20100252867 | MFMS-FET, Ferroelectric Memory Device, And Methods Of Manufacturing The Same - Disclosed herein are a metal-ferroelectric-metal-substrate (MFMS) field-effect transistor (FET), an MFMS-ferroelectric memory device, and method of manufacturing the same. The MFMS-FET and the ferroelectric memory device in accordance with the present invention include: a substrate including source and drain regions, and a channel region formed therebetween; a buffer layer formed on the top of the channel region of the substrate; a ferroelectric layer formed on the buffer layer; and a gate electrode formed on the ferroelectric layer, wherein the buffer layer is formed of a conductive material. | 10-07-2010 |