive film on the substrate define a pattern formed by lines of a width of between 1 nm and 2 μm, with distances between the adjacent lines of between 10 nm and 2 μm, said pattern being predetermined in such a way as to obtain a ratio between full spaces and empty spaces corresponding to a desired degree of optical transmittance for the conductive film. | 02-19-2009 |
20090107951 | Method of packaging an LED array module - A method for packaging an LED array module includes: forming at least one concave groove on a drive IC structure; arranging at least one LED array in the at least one concave groove; solidifying a plurality of liquid conductive materials to form a plurality of conductive elements that is electrically connected between the drive IC structure and the at least one LED array via a printing, a coating, a stamping, or a stencil printing process; disposing the drive IC structure on a PCB with at least one input/output pad; and then forming a conductive structure that is electrically connected between the drive IC structure and the at least one input/output pad. | 04-30-2009 |
20090139960 | METHOD OF FABRICATING AN APPARATUS OF FABRICATING AN FLAT PANEL DISPLAY DEVICE AND METHOD FOR FABRICATING FLAT PANEL DISPLAY DEVICE - A method of fabricating an apparatus of fabricating a flat panel display device and method of fabricating flat panel display device is disclosed, which enables simplification of process by performing a patterning process without a photo process, the method for fabricating an apparatus of fabricating flat panel display device comprising, preparing a master mold including a thin film pattern, coating a liquid-type molding material including oligomer on the master mold, forming a soft mold including a groove provided with a pattern in a shape corresponding to the thin film pattern of the master mold and adhering the soft mold to a mold support plate, wherein the soft mold is adhered to the mold support plate by a covalent bonding in the interface between the oligomer and the mold support plate. | 06-04-2009 |
20090206052 | Method for manufacturing a mirror device by means of a plurality of sacrificial layers - A method for manufacturing a device comprising an elastic member on a substrate includes steps of: forming a sacrificial layer by forming a plurality of sacrificial sub-layers on the substrate; forming a plate member in or on the sacrificial layers connected to the substrate and substantially parallel to a top surface of the substrate; and removing the sacrificial sub-layers after forming the plate member by removing the sacrificial sub-layers in an order different from the reverse order of forming the sacrificial sub-layers. | 08-20-2009 |
20090230086 | OPTICAL WAVEGUIDE SUBSTRATE MANUFACTURING METHOD - A voltage is applied on an interdigitated electrode provided on one main face | 09-17-2009 |
20090236308 | OPTICAL RECORDING AND REPRODUCING MEDIUM SUBSTRATE, MANUFACTURING METHOD OF OPTICAL RECORDING AND REPRODUCING MEDIUM MANUFACTURING STAMPER AND OPTICAL RECORDING AND REPRODUCING MEDIUM MANUFACTURING STAMPER - In an optical recording and reproducing medium having a groove | 09-24-2009 |
20090242510 | PHOTOELECTRIC COUPLING ASSEMBLY AND MANUFACTURING METHOD THEREOF - A photoelectric coupling assembly and manufacturing method thereof enabling a three dimensional electrical wiring pattern is provided. The assembly includes a photoelectric conversion unit equipped with a photoelectric conversion element and a molded article. The molded article has a hole configured and arranged to have an optical fiber inserted there-through such that a distal end of the fiber faces an active layer of the conversion element, a front surface on which the conversion unit is mounted, and a side surface being contiguous to the front surface. The lead being insert molded into the molded article has a first surface being exposed at the front surface and electrically connected to the conversion element, a second surface being exposed at the side surface, and an engaging portion having a width increasing in a direction away from the front surface. At least a portion of the engaging portion is contained inside the resin forming the molded article. | 10-01-2009 |
20090261062 | CARRIER SUBSTRATE AND METHOD OF MANUFACTURING FLEXIBLE DISPLAY APPARATUS USING THE SAME - Disclosed are a carrier substrate which can be recycled and a method of manufacturing a flexible display apparatus using the same. The carrier substrate includes a rigid substrate, an adhesive layer, and a sacrificial layer. The adhesive layer is formed on the rigid substrate and has an adhesive property. The sacrificial layer is interposed between the rigid substrate and the adhesive layer. The sacrificial layer includes a material selected from the group consisting of a transparent metal oxide, an alkaline water-soluble polymer compound, and an acid water-soluble polymer compound. | 10-22-2009 |
20090261063 | Method for Producing a Nanostructure on a Plastic Surface - A nanostructure is produced at a surface of a substrate composed of a plastic by means of a plasma etching process. A thin layer is applied to the plastic substrate and the plasma etching process is subsequently carried out. | 10-22-2009 |
20090272716 | Process for Preparing an Optical Preform - A method of preparing an optical preform includes the steps of: a) etching an optical preform to remove a portion of an oxide material deposited on the preform by using a gas comprising an etchant gas containing fluorine at a sufficient temperature and gas concentration to create a redeposited germanium containing compounds contamination such as GeO | 11-05-2009 |
20090308839 | OPTICAL INTEGRATED DEVICE MANUFACTURING PROCESS - The invention relates to a process for manufacturing an integrated optical device. The method involves forming a silicon dioxide multilayer structure on a silicon substrate containing, in a first region a core layer of a waveguide of the optical device. The core includes an electromagnetic radiation inlet/outlet A trench in a second region of the multilayer structure adjacent said first region is formed by a an anisotropic etching, the trench including side walls and a bottom wall spaced from the Substrate. The method further involves forming a coating layer of the side walls and the bottom wall of the trench; defining an opening in the bottom wall by at least partially removing the coating layer in order to expose the lower silicon dioxide of the multilayer structure; performing an isotropic etch through said opening in order to remove, starting from the exposed silicon dioxide, the multilayer structure silicon dioxide until forming a recess in the multilayer structure having a first wall at least one essentially planar portion inclined relative to the substrate. Such inclined portion extends at least partially in the first region, and includes the inlet/outlet port. | 12-17-2009 |
20100025364 | Method for Manufacturing Multiple Layers of Waveguides - A method for manufacturing multiple layers of waveguides is disclosed. Initially, a first cladding layer is deposited on a substrate, a first inner cladding layer is then deposited on the first cladding layer, and a first waveguide material is deposited on the first inner cladding layer. The first inner cladding layer and the first waveguide material are then selectively etched to form a first waveguide layer. Next, a second inner cladding layer followed by a second cladding layer are deposited on the first waveguide layer. The second inner cladding layer and the second cladding layer are removed by using a chemical-mechanical polishing process selective to the first waveguide material. A third inner cladding layer followed by a second waveguide material are deposited on the first waveguide material. The third inner cladding layer and the second waveguide material are then selectively etched to form a second waveguide layer. Finally, a fourth inner cladding layer followed by a third cladding layer are deposited on the second waveguide layer. | 02-04-2010 |
20100084375 | METHOD OF PRODUCING A REFLECTIVE MASK - A method of producing a reflective mask is carried out by the use of a reflective mask blank which has a substrate, a multilayer reflective film formed on the substrate to reflect exposure light, a protective film formed on the multilayer reflective film, a buffer film formed on the protective film, and an absorber film formed on the buffer film to absorb the exposure light. The protective film is made of a ruthenium compound containing Ru and Nb. The method includes a step of patterning the buffer film by dry etching performed by the use of an etching gas containing oxygen. | 04-08-2010 |
20100096359 | METHOD FOR FORMING PHASE GRATING - A method for forming a phase grating is disclosed. First, a substrate is provided. Second, a first dielectric layer with a tapered recess or bulge is formed on the substrate. Later, a second dielectric layer is formed to fill the tapered recess and to cover the first dielectric layer. Afterwards, the second dielectric layer is selectively etched to form the phase grating. The phase grating includes a column and multiple rings. The column and multiple rings are concentric and the multiple rings are disposed on the tapered side so that the height of each ring is different. | 04-22-2010 |
20100181287 | BACKLIGHT HAVING ALL-IN-ONE TYPE LIGHT GUIDE PLATE AND METHOD OF MANUFACTURING ALL-IN-ONE TYPE LIGHT GUIDE PLATE - Provided is an all-in-one type light guide plate including a plurality of prism-shaped structures that are integrally formed on the all-in-one light guide plate and which totally internally reflect light incident from a light source and emit the totally internally reflected light. | 07-22-2010 |
20100213164 | METHOD FOR THE TRANSPARENT COATING OF A SUBSTRATE WITH PLASMA AT ATMOSPHERIC PRESSURE - The invention relates to a method for improving the properties of coatings on transparent materials by plasma treatment, preferably by an atmospheric pressure plasma. | 08-26-2010 |
20100224589 | METHOD FOR ETCHING GLASS SUBSTRATE - The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 μm in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher. | 09-09-2010 |
20100308013 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - A liquid crystal display device includes: an active matrix substrate including a glass substrate; a counter substrate which is arranged to face the active matrix substrate and includes a glass substrate which is thinner than the glass substrate of the active matrix substrate; and a display medium layer which is provided between the active matrix substrate and the counter substrate. The rate at which the glass substrate of the active matrix substrate is etched by an etching solution is lower than the rate at which the glass substrate of the counter substrate is etched by the etching solution. | 12-09-2010 |
20100326954 | METHOD OF ETCHING A MULTI-LAYER - A method of etching a multi-layer is provided. The multi-layer includes an aluminum layer disposed on a semiconductor substrate and an anti-reflection coating layer disposed on the aluminum layer. The method includes: performing a first etching process to etch the anti-reflection coating layer by providing a first etching gas, wherein the first etching gas includes a chlorine-containing substance; then performing a second etching process to etch the aluminum layer by providing a second etching gas, wherein the second etching gas does not include a chlorine-containing compound. | 12-30-2010 |
20100326955 | Multi-Layer Optical Filter Designs And Associated Systems - A method for designing a first optical filter, exhibiting a first filter performance satisfying a first preset criterion, and a second optical filter, exhibiting a second filter performance satisfying a second preset criterion, includes providing initial first and second filter designs for the first and second optical filters, respectively, as first and second ordered stacks of layers, respectively. A pair of layers, including a first layer, characterized by a first thickness, and a second layer, characterized by a second thickness, is selected from the first and second ordered stacks of layers. The first thickness is constrained to a first constrained thickness that is a positive integer multiple of the second thickness to yield a constrained first filter design. A predicted performance of the constrained first filter design is determined and compared with the first preset criterion for one of accepting and rejecting the constrained first filter design. | 12-30-2010 |
20110000881 | Method of manufacturing an optical integrated nanospectrometer - A planar nanospectrometer is manufactured as a single chip that uses diffraction structures, which are combinations of numerous nano-features placed in a predetermined configuration. The manufacturing method consists of creating a two-dimensional analog-generating function A(x,y), binarizing the two-dimensional analog-generating function A(x,y) by creating a binary function B(x,y), simplifying the binary function B(x,y) by assigning the value of 1 to areas exceeding a predetermined threshold and 0 to all the remaining areas in order to convert the binary function B(x,y) to discrete generating function C(x,y), and lithographically fabricating the aforementioned binary features by etching as a discrete generating function C(x,y) to a calculated depth on a planar waveguide. | 01-06-2011 |
20110011831 | METHOD FOR MANUFACTURING DIFFRACTIVE OPTICAL ELEMENT - There is provided a method for manufacturing a diffractive optical element that can suppress the generation of heat from the inside of an insulative substrate and stabilize an etching rate. A method for manufacturing a diffractive optical element composed of an insulative substrate whose surface has a bumpy structure includes a selecting step of selecting an insulative substrate having an electrical resistivity equal to or higher than a certain value by measuring electrical resistivity of insulative substrates; and an etching step of forming a bumpy structure by dry etching in a surface of the insulative substrate selected in the selecting step. | 01-20-2011 |
20110031211 | Metal Trace Fabrication For Optical Element - A system may include an optical element including a surface defining a recess, conductive material disposed within the recess, and a solder mask disposed over a portion of the conductive material. The solder mask may define an aperture through which light from the optical element may pass. Some aspects provide creation of an optical element including a surface defining a recess, deposition of conductive material on the surface such that a portion of the deposited conductive material is disposed within the recess, and substantial planarization of the surface to expose the portion of the conductive material disposed within the recess. | 02-10-2011 |
20110062111 | METHOD OF FABRICATING MICROSCALE OPTICAL STRUCTURES - A method for manufacturing a microscale optical structure from a wafer, including: preparing the wafer with coatings of desired optical properties by depositing the coatings on an optically finished surface of the wafer; mounting the wafer on a supporting base having a releasable medium, with the optically finished surface adjacent the supporting base to protect the optically finished surface; forming additional surfaces of the optical structure at a desired angle and depth using a grinding blade having a cutting face at the angle, the grinding blade being configured to rotate about an axis; and polishing the additional surfaces of the optical structure by introducing a polishing material onto the wafer and using a polishing means to smooth the additional surfaces. | 03-17-2011 |
20110084047 | Methods For Fabrication Of Large Core Hollow Waveguides - Methods for making a photonic guiding system for directing coherent light are disclosed. The methods include forming a channel in a host layer using at least one process of sawing, laser ablation, laser direct write of a photoresist, photo-structuring, and etching. A layer of highly reflective material is applied to substantially cover an interior of the channel. A cover having a layer of highly reflective material is coupled over the channel to form a large core hollow waveguide. | 04-14-2011 |
20110114598 | OPTICAL ELEMENT AND METHOD OF MANUFACTURING OPTICAL ELEMENT WITH EACH OF FIRST AND SECOND LAYERS HAVING A REPETITION STRUCTURE - An optical element having a three-dimensional structure which can function in a visible range and can improve adherence at a structural interface of the element, and a method of manufacturing the optical element. The optical element includes a substrate, and at least a first layer and a second layer on the substrate are manufactured such that each of the first layer and the second layer has a repetition structure of spaces and structural parts at a pitch equal to or less than a wavelength of visible light, and at an interface between the first layer and the second layer, overlapped structures are provided in which the repetition structure of the first layer and the repetition structure of the second layer overlap in a stack direction of the layers. | 05-19-2011 |
20110120970 | NANOPOROUS ANTIREFLECTION THIN FILM AND METHOD OF PRODUCING THE SAME USING BLOCK COPOLYMERS - Disclosed herein is a method of producing an antireflection thin film using a block copolymer and an antireflection thin film prepared by the method. Specifically, the present invention relates to a method of producing a nanoporous antireflection film by spin-coating using a block copolymer solution and subsequent processing and a preparation by the method. The antireflection film of the present invention is prepared by coating a substrate with a block copolymer and selectively removing at least one block in the coated block copolymer to produce a nanoporous thin film with a pore size of 5 to 100 nm. When the thin film is applied to a substrate, an antireflection substrate which has a very low reflectance within a broad range of wavelength can be prepared. | 05-26-2011 |
20110127235 | SELF-ALIGNED SPATIAL FREQUENCY DOUBLING - In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p | 06-02-2011 |
20110147344 | DEVICES AND METHODS FOR PROVIDING STIMULATED RAMAN LASING - Devices and methods for providing stimulated Raman lasing are provided. In some embodiments, devices include a photonic crystal that includes a layer of silicon having a lattice of holes and a linear defect that forms a waveguide configured to receive pump light and output Stokes light through Raman scattering, wherein the thickness of the layer of silicon, the spacing of the lattice of holes, and the size of the holes are dimensioned to provide Raman lasing. In some embodiments, methods include forming a layer of silicon, and etching the layer of silicon to form a lattice of holes with a linear defect that forms a waveguide configured to receive pump light and output Stokes light through Raman scattering, wherein the thickness of the layer of silicon, the spacing of the lattice of holes, and the size of the holes are dimensioned to provide Raman lasing. | 06-23-2011 |
20110168667 | Anti-Reflective Surfaces And Methods For Making The Same - In an embodiment, a method of forming an anti-reflective surface includes providing conditions for a plasma, and exposing a surface of an organic-inorganic optical material to the plasma. A treated optical material formed thereby exhibits lower reflectivity relative to the material prior to the step of exposing, forming the anti-reflective surface. In an embodiment, a method of forming an anti-reflective surface includes depositing an etch mask on a surface of an optical material, providing plasma conditions for a plasma such that the plasma etches the optical material preferentially over the etch mask, and exposing the etch mask to the plasma using the plasma conditions to form a treated optical material having a plasma-affected zone. The optical material exhibits lower reflectivity relative to said optical material prior to the step of exposing, and forms the anti-reflective surface. | 07-14-2011 |
20110233168 | OPTOELECTRONIC COMPONENT HAVING A LUMINESCENCE CONVERSION LAYER - Methods of producing an optoelectronic component having an active layer that emits electromagnetic radiation when the component is on and a luminescence conversion layer disposed after said active layer in a radiation direction of said electromagnetic radiation, the luminescence conversion layer is followed in the radiation direction by a light-scattering translucent layer include etching or sand blasting to form a light-scattering surface structure on the light-scattering translucent layer. The luminescence conversion layer preferably appears white owing to the light-scattering translucent layer disposed after it. | 09-29-2011 |
20110259850 | PROCESS FOR FORMING A LIGHT BEAM PATH IN A DIELECTRIC MIRROR - An optical mirror element includes an optically transmissive element having a first surface and a second surface, and a reflective coating layer on the first surface that defines a mirror surface. A first portion of the first surface does not include the reflective coating layer such that the first portion defines an optically transmissive window in the mirror surface. Q method of forming an optical mirror element having a window portion includes providing an optical element, masking a first portion of a first surface of the optical element, and thereafter applying a reflective coating to the first surface so as to define a reflective surface, wherein the masked portion defines a transmissive region in the reflective surface. The exposed portion of the first surface may be coated with an anti-reflective coating, either before or after the reflective coating is applied. | 10-27-2011 |
20110303637 | METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR INCLUDING WAVEGUIDE AND PLASMON GENERATOR - A near-field light generator includes: a waveguide; a clad layer having a penetrating opening and disposed on the waveguide; a plasmon generator accommodated in the opening; and a dielectric film interposed between the plasmon generator and each of the waveguide and the clad layer. In a method of manufacturing the near-field light generator, an initial clad layer is initially formed on the waveguide, and then the initial clad layer is taper-etched by RIE to form a recess that does not reach the top surface of the waveguide. Subsequently, the recess is etched by wet etching until the top surface of the waveguide is exposed in part. Next, the dielectric film is formed in the opening, and the plasmon generator is formed on the dielectric film. | 12-15-2011 |
20110303638 | Method for Fabricating a Micromirror - A method for fabricating a micromirror is disclosed. A set of coarse features is formed in a low-temperature oxide (LTO) layer deposited on a front side of a wafer. A set of fine features is then formed in a photosensitive material layer deposited on top of the LTO layer. After removing a portion of the LTO layer to align the width of the coarse features with the width of the fine features, the first silicon dioxide layer and the first and second silicon device layers are etched to form stator comb fingers and rotor comb fingers accordingly. Finally, a portion of the substrate on a back side of the wafer is removed, and the silicon dioxide layers are removed from the front and back sides of the wafer to form a rotatable mirror. | 12-15-2011 |
20120000886 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - The substrate processing apparatus includes a process chamber which accommodates a wafer and performs a plasma etching process on the wafer, an exhaust chamber which communicates with the process chamber, an exhaust plate which divides the process chamber from the exhaust chamber and prevents plasma inside the process chamber from leaking into the exhaust chamber, and an upper electrode plate arranged inside the exhaust chamber, wherein the exhaust plate includes a plurality of through holes, and the upper electrode plate includes a plurality of through holes, is capable of contacting the exhaust plate in parallel, and is capable of being spaced apart from the exhaust plate. | 01-05-2012 |
20120031875 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS - A plasma processing method includes: etching an anti reflection coating film with plasma generated from an etching gas by using a resist film that is patterned as a mask, in a deposited film in which an Si-ARC film constituting the anti reflection coating film is formed on a layer to be etched and the ArF resist film is formed on the anti reflection coating film; and modifying the ArF resist film with plasma generated from a modifying gas including a CF | 02-09-2012 |
20120085732 | Layered Dimmer System - A dimmer wheel which is formed to absorb large amounts of light and to disperse the light that is absorbed. The dimmer wheel has a bottom surface that is irregular, and a reflective material in that bottom surface to scatter the light. A light absorbing material also receives some of the light. | 04-12-2012 |
20120125887 | METHOD FOR MANUFACTURING LIGHT-ABSORBING SUBSTRATE AND METHOD FOR MANUFACTURING MOLD FOR MAKING SAME - A method for manufacturing a light-absorbing substrate having a surface with depressions and projections comprises a first step of irradiating a substrate with a laser light so as to form a plurality of modified regions arranged two-dimensionally along a surface of the substrate within the substrate and cause at least one of each modified region and a fracture generated from the modified region to reach the surface of the substrate and a second step of etching the surface of the substrate after the first step so as to form depressions and projections on the surface of the substrate. | 05-24-2012 |
20120138568 | LOW-COST PASSIVE OPTICAL WAVEGUIDE USING SI SUBSTRATE - A passive optical waveguide is solely built on a Si substrate while still maintaining high optical quality. Two side-by-side diamond shaped cavities may be etched into the Si wafer and oxide grown on the inner walls of the cavities until the oxide meets at opposing inner vertices of the diamond shaped cavities. An optical waveguide is formed by the inverted, generally triangular cross-sectional, portion of silicon remaining between the top surface of the wafer and the opposing inner vertices. | 06-07-2012 |
20120152892 | METHOD FOR MANUFACTURING OPTICAL ELEMENT - Provided is a method for manufacturing an optical element, the method including: an electrode forming step of forming metal films on the plus z face and minus z face of a ferroelectric substrate to fabricate electrodes; a periodic electrode forming step of forming the metal film on the plus z face into a periodic electrode; a polarization reversal forming step of applying a voltage between the periodic electrode and the electrode on the minus z face to form polarization-reversed regions in the ferroelectric substrate; a surface treating step of removing the electrode, the periodic electrode, and surface layers on the plus z face and minus z face of the ferroelectric substrate; and an annealing step of applying predetermined heat to the ferroelectric substrate having the surface layers removed therefrom. | 06-21-2012 |
20120187081 | Method for Optimizing the Spectral Performance of Scintillator Crystals - The invention provides a method for optimizing the spectroscopy performance of a spectroscopy scintillator by surrounding the scintillator by a reflector material, performing a scan or more sectors measuring resolution and light output at three or more axial locations on the crystal, where at least one location is close to the PMT or below the crystal (near the PMT) at least one location is at the end away from the PMT of the scintillator), and adjusting the surface finish of the crystal and/or the reflector to obtain equal light output and optimal resolution over the length and different azimuth of the crystal. | 07-26-2012 |
20120217219 | REFERENCE WAFER FOR CALIBRATION AND METHOD FOR FABRICATING THE SAME - A reference wafer maintains laser accuracy and calibrates a camera and a laser of a semiconductor equipment. The reference wafer includes a first anti-reflection layer, an adhesive layer, a light absorption layer and a second anti-reflection layer that are stacked over a substrate, a light reflection layer formed over the second anti-reflection layer, and a protection layer formed over the light reflection layer. | 08-30-2012 |
20120228259 | METHODS OF MANUFACTURING OPTICAL DEVICES - Methods of manufacturing optical devices are disclosed. The method includes providing a structure-forming fiber bonded to at least one other optical component, the structure-forming fiber having a preferentially-etchable portion including at least one radial etching boundary and at least one axial etching boundary, and etching the preferentially-etchable portion to the radial and axial etching boundaries to produce a precise optical structure. The preferentially-etchable portion may be removed through one or more radial openings in the structure-forming fiber. Numerous other aspects are provided. | 09-13-2012 |
20120228260 | PROCESS FOR ETCHING TRENCHES IN AN INTEGRATED OPTICAL DEVICE - The described process allows trenches to be etched in a structure comprising a support substrate and a multilayer, formed on the substrate, for the definition of wave guides of an integrated optical device and comprises a selective plasma attack in the multilayer through a masking structure that leaves uncovered areas of the multilayer corresponding to the trenches to be etched. Such a masking structure is obtained by forming a mask of metallic material on the multilayer that leaves uncovered the areas corresponding to the trenches to be etched and forming a mask of non-metallic material, for example photoresist, on it that leaves uncovered regions comprising at least part of the areas and an edge portion of the mask of metallic material. | 09-13-2012 |
20120267338 | METHOD FOR MANUFACTURING OPTICAL COUPLING ELEMENT, OPTICAL TRANSMISSION SUBSTRATE, OPTICAL COUPLING COMPONENT, COUPLING METHOD, AND OPTICAL INTERCONNECT SYSTEM - An optical coupling structure that interfaces between optical devices mounted on a substrate and optical waveguides formed in the substrate. A manufacturing method includes preparing a wafer formed on an inorganic solid material on a dicing tape and cutting the back surface of the wafer to form substantially angled portions using a dicing blade having a point angle. The dicing tape is stripped from the wafer and the wafer is separated at the valleys between the substantially angled portions to obtain an optical coupling element. The obtained optical coupling element is a three-dimensional polyhedral light-reflecting member having a mirror surface corresponding to a surface of the wafer. The obtained optical coupling element is inserted into a trench that opens, substantially perpendicular to an optical waveguide of an optical transmission substrate, in the main surface of the optical transmission substrate to provide a structure for optical coupling with the outside. | 10-25-2012 |
20120305523 | Polarizer Devices and Processes of Manufacture - A simple and innovative process for manufacturing a high performance mechanical polarizing device is provided. The invention utilizes an inexpensive, high output production process where a transparent film substrate is coated with a non-transparent layer by deposition or other wet or dry method. Then a photoresist or a nano-imprint lithography process is used to overlay the non-transparent coated film with a pattern. The exposed non-transparent material is then removed by means of acid or base etching or the use of other mechanical or nano-technology removal methods. The photoresist is then removed and a protective layer may then be applied to the polarizer substrate. According to another embodiment, nano-imprinting techniques are used to prepare the polarizer substrate. The process may be automated in one or more embodiments, and lends itself to a high speed production manufacturing line, utilizing roll-to-roll, sheet fed or other methods of automated manufacturing. | 12-06-2012 |
20130037514 | METHODS FOR PRODUCING LIGHT-EMITTING BODY CONTAINING SILICON FINE PARTICLES AND LIGHT-EMITTING SILICON FINE PARTICLES - The present invention is a method for producing a light-emitting body containing silicon fine particles that emit visible light, comprising: a baking step of baking a mixture containing a silicon source and a carbon source in an inert atmosphere; a rapid cooling step of rapidly cooling a gas generated by baking the mixture to obtain a composite powder; and a removing step of removing a portion of the composite powder, wherein in the removing step, a portion of silicon monoxide and a portion of silicon dioxide are removed from the composite powder containing silicon fine particles, silicon monoxide, and silicon dioxide. | 02-14-2013 |
20130043210 | ION ETCHING OF GROWING InP NANOCRYSTALS USING MICROWAVE - High quantum yield InP nanocrystals are used in the bio-technology, bio-medical, and photovoltaic, specifically IV, III-V and III-VI nanocrystal technological applications. InP nanocrystals typically require post-generation HF treatment. Combining microwave methodologies with the presence of a fluorinated ionic liquid allows Fluorine ion etching without the hazards accompanying HF. Growing the InP nanocrystals in the presence of the ionic liquid allows in-situ etching to be achieved. The optimization of the PL QY is achieved by balancing growth and etching rates in the reaction. | 02-21-2013 |
20130056442 | OPTICAL WAVEGUIDE FABRICATION METHOD - The present invention relates to a method of manufacturing optical waveguide devices. The order of patterning/etch in the method is first a deeper etching then shallow etching. In some embodiments, the first etching forms a mesa and the second etching removes a portion of material that comprises the mesa. In addition, there can be a planarization step. The deeper trenches are desirably conducive to filling. The method may use a cross-lithography method to reduce alignment errors between multiple patterning/etching steps. The method may use an oxidation and stripping off process to smooth a surface of the waveguide and/or reduce an initial dimension of the waveguide. | 03-07-2013 |
20130068722 | METHOD OF MANUFACTURING PLASMON GENERATOR - A method of manufacturing the plasmon generator includes the steps of: forming a base part made of a dielectric material; forming a metal film that is to later become the plasmon generator; and forming a filler layer made of a dielectric material. The base part includes a base surface and a protruding part that protrudes from the base surface. The protruding part has a top surface that is different in level from the base surface, and a first sidewall connecting the top surface of the protruding part to the base surface. The metal film includes an adhesion part adhering to the first sidewall. The filler layer has a second sidewall disposed such that the adhesion part is interposed between the first sidewall and the second sidewall. | 03-21-2013 |
20130105439 | MANUFACTURING METHOD OF GRATING | 05-02-2013 |
20130112653 | Apparatus and Method for Processing Glass Window of Display - In a display glass window processing device and a method thereof, the display glass window processing device includes a worktable for supporting an unprocessed glass, a rotator for rotating the unprocessed glass, and a sprayer for spraying an etchant onto the unprocessed glass. A first protection film attached to one side of the unprocessed glass arranged opposite the sprayer, and a second protection film is attached to another side of the unprocessed glass arranged opposite the worktable. The first protection film exposes an edge of the unprocessed glass so that the edge is etched by the etchant so as to become rounded. | 05-09-2013 |
20130112654 | PREPARATION METHOD OF FLUORESCENT POWDER LAYER - A preparation method of the fluorescent powder layer ( | 05-09-2013 |
20130126468 | METHOD FOR MANUFACTURING NANO WIRE GRID POLARIZER - Disclosed is a method for manufacturing a nano wire grid polarizer, including: applying a curable resin on a glass substrate, and then forming a nano pattern by pressurizing the curable resin with a nano imprint mold; processing a surface of the nano pattern in which an upper part of the nano pattern is hydrophobicized and an inside of the nano pattern is hydrophilicized; filling the inside of the nano pattern with nano metal particles; and forming a nano wire grid polarizer by removing the nano pattern. | 05-23-2013 |
20130126469 | OPTICAL DEFLECTOR AND METHOD OF MANUFACTURING THE SAME - An optical deflector has: a movable plate having a reflecting surface and a side surface; and a support portion that supports the movable plate in such a manner that the movable plate is able to rotate around a predetermined axis, in which the side surface of the movable plate is recessed toward the axis. | 05-23-2013 |
20130153533 | METHOD FOR TUNING WAVELENGTH OF OPTICAL DEVICE USING REFRACTIVE INDEX QUASI-PHASE CHANGE AND ETCHING - Methods for tuning a wavelength of an optical device are provided. According to the method, a core pattern may be formed on a substrate, a dielectric layer may be formed to cover the core pattern, and the dielectric layer may be thermally treated to increase a refractive index of the dielectric layer. The dielectric layer may include a silicon oxynitride layer. | 06-20-2013 |
20130153534 | FABRICATION OF SEAMLESS LARGE AREA MASTER TEMPLATES FOR IMPRINT LITHOGRAPHY USING STEP AND REPEAT TOOLS - Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices. | 06-20-2013 |
20130175240 | TEST PATTERN SELECTION METHOD FOR OPC MODEL CALIBRATION - A block management method for OPC model calibration includes calculating differences in several different optical functions between first patterns of a first mask and patterns of a second mask corresponding to the first patterns but differing therefrom by a predetermined bias, selecting one or more of the optical functions based on the calculated differences, clustering data of variations in the values of the calculated differences in the selected ones of the optical functions, selecting respective ones of the first patterns in consideration of how the data clusters, and designating the selected first patterns as test patterns. | 07-11-2013 |
20130180949 | COLOR FILTER STRUCTURE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a color filter structure includes: providing a base layer; forming a first colored layer on the base layer; patterning the first colored layer to form a pair of first colored patterns, a first opening between the first colored patterns, and a second opening adjacent to the first colored patterns; forming a first dielectric layer on the first colored patterns and the base layer exposed by the first and second openings; forming a second colored layer on the first colored patterns and the first dielectric layer; patterning the second colored layer to form a second colored pattern in the first opening; forming a second dielectric layer on the first dielectric layer and the second colored pattern; forming a third colored layer on the second dielectric layer; and patterning the third colored layer to form a third colored pattern in the second opening. | 07-18-2013 |
20130186854 | TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR - A method of taper-etching a layer to be etched that is made of a dielectric material and has a top surface. The method includes the steps of: forming an etching mask with an opening on the top surface of the layer to be etched; and taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces intersecting at a predetermined angle is formed in the layer to be etched. The step of taper-etching employs an etching gas containing a first gas contributing to the etching of the layer to be etched and a second gas contributing to the deposition of a sidewall protective film, and changes, during the step, the ratio of the flow rate of the second gas to the flow rate of the first gas so that the ratio increases. | 07-25-2013 |
20130193106 | DIFFRACTION-TYPE 3D DISPLAY ELEMENT AND METHOD FOR FABRICATING THE SAME - A diffraction-type 3D display element is arranged on an image output face of a 3D display device and comprises a first diffraction area and a second diffraction area. The first diffraction area has a plurality of first stepped gratings spaced apart from each other. The second diffraction area has a plurality of second stepped gratings spaced apart from each other. The second diffraction area is adjacent to the first diffraction area and is arranged symmetrically to the first diffraction area with a central line being the symmetric axis. The diffraction-type 3D display element of the invention diffracts the images output by the 3D display device and projects the diffracted images to two different viewing areas to provide 3D images for users. | 08-01-2013 |
20130213929 | METHOD OF FORMING A LIGHTING SYSTEM - A method of forming a lighting system comprises providing a cavity having at least a first array of first optical elements and a second array of second optical elements that have a different shape than the first array, filling the cavity with a curable resin, applying a secondary optical element to the curable resin in alignment with the first optical array, curing the resin to form a cured assembly, and removing the cured assembly from the cavity. | 08-22-2013 |
20130220971 | METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATTERN FOR APPLICATION IN THE XUV WAVELENGTH RANGE, AND BF AND LMAG STRUCTURES MANUFACTURED ACCORDING TO THIS METHOD - Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of (i) providing a multilayer structure, and (ii) arranging a lateral three-dimensional pattern in the multilayer structure, wherein step (ii) of arranging the lateral pattern is performed by means of a method for nano-imprint lithography (NIL), and BF and LMAG structures manufactured according to this method. | 08-29-2013 |
20130228549 | METHOD FOR PRODUCING POLARIZING ELEMENT - A method for producing a polarizing element includes: forming particulate materials of a metal halide on a glass substrate; forming a protective film that covers the particulate materials in a non-plasma environment; stretching the particulate materials by heating and stretching the glass substrate; and forming acicular metal particles by reducing the metal halide constituting the stretched particulate materials. | 09-05-2013 |
20130233824 | LOW-LOSS, WIDE-BAND GRATING COUPLER AND METHOD OF MAKING SAME - A method for fabricating a grating coupler having a bottom mirror in a semiconductor wafer including etching a trench from a top surface of a wafer and around a grating coupler formed in the wafer; etching a void underneath the grating coupler; etching a via into the void from the backside of the wafer; and depositing a mirror on the bottom of the grating coupler. Alternatively, additional oxide may be deposited on the bottom of the grating coupler prior to the deposition of the mirror such that a desirable oxide thickness on the bottom is achieved. | 09-12-2013 |
20130256259 | MEMS NANOSTRUCTURES AND METHODS OF FORMING THE SAME - A method of forming of MEMS nanostructures includes a portion of a substrate is recessed to form a plurality of mesas in the substrate. Each of the plurality of mesas has a top surface and a sidewall surface. A light reflecting layer is deposited over the substrate thereby covering the top surface and the sidewall surface of each mesa. A protection layer is formed over the light reflecting layer. An ARC layer is formed over the protection layer. An opening in a photo resist layer is formed over the ARC layer over each mesa. A portion of the ARC layer, the protection layer and the light reflecting layer are removed through the opening to expose the top surface of each mesa. The photo resist layer and the ARC layer over the top surface of each mesa are removed. | 10-03-2013 |
20130270223 | PHOTORESIST COMPOSITION, METHOD OF MANUFACTURING A POLARIZER AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition. | 10-17-2013 |
20130277331 | PHOTONIC INTEGRATED CIRCUIT HAVING A WAVEGUIDE-GRATING COUPLER - A photonic integrated circuit (PIC) having a waveguide-grating coupler with two evanescently coupled waveguides. The first waveguide is fabricated using materials suitable for manufacturing active optical elements in the PIC. The second waveguide is fabricated using materials capable of providing a relatively high index-of-refraction contrast for the constituent waveguide grating. The waveguide-grating coupler is compatible with the III-V semiconductor technology while being relatively easy to fabricate on an industrial scale. | 10-24-2013 |
20130299452 | Glass Etching Media And Methods - A glass etching medium and a method for etching the surface of a glass sheet to modify surface flaw characteristics without degrading the optical quality of the sheet surface, wherein the etching medium is a thickened aqueous acidic fluoride-containing paste comprising at least one dissolved, water-soluble, high-molecular-weight poly (ethylene oxide) polymer thickener. | 11-14-2013 |
20130334169 | COLOR FILTER SUBSTRATE AND FABRICATING METHOD THEREOF - A color filter substrate including a substrate, a black matrix layer and a color filter substrate layer is provided. The substrate has a plurality of grooves. The black matrix layer is disposed on the substrate between each two adjacent grooves, wherein the black matrix layer extends to the region above the groove from the edge of the groove and an undercut profile forms between the bottom of black matrix and the substrate. The color filter layer including a plurality of filter films separated is filled in the plurality of grooves and the plurality of filter films is separated from each other by the black matrix layer. In addition, a method of fabricating a color filter substrate is also provided. The above-mentioned color filter substrate and the fabricating method thereof can improve the quality and color uniformity of the color filter substrate. | 12-19-2013 |
20140034603 | MULTI-SPECTRAL SUPER-PIXEL FILTERS AND METHODS OF FORMATION - Multi-spectral filter elements and methods of formation are disclosed. Each multi-spectral filter element may include a plurality of sub-filters that are, in some examples, each adapted to respond to electromagnetic radiation within respective ones of a plurality of spectral bands. A method example includes forming an optical cavity layer. Volume of the optical cavity layer can be reduced in at least N−1 number of spatial regions. The reducing may include a number of selective removal steps equal to the binary logarithm function Log | 02-06-2014 |
20140054263 | Planar Polarization Rotator - An optical polarization rotator includes first and second optical waveguide ribs located along a planar surface of a substrate. The second optical waveguide rib is located farther from the surface than the first optical waveguide rib. First segments of the optical waveguide ribs form a vertical stack over the substrate, and second segments of the optical waveguide ribs are offset laterally in a direction along the planar surface. The first and second optical waveguide ribs are formed of materials with different bulk refractive indexes. | 02-27-2014 |
20140091056 | MANUFACTURING METHOD OF PHASE RETARDATION FILM AND MANUFACTURING SYSTEM CONFIGURED TO PRODUCE PHASE RETARDATION FILM - A manufacturing method of a phase retardation film is provided. A flexible light-transmissive substrate is provided. The flexible light-transmissive substrate is aligned to form an alignment substrate. A birefringent material film is formed on the alignment substrate. A reaction-causing light is used to expose and induce a reaction on a first patterned region of the birefringent material film. A second patterned region of the birefringent material film is not exposed by the reaction-causing light. The second patterned region of the birefringent material film is removed. A manufacturing system configured to produce a phase retardation film is also provided. | 04-03-2014 |
20140131310 | Display Panel With Pixel Define Layer, Manufacturing Method Of Pixel Define Layer Of Display Panel, And Display Device - Embodiments of the invention provide a display panel with a pixel define layer, a manufacturing method of a pixel define layer of a display panel, and a display device. The display panel with the pixel define layer comprises: a substrate and the pixel define layer disposed on the substrate. The pixel define layer includes a photosensitive resin layer and a transparent define layer sequentially disposed on the substrate. The photosensitive resin layer has an opening in a region corresponding to each pixel region of the display panel, the transparent define layer has an opening in the region corresponding to each pixel region of the display panel, and the opening of the transparent define layer is smaller than the opening of the photosensitive resin layer so as to form a fill region with a wide lower portion and a narrow upper portion. | 05-15-2014 |
20140144875 | Method for Manufacturing Reflective Polarizer - Disclosed is a method for manufacturing a reflective polarizer, the method including: coating a block copolymer composed of first and second blocks on a supporter and setting an arrangement direction of the first and second blocks by applying shear force in one direction; thermally treating the block copolymer having the set arrangement direction to allow the block copolymer to be separated and arranged into the first and second blocks in a lamellae structure; etching one of the first and second blocks to form a pattern; and forming a metal layer on the block copolymer having the pattern, so that the reflective polarizer can have a thin thickness due to a single layer of metal pattern and thus can maintain a polarization degree and a transmittance equal to or higher than those of the absorptive reflector and a large-are polarizer can be easily manufactured as a low cost. | 05-29-2014 |
20140151327 | PLASMA ETCHING METHOD - The present invention provides a plasma etching method with an EUV-exposed resist capable of preventing variations of device feature dimensions. The plasma etching method of the present invention is to plasma-etch a target material with a multilayer resist that serves as a mask and composed of an EUV-exposed resist, an antireflective coating, an inorganic film and an organic film. The plasma etching method includes a first step of depositing a deposition film on a surface of the EUV-exposed resist before the antireflective coating is etched, a second step of etching the deposition film deposited on the antireflective coating and the antireflective coating with a gas mixture of Cl | 06-05-2014 |
20140166614 | METHOD FOR MANUFACTURING RIDGE-TYPE WAVEGUIDE - In a method for manufacturing a ridge-type waveguide, a substrate is provided. An etching resistance stripe is coated on the substrate. The substrate with the etching resistance stripe is subjected to a wet etching process to form a ridge under the etching resistance stripe. The etching resistance stripe is removed. A titanium stripe is then coated onto the ridge and diffused into the ridge to form a waveguide in the ridge by a high temperature diffusing process. | 06-19-2014 |
20140175052 | METHOD FOR PREPARING ZERO-MODE WAVEGUIDE ARRAYS WITH COATED WALLS - The application relates to methods of manufacture of improved optical containment structures. The invention relates to arrays of zero-mode waveguide structures comprising nanoscale apertures having non-reflective coatings on their walls. The methods provide for selectively coating the walls of the zero mode waveguides, allowing for selective functionalization of the bases. | 06-26-2014 |
20140175053 | TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR - A method of taper-etching a layer to be etched that is made of a dielectric material and has a top surface. The method includes the steps of: forming an etching mask with an opening on the top surface of the layer to be etched; and taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces intersecting at a predetermined angle is formed in the layer to be etched. The step of taper-etching employs an etching gas containing a first gas contributing to the etching of the layer to be etched and a second gas contributing to the deposition of a sidewall protective film, and changes, during the step, the ratio of the flow rate of the second gas to the flow rate of the first gas so that the ratio increases. | 06-26-2014 |
20140202985 | COVER GLASS FOR MOBILE TERMINALS, MANUFACTURING METHOD OF THE SAME AND MOBILE TERMINAL DEVICE - To provide cover glass for mobile terminals exhibiting high strength in a thin plate thickness state to enable reductions in thickness of apparatuses when inserted in the apparatuses, cover glass ( | 07-24-2014 |
20140231386 | FILMS HAVING SWITCHABLE REFLECTIVITY - Compositions, structures and methods that relate to films having switchable reflectivity and anti-reflectivity depending on ambient conditions, such as temperature. A film with switchable reflectivity and anti-reflectivity includes a nanostructured first layer having nanopillars associated with nanowells. A hydrogel occupies at least a portion of the nanowells. As the hydrogel moves from a dehydrated state to a hydrated state, the surface of the film switches from being reflective to being anti-reflective in a repeatable and reversible process. | 08-21-2014 |
20140251948 | METHODS OF MAKING A NEAR FIELD TRANSDUCER WITH A FLARE PEG - The disclosed methods enable the production of plasmonic near-field transducers that are useful in heat-assisted magnetic recording. The plasmonic near-field transducers have an enlarged region and a peg region. The peg region includes a peg region in proximity to an air-bearing surface above a recording medium and also includes a flared region between and in contact with the enlarged region and the peg region. The flared region can act as a heat sink and can lower the thermal resistance of the peg portion of the near-field transducer, thus reducing its temperature. | 09-11-2014 |
20140251949 | ULTRAVIOLET LASER - A laser device is disclosed that provides at least an ultraviolet laser beam and preferably both an ultraviolet laser beam and a visible laser beam. The laser device includes a semiconductor laser device (e.g. a laser diode) to generate visible laser light which is coupled into a frequency doubling crystal taking the form of a single crystal thin film frequency-doubling waveguide structure. The single crystal thin film frequency-doubling waveguide converts a portion of the visible light emitted by the laser diode into ultraviolet light. Both visible and ultraviolet laser light is emitted from the waveguide. As an example, the single crystal thin film frequency-doubling frequency doubling waveguide includes a frequency doubling crystal region composed of β-BaB | 09-11-2014 |
20140291284 | METHOD OF MANUFACTURING A NEAR-FIELD LIGHT GENERATOR INCLUDING A WAVEGUIDE AND A PLASMON GENERATOR - In a method of manufacturing a near-field light generator, a structure including a core and a polishing stopper layer disposed on the top surface of the core is formed on a first cladding layer. Next, a cladding material layer is formed to cover the first cladding layer and the structure. The cladding material layer is then polished until the polishing stopper layer is exposed. Next, the polishing stopper layer is removed so that the cladding material layer has a protruding portion protruding upward to a higher level than the top surface of the core. The cladding material layer is then polished so as to remove the protruding portion and thereby make the cladding material layer into a second cladding layer. Then, a third cladding layer and a plasmon generator are formed. | 10-02-2014 |
20140299573 | METHOD FOR MANUFACTURING OPTICAL MEMBER - The present invention provides a method for producing a porous glass layer easily, wherein a ripple is suppressed. | 10-09-2014 |
20140305902 | Polarization Rotator for Thermally Assisted Magnetic Recording - A process sequence for forming a waveguide structure with a light polarization rotator section that converts transverse electric light from a TE light source to transverse magnetic light which is subsequently coupled to a plasmon generator (PG) is disclosed. The light polarization rotator section has a length determined by TE LD light wavelength, and the effective mode index of the two orthogonal fundamental modes, and a slope is formed in one side of the symmetric structure with a 45 degree angle with respect to a bottom surface. Offsets that narrow the cross-track width may be formed on the two sides of the light polarization rotator section to improve symmetry for higher TE to TM polarization conversion efficiency. | 10-16-2014 |
20140346139 | METHOD FOR MANUFACTURING POLARIZER - A method for manufacturing a polarizer may include forming a first barrier and a second barrier on a surface of a metal layer. The method may further include providing a copolymer layer between the first barrier and the second barrier. The method may further include processing the copolymer layer to form a processed polymer layer that includes first-polymer portions and second-polymer portions that are alternately disposed. The method may further include removing the second-polymer portions from the processed polymer layer to form polymer members that are spaced from each other. The method may further include etching the metal layer, using at least the polymer members, the first barrier, and the second barrier as a mask, to form a plurality of first-type wires and a plurality of second-type wires. | 11-27-2014 |
20140367357 | MANUFACTURING METHOD OF GRATING - The disclosure relates to a method for making a grating. The method includes the following steps. First, a substrate is provided. Second, a photoresist film is formed on a surface of the substrate. Third, a nano-pattern is formed on the photoresist film by nano-imprint lithography. Fourth, the photoresist film is etched to form a patterned photoresist layer. Fifth, a mask layer is covered on the patterned photoresist layer and the surface of the substrate exposed to the patterned photoresist layer. Sixth, the patterned photoresist layer and the mask layer thereon are removed to form a patterned mask layer. Seventh, the substrate is etched through the patterned mask layer by reactive ion etching, wherein etching gases includes carbon tetrafluoride, sulfur hexafluoride, and argon. Finally, the patterned mask layer is removed. | 12-18-2014 |
20140374377 | Method for Producing an Antireflection Coating - A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process. | 12-25-2014 |
20150021291 | COUPLING SYSTEM FOR OPTICAL FIBERS AND OPTICAL WAVEGUIDES - An optical coupler may include a fiber optic structure that has a portion of an outer surface that is beveled at a predetermined angle relative to a longitudinal axis of the fiber optic structure. The beveled outer surface portion may be optically coupled with a waveguide core of an optical integrated circuit. The fiber optic structure may also include a second outer surface portion that is butt coupled to an end of an optical fiber to optically couple the second outer surface portion with the optical fiber. | 01-22-2015 |
20150034591 | METHOD FOR PRODUCING A DIFFRACTION GRATING - A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals. | 02-05-2015 |
20150048047 | Method for Manufacturing Holographic Bi-Blazed Grating - A method for manufacturing a holographic bi-blazed grating. Two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze angle B, and oblique-ion beam etching is performed on two grating areas A and B respectively by using a photoresist grating ( | 02-19-2015 |
20150053640 | METHOD AND ARRANGEMENT FOR MANUFACTURING A RADIATION WINDOW - In a method for manufacturing a radiation window there is produced a layered structure where an etch stop layer exists between a carrier and a solid layer. A blank containing at least a part of each of the carrier, the etch stop layer, and the solid layer is attached to a radiation window frame. At least a part of what of the carrier was contained in the blank is removed, thus leaving a foil attached to the radiation window frame, wherein the foil contains at least a part of each of the etch stop layer and the solid layer. | 02-26-2015 |
20150053641 | PROCESS FOR MAKING HIGH MULTIPLEX ARRAYS - Processes for making high multiplex arrays for use in analyzing discrete reactions at ultra high multiplex with reduced optical noise, and increased system flexibility. The high multiplex arrays include substrates having integrated optical components that increase multiplex capability by one or more of increasing density of reaction regions, improving transmission of light to or collection of light from discrete reactions regions. Integrated optical components include reflective optical elements which re-direct illumination light and light emitted from the discrete regions to more efficiently collect emitted light. Particularly preferred applications include single molecule reaction analysis, such as polymerase mediated template dependent nucleic acid synthesis and sequence determination. | 02-26-2015 |
20150090690 | SYSTEM AND METHOD FOR DIRECT FIBER-END SURFACE STRUCTURING - A fiber-end surface structuring chamber or system having a main body with multiple ports including a fiber-holder port, a process port that is either a stamp/shim holder port or a plasma etching enabler port, an evacuation port, a gas delivery port, and one or more observation ports, where the fiber-end surface structuring system forms structures directly into the end of the fiber to enhance transmission of light over a wide range of wavelengths and increase the laser damage threshold. | 04-02-2015 |
20150108086 | COLORED CURABLE COMPOSITION AND COLOR FILTER - A colored curable composition of the present invention contains a compound represented by general formula (1). In general formula (1), X | 04-23-2015 |
20150136731 | DURABLE SOLAR MIRROR FILMS - The present disclosure generally relates to durable solar mirror films, methods of making durable solar mirror films, and constructions including durable solar mirror films. Some embodiments of the present disclosure relate to methods of making solar mirror films that do not include a reflective layer material across the entire weatherable layer. Some embodiments relate to a method of making a solar mirror film involving providing a weatherable layer having a first major surface and a second major surface; depositing a reflective material on the first major surface of the weatherable layer; and removing a portion of the reflective material (e.g., ultrasonically, mechanically, or thermally). | 05-21-2015 |
20150316719 | OPTICAL DEVICE AND MANUFACTURING METHOD THEREFOR - An optical device includes an SOI substrate, the embedded insulating layer having a thickness of 200 nanometers (nm) or less; an optical waveguide comprising a Group III-V compound semiconductor material formed on top of the SOI substrate; and an optical leakage preventing layer formed inside the SOI substrate on a bottom side of the optical waveguide to prevent leakage of light from inside the optical waveguide towards the SOI substrate. | 11-05-2015 |
20150318003 | METHODS OF FORMING PORTIONS OF NEAR FIELD TRANSDUCERS (NFTS) AND ARTICLES FORMED THEREBY - Methods that include forming at least a portion of a near field transducer (NFT) structure; depositing a material onto at least one surface of the portion of the NFT to form a metal containing layer; and subjecting the metal containing layer to conditions that cause diffusion of at least a portion of the material into the at least one surface of the portion of the NFT; and devices formed thereby. | 11-05-2015 |
20150323737 | METHOD FOR PRODUCTION OF OPTICAL WAVEGUIDES AND COUPLING AND DEVICES MADE FROM THE SAME - Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a novel waveguide is produced by first depositing or growing a first low refractive index material layer as a cladding layer on top of a base substrate. Then, a first high refractive index material layer is deposited or transferred to the top of the cladding layer to form a slab core region. Subsequently, a second high refractive index material layer is deposited on top of the slab core region, and an etch mask layer is formed. Furthermore, the second high refractive index material layer is selectively etched by utilizing a dry-etching tool with high selectivity to the etch mask layer, and a second low refractive index material layer is deposited as a top cladding layer to encapsulate the second high refractive index material layer on top of lower cladding layers. | 11-12-2015 |
20150353767 | RESIN COMPOSITION, METHOD OF MANUFACTURING DISPLAY APPARATUS BY USING THE SAME, AND DISPLAY APPARATUS MANUFACTURED BY USING THE METHOD - A method of manufacturing a display apparatus and a display apparatus manufactured by using (utilizing) the method. | 12-10-2015 |
20150355538 | FABRICATION OF BINARY MASKS WITH ISOLATED FEATURES - An environmentally benign method for producing binary microfabrication masks is disclosed. An optical target may be provided that includes a water-soluble polymer material in contact with an ultraviolet radiation transmittable substrate. A laser may be focused on a primary mask to produce a mask image, the mask image thereafter being reduced by demagnification optics to provide a reduced image. The optical target may be exposed to the reduced image to create features of reduced size from the primary mask. The water-soluble polymer exposed to the ultraviolet radiation may be ablated from the optical target. The optical target may be subsequently metalized using a metal vapor to coat the remaining polymer material and exposed substrate. The metalized optical target may be contacted with an aqueous fluid to remove the metalized polymer material leaving the binary mask. | 12-10-2015 |
20150378054 | Optical Fibers Functionalized with Photonic Crystal Resonant Optical Structures - A photonic crystal (PC) device including one or more resonant optical structures defined by the photonic crystal structure is affixed to the end face of an optical fiber. The PC device is fabricated on a separate substrate, and then affixed to the fiber end face. This transfer can be facilitated by device templates which are laterally supported by tabs after an undercut etch. The tabs can be designed to break during transfer to the fiber, thereby facilitating transfer. Registration marks and/or the use of device templates having the same diameter as the fiber can be used to provide lateral alignment of the fiber to the resonant optical structures. Such alignment may be needed to provide optical coupling between the fiber and the resonant optical structures. | 12-31-2015 |
20160018597 | OPTICAL WAVEGUIDE DIRECTIONAL COUPLER AND METHOD FOR MAKING SAME - An optical waveguide directional coupler includes a base having a planar member and a ridge member and an optical waveguide in the base. The ridge member extends from the planar member and has an upper surface where the optical waveguide exposed. The optical waveguide includes a first flat side surface, a second flat side surface parallel to the first flat side surface, a third flat side surface, a fourth flat side surface parallel to the third flat side surface, and a first flat connection side surface. An included angle θ1 between the first and third flat side surfaces is an obtuse angle, an included acute angle α1 is formed between the first flat connection side surface and the second flat side surface, and θ1 and α1 satisfy α1<(180°−θ1). | 01-21-2016 |
20160027453 | SURFACE FORMING METHOD FOR ELECTRONIC COMPONENT - A surface forming method for electronic component includes: forming a body that has at least one waveguide, with two ends of the waveguide exposed on a front end surface and a back end surface of the body; forming a photoresist film to cover on the front end surface of the body; irradiating a light from the back end surface of the body to remove a part, of the photoresist film, that covers at least a part of an end surface of the waveguide, thereby forming an exposed area on the end surface of the waveguide; etching the exposed area of the waveguide to form a recess; and removing the photoresist film. The position and size of the pattern could be controlled accurately and efficiently, instead of inefficient complex procedures of alignment. | 01-28-2016 |
20160031169 | METHOD FOR MANUFACTURING PASSIVE OPTICAL COMPONENTS, AND DEVICES COMPRISING THE SAME - A device comprises at least one optics member (O) comprising at least one transparent portion (t) and at least one blocking portion (b). The at least one transparent portion (t) is made of one or more materials substantially transparent for light of at least a specific spectral range, referred to as transparent materials, and the at least one blocking portion (b) is made of one or more materials substantially non-transparent for light of the specific spectral range, referred to as non-transparent materials. The transparent portion (t) comprises at least one passive optical component (L). The at least one passive optical component (L) comprises a transparent element ( | 02-04-2016 |
20160031749 | ELECTRIC ARC APPARATUS FOR PROCESSING AN OPTICAL FIBER, AND RELATED SYSTEMS AND METHODS - An electric arc apparatus for processing an optical fiber includes one or more first electrodes and one or more second electrodes. The first electrode(s) each have an end portion that terminates at an opening defined by the first electrode(s). The opening is configured to accommodate the optical fiber extending along a longitudinal axis. The second electrode(s) each have an end portion that terminates at a location spaced from the opening defined by the first electrode(s). The first electrode(s) or second electrode(s) are configured to receive a voltage that generates a plasma field between the first electrode(s) and second electrode(s), which are shaped to focus the plasma field so that the plasma field extends across the longitudinal axis and modifies the end of the optical fiber. Methods of processing an optical fiber with an electric arc apparatus are also disclosed. | 02-04-2016 |
20160033685 | SUBWAVELENGTH COATINGS AND METHODS FOR MAKING AND USING SAME - Methods are disclosed for forming subwavelength coatings for use in the UV, visible, or infrared part of the electromagnetic spectrum. A first material and a second material are deposited onto a substrate. The first material may include dielectric spheres of subwavelength size that self-assemble on the substrate to form a template or scaffold with subwavelength size voids between the spheres into which the second material is deposited or filled. First and second materials are heated on the substrate at a preselected temperature to form the subwavelength coating. | 02-04-2016 |
20160047957 | MANUFACTURING METHOD OF GRATING - A method for making a grating includes the following steps. A first photoresist film is formed on a substrate. A second photoresist film is applied on the first photoresist film. A number of first cavities are formed in the second photoresist film, wherein part of the first photoresist film is exposed to form a first exposed part. A number of second cavities are formed, wherein part of the surface of the substrate is exposed to form an exposed surface. A mask layer is deposited on the second photoresist film and the exposed surface of the substrate. A patterned mask layer is formed, and part of the substrate is exposed to form a second exposed part. The second exposed part of the substrate is etched through the patterned mask layer. The patterned mask layer is removed. | 02-18-2016 |
20160052789 | TECHNIQUES FOR FABRICATING DIAMOND NANOSTRUCTURES - Techniques for fabricating diamond nanostructures including application of a self-assembled hard mask to a surface of a diamond substrate to define a pattern of masked regions having a predetermined diameter surrounded by an exposed portion. The exposed portion can be vertically etched to a predetermined depth using inductively coupled plasma to form a plurality of nanoposts corresponding to the masked regions. The nanoposts can be harvested to obtain a nanostructure with a diameter corresponding to the predetermined diameter and a length corresponding to the predetermined depth. | 02-25-2016 |
20160070044 | METHOD FOR MANUFACTURING REFLECTIVE POLARIZER - A manufacturing method of a reflective polarizer includes forming a metal layer on a first substrate; forming a mask layer divided into an opening area and a non-opening area on the metal layer, and having grooves patterned in the opening area, the groove exposing the metal layer; increasing hydrophobicity of a surface by treating the mask layer using a silane coupling agent; inducing phase separation of a hydrophilic component and a hydrophobic component of a block copolymer after filling the grooves of the mask layer with the block copolymer; selectively removing the hydrophilic component or the hydrophobic component block copolymer of the block copolymer; and etching the metal layer using the block copolymer as a mask. | 03-10-2016 |
20160077278 | Fluid-Based Light Guiding Structure and Fabrication Thereof - A solution for fabricating a structure including a light guiding structure is provided. The light guiding structure can be formed of a fluoropolymer-based material and include one or more regions, each of which is filled with a fluid transparent to radiation having a target wavelength, such as ultraviolet radiation. The region(s) can be created using a filler material, which is at least substantially enclosed by the fluoropolymer-based material and subsequently removed from each region. The structure can further include at least one optical element integrated into the light guiding structure. | 03-17-2016 |
20160114502 | METHOD OF MANUFACTURING MOLD AND METHOD OF MANUFACTURING POLARIZER - Provided are a method of manufacturing a mold, a method of manufacturing a polarizer, and a display apparatus including the polarizer. According to one or more exemplary embodiments, a method of manufacturing a mold, the method including: forming a polymer pattern on a substrate, the polymer pattern including protrusions; forming a wire grid template portion on the substrate by etching, the substrate being etched using protrusions of the polymer pattern as a mask; forming a cover mask covering a portion of the wire grid template portion; forming a recess in the substrate by etching, the substrate being etched using the cover mask, the recess having a bottom surface lower than an upper surface of the wire grid template portion; and removing the cover mask. | 04-28-2016 |
20160115075 | Method for the Unidirectional and or Bidirectional Removal of a Cladding Layer of an Optical Preform - The invention describes a method for the removal of glass where the parameters of the removal process are set over the length of the substrate (preform) so that a uniform removal can be achieved over the complete substrate length. | 04-28-2016 |
20160116692 | STRUCTURED SUBSTRATE FOR OPTICAL FIBER ALIGNMENT - A structured substrate for optical fiber alignment is produced at least in part by forming a substrate with a plurality of buried conductive features and a plurality of top level conductive features. At least one of the plurality of top level conductive features defines a bond pad. A groove is then patterned in the substrate utilizing a portion of the plurality of top level conductive features as an etch mask and one of the plurality of buried conductive features as an etch stop. At least a portion of an optical fiber is placed into the groove. | 04-28-2016 |
20160124162 | MULTI-FIBER FERRULE - Systems and method for automatically assembling a multi-fiber optical ferrule. Holes are drilled or etched in a thin, flat substrate. A vacuum gripper and further alignment components are used to provide sufficient lateral alignment for insertion of the optical fibers. The protrusion of each optical fiber is detected on an output side of the substrate, and an adhesive is applied to attach the fibers to the substrate. | 05-05-2016 |
20160124311 | SLOPED ELECTRODE ELEMENT FOR A TORSIONAL SPATIAL LIGHT MODULATOR - A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD-type pixel, by depositing a photoresist spacer layer upon a substrate. The photoresist spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the photoresist spacer layer. A control member is formed upon the shaped spacer layer, and has a sloped portion configured to maximize energy density. An image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM). | 05-05-2016 |
20160131589 | Optical Sensor Element for Analyte Assay in a Biological Fluid, and Method of Manufacture Thereof - Beginning with a sheet of optically transparent material, one may fabricate a great many shaped optical wafers, each in the form of a thin and essentially flat piece of optical material having a narrow cross-sectional width relative to length, and a sharply narrowed tip at one end. The fabrication process involves passing a sheet of optically transparent material through one or more operational steps wherein cutting, shearing, embossing, microperforating, or a combination thereof is performed. The fabrication process may further include a cladding operation, a tip texturing operation, and an analyte-reactive reagent deposition operation. The completed optical wafers are separated and each may be mounted into a user-operated device along with systems for educing a fluid sample to be expressed from a living organism, for bringing the tip of the optical wafer into contact with the fluid sample, and for illuminating and assaying the fluid sample. | 05-12-2016 |
20160131807 | MANUFACTURE METHOD FOR BLAZED CONCAVE GRATING - A manufacture method for a blazed concave grating is provided, including: replicating a blazed concave grating by means of a replication process, after the replication is completed, conducting heat preservation and cooling, then separating two gratings (G | 05-12-2016 |
20160147015 | POLARIZING SPLITTER AND METHOD FOR MANUFACTURING SAME - A method for manufacturing a polarizing splitter includes providing a substrate including a top surface; forming a ridged asymmetric Y-shaped waveguide and a base by etching the substrate from the top surface into an inner region, the base includes an upper surface paralleling with the top surface, the ridged asymmetric Y-shaped waveguide projects from the upper surface of the base, and includes an input section configured for transmitting both a transverse electric wave and a transverse magnetic wave, a first branch configured for transmitting the transverse magnetic wave only, and a second branch configured for transmitting the transverse electric wave only, the first and the second branches branch from the input section; and forming a pair of strip-shaped first electrodes on the upper surface of the base, the strip-shaped first electrodes arranged at opposite sides of the input section and parallel with a central axis of the input section. | 05-26-2016 |
20160195640 | OPTICAL MATERIAL, OPTICAL ELEMENT, AND METHOD FOR MANUFACTURING SAME | 07-07-2016 |
20160200033 | METHOD FOR MANUFACTURING STAMP AND METHOD FOR MANUFACTURING WIRE GRID POLARIZER USING THE STAMP | 07-14-2016 |
20170235124 | WAVELENGTH TUNABLE MEMS-FABRY PEROT FILTER | 08-17-2017 |
20180024071 | Optical Sensor Element for Analyte Assay in a Biological Fluid, as Method and Manufacture Thereof | 01-25-2018 |