UNITED MICROELECTRONICS CORP.
|UNITED MICROELECTRONICS CORP. Patent applications|
|Patent application number||Title||Published|
|20150256146||RESONATOR FILTER - A resonator filter includes a substrate, a bottom electrode formed on the substrate, a multi-layered coupling structure formed on the bottom electrode, a top electrode formed on the multi-layered coupling structure, a first piezoelectric layer sandwiched in between the bottom electrode and the multi-layered coupling structure, and a second piezoelectric layer sandwiched in between the multi-layered coupling structure and the top electrode. The multi-layered coupling structure includes at least an insulating material.||09-10-2015|
|20150255576||SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a semiconductor device is described. A spacer is formed on a sidewall of a fin structure. A portion of the fin structure is removed to form a cavity exposing at least a portion of the inner sidewall of the spacer. An epitaxy process is performed based on the remaining fin structure to form a semiconductor layer that has a shovel-shaped cross section including: a stem portion in the cavity, and a shovel plane portion contiguous with the stem portion. A semiconductor device is also described, which includes the spacer, the remaining fin structure and the semiconductor layer that are mentioned above.||09-10-2015|
|20150255563||METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE HAVING MULTI-LAYER HARD MASK - A method for manufacturing a semiconductor device is provided, comprising steps of providing a substrate with an underlying layer formed thereon; forming a gate layer overlying the underlying layer; and forming a multi-layer hard mask layer on the gate layer, and the multi-layer hard mask layer comprising a plurality of material layers and a top hard mask formed on the material layers, wherein the gate layer and the top hard mask contain the same element, such as silicon.||09-10-2015|
|20150255430||PACKAGE STRUCTURE - A package structure is disclosed. The package structure includes a first die, a second die on the first die, and a substrate disposed corresponding to the first die. The first die includes a first die identification (ID) region defined thereon and a plurality of first through silicon vias (TSVs) in the first die ID region. The second die includes another first die identification (ID) region and a second die ID region defined thereon and a plurality of second TSVs in the another first die ID region and a plurality of third TSVs in the second die ID region, in which the second TSVs are electrically connected to the first TSVs in the first die.||09-10-2015|
|20150249158||SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises a substrate, a first gate structure, a second gate electrode, a third gate electrode and a protective layer. The first gate structure comprises a first gate electrode disposed on the substrate and a first gate dielectric covering the first gate electrode. The second gate electrode is disposed on and electrically isolated from the first gate electrode. The first gate structure has an extending portion relative to the second gate electrode. The third gate electrode is disposed adjacent to and electrically isolated from the first gate electrode and the second gate electrode. The third gate has an extending portion between a lower surface of the protective layer and an upper surface of the extending portion of the first gate structure.||09-03-2015|
|20150243776||LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR AND FIELD DRIFT METAL OXIDE SEMICONDUCTOR - A laterally diffused metal oxide semiconductor (LDMOS) is provided. A substrate has a deep well with a second conductive type therein. A gate is disposed on the substrate. A first doped region of a second conductive type and a second doped region of a first conductive type are located in the deep well and at the corresponding two sides of the gate. A drain region of a second conductive type is located in the first doped region. A drain contact is disposed on the drain region. A doped region of a first conductive type is located in the first doped region and under the drain region but not directly below the drain contact. A source region is located in the second doped region. A field drift metal oxide semiconductor (FDMOS) which is similar to the laterally diffused metal oxide semiconductor (LDMOS) is also provided.||08-27-2015|
|20150243754||SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD OF THE SAME - A semiconductor structure and a manufacturing method thereof are disclosed. The semiconductor structure includes an isolation layer, a gate dielectric layer, a first work function metal, a first bottom barrier layer, a second work function metal, and a first top barrier layer. The isolation layer is formed on a substrate and has a first gate trench. The gate dielectric layer is formed in the first gate trench. The first work function metal is formed on the gate dielectric layer in the first gate trench. The first bottom barrier layer is formed on the first work function metal. The second work function metal is formed on the first bottom barrier layer. The first top barrier layer is formed on the second work function metal.||08-27-2015|
|20150243663||METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND DEVICE MANUFACTURED USING THE SAME - A method for manufacturing a semiconductor device and a device manufactured using the same are provided. According to a dual silicide approach of the embodiment, a substrate having a first area with plural first metal gates and a second area with plural second metal gates is provided, wherein the adjacent first metal gates and the adjacent second metal gates are separated by an insulation. A dielectric layer is formed on the first and second metal gates and the insulation. The dielectric layer and the insulation at the first area are patterned by a first mask to form a plurality of first openings. Then, a first silicide is formed at the first openings. The dielectric layer and the insulation at the second area are patterned by a second mask to form a plurality of second openings. Then, a second silicide is formed at the second openings.||08-27-2015|
Patent applications by UNITED MICROELECTRONICS CORP.