Youtec Co., Ltd. Patent applications |
Patent application number | Title | Published |
20160118574 | FERROELECTRIC CERAMICS, ELECTRONIC COMPONENT AND MANUFACTURING METHOD OF FERROELECTRIC CERAMICS - Ferroelectric ceramics including: a Pb(Zr | 04-28-2016 |
20140242379 | FERROELECTRIC FILM AND METHOD FOR MANUFACTURING THE SAME - To produce a ferroelectric film formed of a lead-free material. The ferroelectric film according to an aspect of the present invention includes a (K | 08-28-2014 |
20140191618 | POLING TREATMENT METHOD, PLASMA POLING DEVICE, PIEZOELECTRIC BODY AND MANUFACTURING METHOD THEREOF, FILM FORMING DEVICE AND ETCHING DEVICE, AND LAMP ANNEALING DEVICE - A plasma poling device includes a holding electrode ( | 07-10-2014 |
20130323534 | FERROELECTRIC CRYSTAL FILM, ELECTRONIC COMPONENT, MANUFACTURING METHOD OF FERROELECTRIC CRYSTAL FILM, AND MANUFACTURING APPARATUS THEREFOR - There is provided a manufacturing method of a ferroelectric crystal film in which an orientation of a seed crystal film is transferred preferably and a film deposition rate is suitable for volume production. | 12-05-2013 |
20130192878 | FERROELECTRIC FILM, ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING FERROELECTRIC FILM - A method for manufacturing a ferroelectric film including the steps of forming a burnable material film containing hydrogen of not less than 1% by weight on a substrate; forming an amorphous thin film including a ferroelectric material on the burnable material film; and oxidizing and crystallizing the amorphous thin film while supplying hydrogen to the amorphous thin film by burning the burnable material film through heating of the burnable material film and the amorphous thin film in an oxygen atmosphere, to thereby form a first ferroelectric film on the substrate. | 08-01-2013 |
20130153813 | POLING TREATMENT METHOD, PLASMA POLING DEVICE, PIEZOELECTRIC SUBSTANCE, AND MANFACTURING METHOD THEREFOR - The plasma poling device includes: a holding electrode | 06-20-2013 |
20100022097 | VAPORIZER, SEMICONDUCTOR PRODUCTION APPARATUS AND PROCESS OF SEMICONDUCTOR PRODUCTION - A vaporizer, a semiconductor production apparatus and process capable of improving the efficiency in the use of a raw material gas noticeably, enabling uniform deposition according to the raw material gas used, diminishing maintenance frequency to improve productivity. At the time of ALD operation, carrier gas continues to be supplied to a reaction chamber | 01-28-2010 |