20130207310 | NANOIMPRINTING MOLD, METHOD FOR PRODUCING THE NANOIMPRINTING MOLD, AND NANOIMPRINTING METHOD EMPLOYING THE NANOIMPRINTING MOLD - Fluctuations in the thickness of resist films after imprinting are eliminated, in a nanoimprinting method that employs a fine pattern of protrusions and recesses. A nanoimprinting mold is produced by forming a fine pattern of protrusions and recesses on the surface of a substrate. A substrate having a surface shape after a mold release process is administered thereon and before the pattern of protrusions and recesses is formed with a 3σ o value related to a height difference distribution within a range from 1 nm to 3 nm is employed as the substrate. | 08-15-2013 |