Class / Patent application number | Description | Number of patent applications / Date published |
204298150 | Specified work holder | 25 |
20080264785 | Module For Coating Both Sides of a Substrate in a Single Pass - A module to carry targets in a sputter deposition installation for coating two-sided substrates is described. The module is mountable to the installation through an interface flange that carries at least two targets with their associated magnet systems. When the module is mounted, the targets take positions at opposite sides of the two-sided substrate, while the magnet systems orient the sputter deposition towards the substrate. The module enables coating of both sides of the substrate in one single pass. Different configurations are described with gas distribution systems and additional substrate supports. An enclosure with adjustable blinds in order to reduce gas spreading is also included. | 10-30-2008 |
20080283393 | Elongate Vacuum System for Coating One or Both Sides of a Flat Substrate - An elongate vacuum system for coating one or both sides of a flat substrate which can be displaced by the system, comprises at least one magnetron provided with a magnetron surrounding area and is subdivided into successive compartments in the direction of transportation of the substrate by separating walls having closeable suction openings. The compartments can be evacuated either directly by a vacuum connection provided on the compartment or indirectly via a suction opening in the separating wall. At least one compartment comprises an upper partial compartment which is arranged above the substrate. The partial compartment comprises a closeable upper opening in at least one of the outer walls thereof. The aim is to produce an elongate coating system which is flexible to use according to the requirements of various one and two-sided coating processes and ensures a stable, differential and process-optimized sputter atmosphere. At least in one of the upper partial compartments, horizontal and/or vertical elements can be mounted in order to subdivide the upper partial compartment into several sections. | 11-20-2008 |
20090101497 | SPUTTERING SYSTEM CARRIER - A sputtering system carrier configured for supporting a workpiece comprises a main body and a supporting body. The main body includes four end to end frames, which are a first frame, a second frame, a third frame, and a fourth frame. The first frame and the third frame each have a sliding slot. The second frame and the fourth frame each has a coil wrapped around the frame. The supporting body includes four end to end frames, which are a fifth frame, a sixth frame, a seventh frame, and an eighth frame. The fifth frame and the seventh frame have a pivot protruding from outside surface. The pivots are movably held in the sliding slots. The pivots are positioned either near the sixth frame or the eighth frame. The sixth frame, the eighth frame, or both have a magnet. | 04-23-2009 |
20090127109 | SUBSTRATE SUPPORTING DEVICE AND SPUTTERING APPARATUS INCLUDING THE SAME - A substrate supporting device for forming a coating film having a maximally even and necessary thickness with a sufficiently strong adhesiveness and a good film quality on a substrate, and a sputtering apparatus including such a substrate supporting device. The substrate supporting device for supporting a substrate on which a coating film is formed by sputtering is disposed in a vacuum chamber so as to be opposed to a sputtering target. The substrate supporting device is rotatable around a first rotation axis by a first driving mechanism and is rotatable around a second rotation axis by a second driving mechanism. | 05-21-2009 |
20100108504 | SAMPLE FIXING DEVICE OF EVAPORATION MACHINE - A sample fixing device of an evaporation machine includes a first transmission mechanism having a first rotation axis driven by a driving device and a first rotation wheel; a fixing plate and a support frame; a pair of second transmission mechanisms at opposite sides of the first rotation wheel, and including a second rotation wheel revolving around the first rotation wheel, a second rotation axis passing and attached to the second rotation wheel and the fixing plate, and a third rotation wheel connected to the second rotation axis; and a third transmission mechanism including a fourth rotation wheel driven by the third rotation wheel and a sample support axis passing and attached to the fourth wheel and the support arm; wherein an axes of the sample support axis perpendiculars to an extension axes of the first rotation axis so that the sample fixing device can rotate and revolve. | 05-06-2010 |
20100108505 | VACUUM-COATING MACHINE WITH MOTOR-DRIVEN ROTARY CATHODE - In a vacuum-coating machine ( | 05-06-2010 |
20110048937 | CARRIER AND SPUTTERING DEVICE USING THE SAME - A carrier for use during sputtering includes a main body and support members. The main body defines a receiving space and includes a lateral surface defining at least one groove extending along a longitudinal direction. The receiving space and the at least one groove communicate with each other. The at least one groove is defined by a first surface and a second surface. The first surface defines recessed portions along the longitudinal direction and communicates with the receiving space. The support members are used for hanging workpieces. Each of the support members includes at least one support arm protruding from the lateral surface and is selectively and movably retained by one of the recessed portions. | 03-03-2011 |
20110062023 | SPUTTERING DEVICE - A sputtering device includes a housing, two baffles, a pair of conveyor, and a support. The housing includes a chamber therein. The baffles are slidably installed in the chamber of the housing to divide the chamber of the housing into a number of separated rooms where workpieces are treated. The baffles are slideable relative to the housing between a first position where the rooms are isolated and sealed by the baffles from others, and a second position where the rooms communicate with each other. The support is received in the housing. The pair of conveyor is mounted on the housing for transporting the support from one of the rooms to another. | 03-17-2011 |
20110114483 | SPUTTERING DEPOSITION APPARATUS - A sputtering deposition apparatus includes a chamber device, a conveyor, a number of carriers, and a number of pairs of targets. The chamber device defines a chamber therein. The conveyor is received in the chamber and includes a smoothly extending loop rail, a conveyor belt shaped as the rail and slidably disposed on the rail, and an actuator configured to drive the conveyor belt to slide along the rail. The carriers are disposed on the conveyor belt, each of which is configured for carrying a number of substrates to be deposited with. The pairs of targets arranged along the rail, each of which are oppositely disposed outside and inside the rail. | 05-19-2011 |
20110174611 | SUPPORT DEVICE AND COATING DEVICE USING SAME - An exemplary coating device includes a target material and a support device configured for supporting a workpiece. The support device includes a support frame and a holding member. The support frame includes a support member and a support arm disposed on the support member. One end of the holding member is configured for attaching the workpiece thereon, and an opposite end of the holding member is adjustably engaged with the support arm so that the workpiece is a desired distance from the target material. | 07-21-2011 |
20110253530 | SUBSTRATE HOLDING DEVICE AND SPUTTERING APPARATUS HAVING SAME - A holding device includes a spindle, a number of aligned adapting members and a number of holders. The adapting members are mounted on the spindle. Each holder is movably coupled with a corresponding adapting member such that the distance between each holder and the spindle is adjustable. | 10-20-2011 |
20110253531 | COMPOSITE COATING APPARATUS - A composite coating apparatus includes a main body, two carrying boards, and two actuators. The main body defines a first chamber and a second chamber with a separating board intervening therebetween. The separating board defines a coating opening intercommunicating with the chambers. The carrying boards are received in the first chamber and rotatably connected to the separating board at two sides of the coating opening. Each carrying board defines a receiving groove for holding a substrate. The actuators are configured for driving the carrying boards to rotate between a first coating position, in which the substrate is exposed to the second chamber for a first coating process carried out in the second chamber via the coating opening, and a second coating position, in which the substrate faces away from the separating board for a second coating process carried out in the first chamber. | 10-20-2011 |
20110259740 | SPUTTERING APPARATUS - A sputtering apparatus includes a support assembly and posts. The support assembly includes an upper base, a lower base, seat members, and connection posts interconnected between the upper base and the lower base. The upper base defines cutouts. The seat members are rotatably mounted on the lower base and aligned with the cutouts. Each seat member includes a hollow receiving post, a support post moveably received in the receiving post, a lever bar is pivoted to the receiving post, and a drive post, the drive post and the support post are coupled to opposite ends of the lever bar. Each seat member is rotatable about a longitudinal axis of the receiving post. The posts fix workpieces. Each post includes a rod body portion having a first end and an opposite second end, an engagement portion at the first end, and a protrusion extending from the second end. | 10-27-2011 |
20110266146 | SPUTTERING APPARATUS - A sputtering apparatus includes a preheating chamber, a deposition chamber, a passage in communication with the preheating chamber and the deposition chamber, a first support assembly received in the preheating chamber, a second support assembly received in the deposition chamber, a number of posts capable of mounting on each of the first and second support assemblies, a transferring robot arranged in the preheating chamber, and a magnetic assembly fixed on the transferring robot. The transferring robot is configured for demounting the post from the two support assemblies, transferring the demounted post between the preheating chamber and the deposition chamber, and mounting the transferred post on the two support assemblies. The magnetic assembly is configured for collecting iron workpieces dropped on a bottom in the preheating chamber, the deposition chamber, or the passage. | 11-03-2011 |
20110278166 | CHAMBER FOR PHYSICAL VAPOUR DEPOSITION AND DOOR FOR A PHYSICAL VAPOUR DEPOSITION CHAMBER - A chamber for physical vapour deposition is provided. The chamber includes a housing, a door for opening and closing the housing, and a bearing for receiving a target, wherein the bearing is oriented in a first direction. Further, the chamber is adapted so that the target is at least partially removable from the chamber in the first direction. According to an embodiment, a chamber for physical vapour deposition is provided. The chamber is adapted for receiving at least one target and a substrate. The chamber includes a housing, a door, and at least one bearing for mounting the target, wherein the bearing is attached to the door. | 11-17-2011 |
20120199477 | FILM FORMING APPARATUS - The present invention provides a film forming apparatus that can reduce the adherence of thin film material particles to a holding mechanism included in a substrate tray at the time of film formation. In an embodiment of the present invention, a sputtering chamber includes the substrate tray that has bottom clamps and side clamps, a movement mechanism that changes the position of the side clamps between when the film is formed on the substrate and when the substrate is transferred and a mask that has an opening of a predetermined shape through which sputter particles from a cathode pass. At the time of transfer, the movement mechanism moves the side clamps such that the side clamps hold the substrate; at the time of film formation, the movement mechanism moves the side clamps toward the outside of the substrate tray. | 08-09-2012 |
20120267244 | SAMPLE RECEIVING DEVICE FOR SAMPLE MATERIALS IN ULTRA-HIGH VACUUM CHAMBERS - The disclosure relates to a sample-receiving device for sample materials in ultra-high vacuum chambers, in particular for sputter coating installations. | 10-25-2012 |
20130220805 | Sputtering Target-Backing Plate Assembly and Method for Producing Same - Provided is a sputtering target-backing plate assembly wherein a Cu—Cr alloy backing plate is bonded to a Ti target via a layer of a strain absorbing material placed at an interface between the Ti target and the Cu—Cr alloy backing plate. In particular, the present invention relates to a sputtering target-backing plate assembly and a production method thereof, the assembly being capable of absorbing strain at the interface between the target and the backing plate in order to prevent deformation (displacement) during sputtering. An object of the present invention is to solve a problem inherent to Titanium (Ti) and a problem in selecting a backing plate compatible with it. | 08-29-2013 |
20130299348 | SPUTTERING APPARATUS - A sputtering apparatus includes a support assembly and posts. The support assembly includes an upper base, a lower base, seat members, and connection posts interconnected between the upper base and the lower base. The upper base defines cutouts. The seat members are rotatably mounted on the lower base and aligned with the cutouts. Each seat member includes a hollow receiving post, a support post moveably received in the receiving post, a lever bar pivotably connected to the receiving post, and a drive post, the drive post and the support post are coupled to opposite ends of the lever bar. Each seat member is rotatable about a longitudinal axis of the receiving post. The posts fix workpieces in place. Each post includes a rod body portion having a first end and an opposite second end, an engagement portion at the first end, and a protrusion extending from the second end. | 11-14-2013 |
20140042022 | INVERTED CYLINDRICAL MAGNETRON (ICM) SYSTEM AND METHODS OF USE - An Inverted Cylindrical Magnetron (ICM) System and Methods of Use is disclosed herein generally comprising a co-axial central anode concentrically located within a first annular end anode and a second annular end anode; a process chamber including a top end and a bottom end in which the first annular end anode and the second annular end anode are coaxially disposed, whereby the first annular end anode, the second annular end anode, and the central anode form a 3-anode configuration to provide electric field uniformity, and the process chamber including a central annular space coupled to a tube insulator disposed about the central annular space wall; a cathode concentrically coupled to the tube insulator and a target; and a plurality of multi-zone electromagnets or hybrid electro-permanent magnets surrounding the exterior of the process chamber providing a tunable magnetic field. | 02-13-2014 |
20140238851 | STRUCTURE OF REACTION CHAMBER OF SEMICONDUCTOR SPUTTERING EQUIPMENT - A structure of reaction chamber of semiconductor sputtering equipment is disclosed, including a chamber case, an elevation platform, a plurality of target fixing elements, a carrier ring and a covering protective ring, wherein the contact surface of the target fixing element, the ring-shaped protruding surface of the carrier ring and the attachment surface of the covering protective ring are all coarse surfaces with uneven patterns. As such, during sputtering, the contact surface, ring-shaped protruding surface and attachment surface can withstand the deposition thickening and extend the cycle of cleaning components and life span so as to improve utilization rate of the equipment and reduce the manufacturing cost. | 08-28-2014 |
20140262768 | PLATING STACK TO CONDITION A BONDING SURFACE - A rotary sputtering target assembly and method of making the same including a target and a backing tube having a plated bonding surface. The backing tube and the target are bonded together along the plated bonding surface. | 09-18-2014 |
20140262769 | SUBSTRATE HOLDER APPARATUS AND VACUUM PROCESSING APPARATUS - A substrate holder apparatus includes a substrate holder configured to hold a substrate in a vacuum processing space in a chamber, a support column coupled to the substrate holder, a first rotating support unit which rotatably supports the support column, a second rotating support unit which rotatably supports the support column at a position spaced apart from a position where the first rotating support unit supports the support column, and a housing configured to support the first rotating support unit and the second rotating support unit. The second rotating support unit and the housing or the support column and the housing are electrically insulated from each other. | 09-18-2014 |
20150041314 | ANNULAR MEMBER AND FILM-FORMING DEVICE IN WHICH SAME IS USED - An annular member | 02-12-2015 |
20160177439 | SPUTTER TOOL | 06-23-2016 |